1
Charles Szmanda
Charles R Szmanda, Anthony Zampini: Solvents and photoresist compositions for short wavelength imaging. Shipley Company L L C, Peter F Corless, Darryl P Frickey, Edwards & Angell, September 7, 2004: US06787286 (16 worldwide citation)

New photoresists are provides that are suitable for short wavelength imaging, particularly sub-170 nm such as 157 nm. Resists of the invention comprise a fluorine-containing polymer, a photoactive component, and a solvent component. Preferred solvents for use on the resists of the invention can main ...


2
Charles Szmanda
Anthony Zampini, Charles R Szmanda, Gary N Taylor, James F Cameron, Gerhard Pohlers: Photoresist compositions for short wavelength imaging. Shipley Company L L C, Peter F Corless, Darryl P Prickey, Edwards & Angell, February 22, 2005: US06858379 (7 worldwide citation)

New photoresists are provided that are suitable for short wavelength imaging, including sub-200 nm such as 157 nm. In one aspect, resists of the invention comprise a fluorine-containing polymer, a photoactive component, and one or more additional components of an amine or other basic composition, a ...


3
Charles Szmanda
Charles R Szmanda, Peter Trefonas III, Richard C Hemond, Mark S Thirsk, Leo L Linehan, Anthony Zampini: Method and system for recycling materials. Shipley Company L L C, Marisa J Dubuc, S Matthew Cairns, June 14, 2005: US06907432 (2 worldwide citation)

A system and method is provided for recycling raw materials from a plurality waste streams generated by waste stream providers and includes a waste stream monitoring module for monitoring the plurality of waste streams and determining an amount of reusable raw materials contained in each of the plur ...


4
Charles Szmanda
Charles R Szmanda, Anthony Zampini: Solvents and photoresist compositions for short wavelength imaging. Shipley Company, Edwards & Angell, February 20, 2003: US20030036016-A1 (1 worldwide citation)

New photoresists are provides that are suitable for short wavelength imaging, particularly sub-170 nm such as 157 nm. Resists of the invention comprise a fluorine-containing polymer, a photoactive component, and a solvent component. Preferred solvents for use on the resists of the invention can main ...


5
Charles Szmanda
Anthony Zampini, Charles R Szmanda, Sungseo Cho, Gary N Taylor: Novel polymers and photoresist compositions comprising electronegative groups. Shipley Company, Peter F Corless, Edwards & Angell, May 16, 2002: US20020058199-A1 (1 worldwide citation)

The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm, particularly 157 nm. ...


6
Charles Szmanda
Anthony Zampini, Charles R Szmanda, Gary N Taylor, James F Cameron, Gerhard Pohlers: Photoresist compositions for short wavelength imaging. Shipley Company, Edwards & Angell, Dike Bronstein Roberts & Cushman IP Group, February 6, 2003: US20030027077-A1

New photoresists are provided that are suitable for short wavelength imaging, including sub-200 nm such as 157 nm. In one aspect, resists of the invention comprise a fluorine-containing polymer, a photoactive component, and one or more additional components of an amine or other basic composition, a ...


7
Charles Szmanda
Charles R Szmanda, Anthony Zampini: Solvents and photoresists compositions for short wavelength imaging. Shipley Company, Peter F Corless, Edwards & Angell, October 21, 2004: US20040209188-A1

New photoresists are provides that are suitable for short wavelength imaging, particularly sub-170 nm such as 157 nm. Resists of the invention comprise a fluorine-containing polymer, a photoactive component, and a solvent component. Preferred solvents for use on the resists of the invention can main ...


8
Charles Szmanda
Kathleen M O Connell, Anthony Zampini, Kathleen B Spear Alfonso, James Michael Mori, Charles R Szmanda: Adhesion promoter for ferroelectric polymer films. Rohm and Haas Electronic Materials, Peter F Corless, Rohm and Haas Electronic Materials, July 6, 2006: US20060147730-A1

A silane adhesion promoter composition is useful in producing a ferroelectric polymer film that is especially suitable for use in a data processing device. Also disclosed is a film stack and a data processing device comprising a ferroelectric film produced using the silane adhesion promoter


9
Dana Gronbeck
Dana A Gronbeck, Amy M Kwok, Chi Q Truong, Michael K Gallagher, Anthony Zampini: Antireflective hard mask compositions. Rohm And Haas Electronic Materials, Peter F Corless, Rohm and Haas Electronic Materials, November 25, 2010: US20100297539-A1

The invention includes new organic-containing compositions that can function as an antireflective layer for an overcoated photoresist. Compositions of the invention also can serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectivity from an undercoated layer. Preferred ...


10
Maricela Morales
Anthony Zampini, Sungseo Cho, Peter Trefonas: Novel polymers and photoresist compositions comprising labile polymer backbones for short wave imaging. Shipley Company, Peter F Corless, Edwards & Angell, March 28, 2002: US20020037472-A1

The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-300 nm, particularly 157 nm. ...