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Jeroen Johannes Sophia Maria Mertens, Sjoerd Nicolaas Lambertus Donders, Roelof Frederick De Graaf, Christiaan Alexander Hoogendam, Antonius Johannus Van Der Net, Franciscus Johaannes Herman Maria Teunissen, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Edwin Van Gompel: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, May 27, 2008: US07379155 (17 worldwide citation)

A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of ...


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Antonius Johannus Van Der Net: Humidifying apparatus, lithographic apparatus and humidifying method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, January 11, 2011: US07866637 (4 worldwide citation)

A humidifying apparatus is disclosed in which gas is provided to a first side of a membrane and liquid to a second side of the same membrane. The membrane is non-porous to the liquid but porous to vapor of the liquid and is liquidphilic to said liquid.


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Jeroen Johannes Sophia Maria Mertens, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Antonius Johannus Van Der Net, Franciscus Johannes Herman Maria Teunissen, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Edwin Van Gompel: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, January 13, 2015: US08934082 (3 worldwide citation)

A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of ...


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Jeroen Johannes Sophia Maria Mertens, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Antonius Johannus Van Der Net, Franciscus Johannes Herman Maria Teunissen, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Edwin Augustinus Matheus Van Gompel: Lithographic apparatus and device manufacturing method. ASML NETHERLANDS, Pillsbury Winthrop Shaw Pittman, September 6, 2016: US09436097 (1 worldwide citation)

A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of ...


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Jeroen Johannes Sophia Maria Mertens, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Antonius Johannus Van Der Net, Franciscus Johannes Herman Maria Teunissen, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Edwin Van Gompel: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 23, 2011: US08004652 (1 worldwide citation)

A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of ...


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Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Martinus Hendrikus Antonius Leenders, Antonius Johannus Van Der Net, Peter Franciscus Wanten, Jacques Cor Johan Van Der Donck, Robert Douglas Watso, Teunis Cornelis Van Den Dool, Nadja Schuh, Jan Willem Cromwijk: Lithographic apparatus and contamination removal or prevention method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, March 29, 2011: US07916269 (1 worldwide citation)

An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentra ...


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Pieter Jacob Kramer, Antonius Johannus Van Der Net, Erik Henricus Egidius Catharina Eummelen, Anthonie Kuijper: Lithographic apparatus and a method of measuring flow rate in a two phase flow. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, May 21, 2013: US08446561 (1 worldwide citation)

A lithographic apparatus is disclosed that includes a conduit for two phase flow therethrough. A flow separator is provided to separate the two phase flow into a gas flow and a liquid flow. A flow meter measures the flow rate of fluid in the gas flow or the liquid flow.


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