1
Daniel Jozef Maria Direcks, Danny Maria Hubertus Philips, Clemens Johannes Gerardus Van Den Dungen, Koen Steffens, Arnold Jan Van Putten: Fluid handling structure, lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, January 8, 2013: US08351018 (10 worldwide citation)

A fluid handling structure is disclosed in which measures are taken to increase the speed at which meniscus breakdown occurs. Measures include the shape of a plurality of fluid extraction openings and the shape and density of a plurality of fluid supply openings in the fluid handling structure.


2
Michel Riepen, Nicolaas Rudolf Kemper, Johannes Petrus Martinus Bernardus Vermeulen, Daniel Jozef Maria Direcks, Danny Maria Hubertus Philips, Arnold Jan Van Putten: Immersion lithographic apparatus, drying device, immersion metrology apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, January 1, 2013: US08345218 (8 worldwide citation)

An immersion lithographic apparatus is described in which a liquid removal device is arranged to remove liquid from the substrate, e.g. during exposures, through a plurality of elongate slots arranged along a line and angled to that line. The liquid removal device may act as a meniscus pinning devic ...


3
Daniel Jozef Maria Direcks, Danny Maria Hubertus Philips, Clemens Johannes Gerardus Van Den Dungen, Maikel Adrianus Cornelis Schepers, Paul Petrus Joannes Berkvens, Koen Steffens, Arnold Jan Van Putten: Fluid handling structure, lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, April 16, 2013: US08421993 (5 worldwide citation)

A fluid handling structure is disclosed in which the size and arrangement of the fluid extraction openings is specified in order to reduce the vibrations which are transmitted to the fluid handling structure as a result of two-phase extraction. The area of each fluid extraction opening and/or the to ...


4
Kursat Bal, Bernardus Antonius Johannes Luttikhuis, David Christopher Ockwell, Arnold Jan Van Putten, Han Kwang Nienhuys, Maikel Bernardus Theodorus Leenders: Lithographic apparatus. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, December 6, 2016: US09513566 (2 worldwide citation)

A lithographic apparatus injects gas between a reticle (MA) and reticle blades (REB-X, REB-Y) to protect the reticle from contamination. The gas may be injected either into the space defined between the reticle and the closest pair of reticle blades, or into the space defined between the two pairs o ...


5
Daniel Jozef Maria DIRECKS, Danny Maria Hubertus PHILIPS, Clemens Johannes Gerardus VAN DEN DUNGEN, Koen STEFFENS, Arnold Jan VAN PUTTEN: Fluid handling structure, lithographic apparatus and device manufacturing method. Asml Netherlands, Pillsbury Winthrop Shaw Pittman, November 12, 2009: US20090279060-A1

A fluid handling structure is disclosed in which measures are taken to increase the speed at which meniscus breakdown occurs. Measures include the shape of a plurality of fluid extraction openings and the shape and density of a plurality of fluid supply openings in the fluid handling structure.


6
Daniel Jozef Maria DIRECKS, Danny Maria Hubertus PHILIPS, Clemens Johannes Gerardus VAN DEN DUNGEN, Maikel Adrianus Cornelis SCHEPERS, Paul Petrus Joannes BERKVENS, Koen STEFFENS, Arnold Jan VAN PUTTEN: Fluid handling structure, lithographic apparatus and device manufacturing method. Asml Netherlands, Pillsbury Winthrop Shaw Pittman, November 12, 2009: US20090279062-A1

A fluid handling structure is disclosed in which the size and arrangement of the fluid extraction openings is specified in order to reduce the vibrations which are transmitted to the fluid handling structure as a result of two-phase extraction. The area of each fluid extraction opening and/or the to ...


7
Michel Riepen, Nicolaas Rudolf Kemper, Johannes Petrus Martinus Bernardus Vermeulen, Daniel Jozef Maria Direcks, Danny Maria Hubertus Philips, Arnold Jan Van Putten: Immersion lithographic apparatus, drying device, immersion metrology apparatus and device manufacturing method. Asml Netherlands, Pillsbury Winthrop Shaw Pittman, November 12, 2009: US20090279063-A1

An immersion lithographic apparatus is described in which a liquid removal device is arranged to remove liquid from the substrate, e.g. during exposures, through a plurality of elongate slots arranged along a line and angled to that line. The liquid removal device may act as a meniscus pinning devic ...