1
Santiago del Puerto, Erik R Loopstra, Andrew Massar, Duane P Kish, Abdullah Alikhan, Woodrow J Olson, Jonathan H Feroce: System for using a two part cover for protecting a reticle. ASML Holding, Sterne Kessler Goldstein & Fox P L L C, June 14, 2005: US06906783 (37 worldwide citation)

A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or b ...


2
Santiago del Puerto, Erik R Loopstra, Andrew Massar, Duane P Kish, Abdullah Alikhan, Woodrow J Olson, Jonathan H Feroce: System for using a two part cover for and a box for protecting a reticle. ASML Holding, Sterne Kessler Goldstein & Fox P L L C, April 24, 2007: US07209220 (17 worldwide citation)

A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or b ...


3
Santiago del Puerto, Eric R Loopstra, Andrew Massar, Duane P Kish, Abdullah Alikhan, Woodrow J Olson, Jonathan H Feroce: System for using a two part cover for protecting a reticle. ASML Holding, Sterne Kessler Goldstein and Fox P L L C, December 4, 2007: US07304720 (16 worldwide citation)

A system and method are used to protect a mask from being contaminated by airborne particles. They include coupling a reticle and a cover to protect the reticle. The cover includes a frame and a movable panel that moves to allow direct access of light to the reticle during an exposure process. The r ...


4
Santiago del Puerto, Erik R Loopstra, Andrew Massar, Duane P Kish, Abdullah Alikhan, Woodrow J Olsen, Jonathan H Feroce: System and method for using a two part cover and a box for protecting a reticle. ASML Holding, Sterne Kessler Goldstein & Fox P L L C, November 9, 2010: US07830497 (6 worldwide citation)

Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can b ...


5
Santiago Del Puerto, Erik R Loopstra, Andrew Massar, Duane P Kish, Abdullah Alikhan, Woodrow J Olsen, Jonathan H Feroce: System and method for using a two part cover and a box for protecting a reticle. ASML Holding, Sterne Kessler Goldstein & Fox P L L C, May 21, 2013: US08446570 (2 worldwide citation)

Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can b ...


6
Earl William Ebert Jr, Johannes Onvlee, Samir A Nayfeh, Mark Josef Schuster, Peter A Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame, Thomas Venturino: Reticle cooling system in a lithographic apparatus. ASML Holding, ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, April 25, 2017: US09632434 (2 worldwide citation)

A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the ...


7
Earl William Ebert Jr, Johannes Onvlee, Samir A Nayfeh, Mark Josef Schuster, Peter A Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame: Patterning device support, lithographic apparatus, and method of controlling patterning device temperature. ASML Holding, ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, April 25, 2017: US09632433 (2 worldwide citation)

A patterning device support (1100) for controlling a temperature of a patterning device (1102) can include a movable component (1104). The movable component can include a gas inlet (1108) for supplying a gas flow across a surface of the patterning device and a gas outlet (1110) for extracting the ga ...


8
Earl William Ebert, Johannes Onvlee, Samir A Nayfeh, Mark Josef Schuster, Peter A Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame: Patterning device support, lithographic apparatus, and method of controlling patterning device temperature. ASML Holding, ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, September 19, 2017: US09766557 (1 worldwide citation)

A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device suppo ...


9
Santiago del Puerto, Erik R Loopstra, Andrew Massar, Duane P Kish, Abdullah Alikhan, Woodrow J Olson, Jonathan H Feroce: System and method for using a two part cover for protecting a reticle. ASML Netherlands, Sterne Kessler Goldstein & Fox Pllc, November 27, 2003: US20030218728-A1 (1 worldwide citation)

A system and method are used to protect a mask from being contaminated by airborne particles. They include coupling a reticle and a cover to protect the reticle. The cover includes a frame and a movable panel that moves to allow direct access of light to the reticle during an exposure process. The r ...


10
Earl William Ebert, Johannes Onvlee, Samir A Nayfeh, Mark Josef Schuster, Peter A Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame: Patterning device support, lithographic apparatus, and method of controlling patterning device temperature. ASML Holding, ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, May 22, 2018: US09977351

A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device suppo ...