1
Alex Ka Tim Poon, Leonard Wai Fung Kho: Apparatus and method for providing fluid for immersion lithography. Nikon Corporation, Oliff & Berridge, November 6, 2007: US07292313 (78 worldwide citation)

Systems and methods control the fluid flow and pressure to provide stable conditions for immersion lithography. A fluid is provided in a space between a lens and a substrate during the immersion lithography process. Fluid is supplied to the space and is recovered from the space through a porous memb ...


2
Alex Ka Tim Poon: Positioning device and exposure apparatus including the same. Nikon Corporation, Finnegan Henderson Farabow Garrett & Dunner L, September 14, 2004: US06791669 (28 worldwide citation)

A positioning device for positioning a wafer table and an exposure apparatus including the positioning device are disclosed. The positioning device includes a housing, a piezoelectric actuator, and a structure for moving the wafer table in a second direction. The piezoelectric actuator has a first a ...


3
Alex Ka Tim Poon, Leonard Wai Fung Kho, Guarav Keswani, Derek Coon: Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool. Nikon Corporation, Oliff & Berridge, November 29, 2011: US08068209 (26 worldwide citation)

An immersion lithography tool with a diverter element, positioned between the immersion element and the substrate, for altering the “footprint” or shape of the meniscus of the body of immersion liquid between the last optical element and an immersion element on one side, and the substrate on the oth ...


4
Alex Ka Tim Poon, Leonard Wai Fung Kho, Derek Coon, Gaurav Keswani: Apparatus and methods for recovering fluid in immersion lithography. Nikon Corporation, Oliff & Berridge, October 16, 2012: US08289497 (25 worldwide citation)

An immersion lithography apparatus includes a projection system having a final optical element, a movable stage that is movable below the projection system such that a gap exists between the final optical element and a surface of the stage, an immersion liquid being filled in the gap, a liquid confi ...


5
Alex Ka Tim Poon, Leonard Wai Fung Kho, Derek Coon, Gaurav Keswani: Apparatus and methods for recovering fluid in immersion lithography. Nikon Corporation, Oliff, January 13, 2015: US08934080 (24 worldwide citation)

An immersion lithography apparatus includes a projection system having a final optical element, a movable stage that is movable below the projection system such that a gap exists between the final optical element and a surface of the stage, an immersion liquid being filled in the gap, a liquid confi ...


6
Alex Ka Tim Poon, Leonard Wai Fung Kho, Gaurav Keswani, Derek Coon, Daishi Tanaka: Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine. Nikon Corporation, Oliff, June 3, 2014: US08743343 (23 worldwide citation)

A lithographic projection apparatus includes a projection optical assembly having a final optical element, a stage assembly including a substrate table on which a substrate is supported, the substrate supported by the substrate table being exposed with an exposure beam from the final optical element ...


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Alex Ka Tim Poon, Leonard Wai Fung Kho, Derek Coon, Gaurav Keswani, Daishi Tanaka: Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate. Nikon Corporation, Oliff & Berridge, December 17, 2013: US08610873 (18 worldwide citation)

An immersion lithography apparatus includes a projection system having a final optical element and a stage that is movable to a position below the projection system such that a gap exists between the final optical element and a surface of the stage. An immersion liquid fills the gap between the surf ...


9
Alex Ka Tim Poon, Leonard Wai Fung Kho, Gaurav Keswani, Derek Coon: Gas curtain type immersion lithography tool using porous material for fluid removal. Nikon Corporation, Oliff & Berridge, August 18, 2009: US07576833 (13 worldwide citation)

A gas curtain type immersion lithography apparatus has a fluid removing porous region adjacent the gas inlet to prevent evaporative cooling. The apparatus includes a substrate holder which holds a substrate having an imaging surface and a projection optical system having a last optical element. The ...


10
Alex Ka Tim Poon, Leonard Wai Fung Kho, Pai Hsueh Yang, Ping Wei Chang: Modular stage with reaction force cancellation. Nikon Corporation, Ritter Lang & Kaplan, July 12, 2005: US06917412 (11 worldwide citation)

Methods and apparatus for providing a stage apparatus which is modular and allows for reaction force cancellation are described. According to one aspect of the present invention, a stage apparatus includes a table assembly and a first stage. The table assembly supports an object, e.g., a wafer or a ...