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Arie Jeffrey Maria Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Gaston Marie Kiers, Paul Frank Luehrmann, Henricus Petrus Maria Pellemans, Maurits Van Der Schaar, Cedric Desire Grouwstra, Markus Gerardus Martinus Van Kraaij: Method and apparatus for angular-resolved spectroscopic lithography characterization. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, September 7, 2010: US07791732 (21 worldwide citation)

An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity o ...


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Arie Jeffrey Maria Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Gaston Marie Kiers, Paul Frank Luehrmann, Henricus Petrus Maria Pellemans, Maurits Van Der Schaar, Cedric Desire Grouwstra, Markus Gerardus Martinus Van Kraaij: Method and apparatus for angular-resolved spectroscopic lithography characterization. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, November 8, 2011: US08054467 (4 worldwide citation)

An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity o ...


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Arie Jeffrey Maria Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Gaston Marie Kiers, Paul Frank Luehrmann, Henricus Petrus Maria Pellemans, Maurits Van Der Schaar, Cedric Desire Grouwstra, Markus Gerardus Martinus Van Kraaij: Method and apparatus for angular-resolved spectroscopic lithography characterization. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, October 8, 2013: US08553230 (2 worldwide citation)

An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity o ...


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Reinder Teun Plug, Arie Jeffrey Maria Den Boef, Karel Diederick Van Der Mast: Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, June 14, 2011: US07961309 (1 worldwide citation)

A metrology tool is arranged to measure a parameter of a substrate that has been provided with a pattern in a lithographic apparatus. The metrology tool includes a base frame, a substrate table, a sensor, a displacement system, a balance mass, and a bearing. The substrate table is constructed and ar ...


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Nicolaas Petrus Van Der Aa, Arie Jeffrey Maria Den Boef, Robert Martinus Maria Mattheij, Henricus Gerhardus Ter Morsche: Optical metrology system and metrology mark characterization device. Asml Netherlands, Pillsbury Winthrop Shaw Pittman, July 5, 2007: US20070153275-A1

An optical metrology system is disclosed that has a measuring system configured to irradiate a metrology mark and record a portion of a reflected, a transmitted, or both, electromagnetic field and a characterization device configured to determine from the recorded field a mark shape parameter indica ...