1
Arno Jan Bleeker, Pieter Willem Herman De Jager, Jason Douglas Hintersteiner, Borgert Kruizinga, Matthew Eugene McCarthy, Mark Oskotsky, Lev Ryzhikov, Lev Sakin, Stanislav Smirnov, Bart Snijders, Karel Diederick Van Der Mast, Huibert Visser: Imaging apparatus. ASML Netherlands, Pillsbury Winthrop, August 17, 2004: US06778257 (424 worldwide citation)

An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub ...


2
Arno Jan Bleeker: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, March 7, 2006: US07009682 (129 worldwide citation)

In an immersion lithography apparatus, an isolator is provided between the substrate table and the projection system to, for example, prevent currents in the liquid exerting forces on the projection system that might tend to distort the reference frame to which said projection system is connected. T ...


3
Arno Jan Bleeker: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, October 10, 2006: US07119881 (54 worldwide citation)

In an immersion lithography apparatus, an isolator is provided between the substrate table and the projection system to, for example, prevent currents in the liquid exerting forces on the projection system that might tend to distort the reference frame to which said projection system is connected. T ...


4
Hendrik Jan Hidde Smilde, Arno Jan Bleeker, Arie Jeffrey Den Boef, Armand Eugene Albert Koolen, Henricus Petrus Maria Pellemans, Reinder Teun Plug, Willem Marie Julia Marcel Coene: Metrology method and apparatus, lithographic apparatus, device manufacturing method and substrate. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, April 2, 2013: US08411287 (28 worldwide citation)

A metrology apparatus is arranged to illuminate a plurality of targets with an off-axis illumination mode. Images of the targets are obtained using only one first order diffracted beam. Where the target is a composite grating, overlay measurements can be obtained from the intensities of the images o ...


5
Pieter Willem Herman de Jager, Pieter Kruit, Arno Jan Bleeker, Karel Diederick van der Mast: Lithographic apparatus, device manufacturing method, and device manufactured thereby. Shirley L Church, October 14, 2003: US06633366 (26 worldwide citation)

Various options for improving throughput in an e-beam lithography apparatus are described. A slider lens moves in synchronism with the scanning motion of the electron beam.


6
Arno Jan Bleeker, Kars Zeger Troost: Lithographic apparatus and device manufacturing method. ASML Netherlands, Stern Kessler Goldstein & Fox P L L C, February 13, 2007: US07177012 (25 worldwide citation)

Lithographic apparatus using an array of individually controllable elements in which a fraction of the intensity of the beam of radiation patterned by the array of individually controllable elements is diverted to an image sensor for verifying the quality of the image generated.


7
Arie Jeffrey Maria Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Gaston Marie Kiers, Paul Frank Luehrmann, Henricus Petrus Maria Pellemans, Maurits Van Der Schaar, Cedric Desire Grouwstra, Markus Gerardus Martinus Van Kraaij: Method and apparatus for angular-resolved spectroscopic lithography characterization. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, September 7, 2010: US07791732 (21 worldwide citation)

An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity o ...


8
Arno Jan Bleeker, Kars Zeger Troost: Lithographic apparatus and device manufacturing method. ASML Netherland, Sterne Kessler Goldstein & Fox P L L C, June 21, 2011: US07965380 (19 worldwide citation)

Lithographic apparatus using an array of individually controllable elements in which a fraction of the intensity of the beam of radiation patterned by the array of individually controllable elements is diverted to an image sensor for verifying the quality of the image generated.


9
Nabila Baba Ali, Arno Jan Bleeker, Kars Zeger Troost: Light patterning device using tilting mirrors in a superpixel form. ASML Holding, ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, July 15, 2008: US07400382 (19 worldwide citation)

A light patterning system comprises an illumination system that supplies a beam of radiation having a certain wavelength (λ). An array of reflective pixels patterns the beam, wherein the array includes pixels having at least a first tilting mirror that is logically coupled to a second tilting mirror ...


10
Paulus Martinus Maria Liebregts, Arno Jan Bleeker, Erik Roelof Loopstra, Harry Borggreve: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop, March 22, 2005: US06870601 (13 worldwide citation)

A lithographic apparatus uses the control signal from a computer to drive two spatial light modulators to pattern two separate projection beams for projection onto two substrates.