1
Ana Londergan
Ana R Londergan, Thomas E Seidel, Lawrence D Matthysse, Ed C Lee: Method and apparatus for flexible atomic layer deposition. Genus, Blakley Sokoloff Taylor & Zafman, June 14, 2005: US06905547 (36 worldwide citation)

An apparatus with a processing chamber subjects a substrate to atomic layer deposition and deposits a film layer. The processing chamber includes at least a first gas switching port. A gas switching manifold is coupled to the processing chamber and configured to mix reactants with a neutral carrier ...


2
Ana Londergan
Gi Youl Kim, Anuranjan Srivastava, Thomas E Seidel, Ana R Londergan, Sasangan Ramanathan: Transient enhanced atomic layer deposition. Aixtron, SNR Denton US, July 19, 2011: US07981473 (36 worldwide citation)

A process in which a wafer is exposed to a first chemically reactive precursor dose insufficient to result in a maximum saturated ALD deposition rate on the wafer, and then to a second chemically reactive precursor dose, the precursors being distributed in a manner so as to provide substantially uni ...


3
Ana Londergan
Ana R Londergan, Sasangan Ramanathan, Jereld Winkler, Thomas E Seidel: Passivation method for improved uniformity and repeatability for atomic layer deposition and chemical vapor deposition. Genus, Blakely Sokoloff Taylor & Zafman, April 13, 2004: US06720259 (26 worldwide citation)

A method to deposit a passivating layer of a first material on an interior reactor surface of a cold or warm wall reactor, in which the first material is non-reactive with one or more precursor used to form a second materials. Subsequently when a film layer is deposited on a substrate by subjecting ...


4
Ana Londergan
Ana R Londergan, Bangalore R Natarajan, Evgeni Gousev, James Randolph Webster, David Heald: MEMS cavity-coating layers and methods. Qualcomm Mems Technologies, Knobbe Martens Olson & Bear, June 8, 2010: US07733552 (12 worldwide citation)

Devices, methods, and systems comprising a MEMS device, for example, an interferometric modulator, that comprises a cavity in which a layer coats multiple surfaces. The layer is conformal or non-conformal. In some embodiments, the layer is formed by atomic layer deposition (ALD). Preferably, the lay ...


5
Ana Londergan
Ana R Londergan, Thomas E Seidel: Methods and procedures for engineering of composite conductive films by atomic layer deposition. Genus, Sonnenschein Nath & Rosenthal, October 31, 2006: US07129580 (6 worldwide citation)

A composite film comprised of three layers is formed by ALD on a substrate with a substrate interface surface. A first layer is coupled to the substrate interface surface. The first layer provides adhesion to the substrate interface surface and initiation of layer by layer ALD growth. A second layer ...


6
Ana Londergan
Jeremie J Dalton, M Ziaul Karim, Ana R Londergan: Methods of providing uniform gas delivery to a reactor. Aixtron, SNR Denton US, July 19, 2011: US07981472 (5 worldwide citation)

A method of introducing gasses through a gas distribution system into a reactor involves flowing the gasses through at least two distinct gas source orifice arrays displaced from one another along an axis defined by a gas flow direction from the gas source orifice arrays towards a work-piece. During ...


7
Ana Londergan
Ana R Londergan, Bangalore R Natarajan, Evgeni Gousev, James Randolph Webster, David Heald: MEMS cavity-coating layers and methods. Qualcomm Mems Technologies, Knobbe Martens Olson & Bear, April 24, 2012: US08164815 (4 worldwide citation)

Devices, methods, and systems comprising a MEMS device, for example, an interferometric modulator, that comprises a cavity in which a layer coats multiple surfaces. The layer is conformal or non-conformal. In some embodiments, the layer is formed by atomic layer deposition (ALD). Preferably, the lay ...


8
Ana Londergan
Ana R Londergan, Thomas E Seidel: Methods and procedures for engineering of composite conductive films by atomic layer deposition. Genus, Sonnenschein Nath & Rosenthal, February 27, 2007: US07183649 (3 worldwide citation)

A composite film comprised of three layers is formed by ALD on a substrate with a substrate interface surface. A first layer is coupled to the substrate interface surface. The first layer provides adhesion to the substrate interface surface and initiation of layer by layer ALD growth. A second layer ...


9
Ana Londergan
Ana R Londergan, Thomas E Seidel: Methods and procedures for engineering of composite conductive by atomic layer deposition. Genus, Sonnenschein Nath & Rosenthal, January 16, 2007: US07164203 (2 worldwide citation)

A composite film comprised of three layers is formed by ALD on a substrate with a substrate interface surface. A first layer is coupled to the substrate interface surface. The first layer provides adhesion to the substrate interface surface and initiation of layer by layer ALD growth. A second layer ...


10
Ana Londergan
Khurshid Syed Alam, Evgeni Gousev, Marc Maurice Mignard, David Heald, Ana R Londergan, Philip Don Floyd: Equipment and methods for etching of MEMS. QUALCOMM MEMS Technologies, Knobbe Martens Olson & Bear, September 17, 2013: US08536059 (1 worldwide citation)

Etching equipment and methods are disclosed herein for more efficient etching of sacrificial material from between permanent MEMS structures. An etching head includes an elongate etchant inlet structure, which may be slot-shaped or an elongate distribution of inlet holes. A substrate is supported in ...