1
Hiroyasu Shichi, Tohru Ishitani, Hidemi Koike, Kaoru Umemura, Eiichi Seya, Mitsuo Tokuda, Satoshi Tomimatsu, Hideo Kashima, Muneyuki Fukuda: Method and apparatus for specimen fabrication. Hitachi December 16, 2003: US06664552 (54 worldwide citation)

A sample fabricating method of irradiating a sample with a focused ion beam at an incident angle less than 90 degrees with respect to the surface of the sample, eliminating the peripheral area of a micro sample as a target, turning a specimen stage around a line segment perpendicular to the sample s ...


2
Mitsuo Tokuda, Muneyuki Fukuda, Yasuhiro Mitsui, Hidemi Koike, Satoshi Tomimatsu, Hiroyasu Shichi, Hideo Kashima, Kaoru Umemura: Method and apparatus for processing a micro sample. Hitachi August 24, 2004: US06781125 (49 worldwide citation)

An object of the invention is to realize a method and an apparatus for processing and observing a minute sample which can observe a section of a wafer in horizontal to vertical directions with high resolution, high accuracy and high throughput without splitting any wafer which is a sample. In an app ...


3
Masakazu Sugaya, Hiroyasu Shichi, Muneyuki Fukuda, Kaoru Umemura, Hidemi Koike: Beam as well as method and equipment for specimen fabrication. Hitachi April 6, 2004: US06717156 (45 worldwide citation)

There are disclosed a method for fabricating (processing) a micro-sample used for the observation, analysis, and measurement by, for example, a transmission electron microscope (TEM), and an equipment for specimen fabrication (processing) used for carrying out the method. With the method for specime ...


4
Ken Ninomiya, Hideo Todokoro, Tokuo Kure, Yasuhiro Mitsui, Katsuhiro Kuroda, Hiroyasu Shichi: Surface analysis method and apparatus for carrying out the same. Hitachi January 2, 1996: US05481109 (44 worldwide citation)

A surface analysis method and an apparatus for carrying out the samein which the method involves the detection of fluorescence X-rays emitted from the surface of a sample in response to a finely focused electron beam irradiated thereto, whereby residues on the sample surface are analyzed qualitative ...


5
Mitsuo Tokuda, Muneyuki Fukuda, Yasuhiro Mitsui, Hidemi Koike, Satoshi Tomimatsu, Hiroyasu Shichi, Hideo Kashima, Kaoru Umemura: Method and apparatus for processing a micro sample. Hitachi August 9, 2005: US06927391 (30 worldwide citation)

An object of the invention is to realize a method and an apparatus for processing and observing a minute sample which can observe a section of a wafer in horizontal to vertical directions with high resolution, high accuracy and high throughput without splitting any wafer which is a sample. In an app ...


6
Hifumi Tamura, Hiroyasu Shichi: Ion source. Hitachi August 18, 1987: US04687938 (27 worldwide citation)

An ion source includes an ion source material holder adapted to load an ion source material thereon and having an aperture at the bottom thereof, an ion emitter mounted on the ion source material holder at the aperture, heating means for heating the ion source material holder and the ion emitter, an ...


7
Satoshi Tomimatsu, Muneyuki Fukuda, Hiroyasu Shichi: Apparatus for specimen fabrication and method for specimen fabrication. Hitachi High Technologies Corporation February 22, 2005: US06858851 (25 worldwide citation)

A micro-sample prepared by processing with an ion beam is extracted by a probe and, in this state, a voltage is applied across the probe and a micro-sample holder by a circuit for sending electric current to probe. Thereafter, a probe driver is moved by a probe position controller to cause a portion ...


8
Yoshinori Ikebe, Hifumi Tamura, Hiroyasu Shichi, Eiichi Izumi: Apparatus for generating metal ions. Hitachi September 27, 1988: US04774433 (17 worldwide citation)

A mixture of an alkali metal compound and its reducing agent is heated by a heating means, whereby alkali metal vapors are generated and stored in a vapor reserver. The thus stored vapors permeate through a porous member heated by another heating means and are ionized. The thus formed ions are withd ...


9
Mitsuo Tokuda, Muneyuki Fukuda, Yasuhiro Mitsui, Hidemi Koike, Satoshi Tomimatsu, Hiroyasu Shichi, Hideo Kashima, Kaoru Umemura: Method and apparatus for processing a micro sample. Hitachi April 17, 2007: US07205554 (14 worldwide citation)

An object of the invention is to realize a method and an apparatus for processing and observing a minute sample which can observe a section of a wafer in horizontal to vertical directions with high resolution, high accuracy and high throughput without splitting any wafer which is a sample. In an app ...


10
Mitsuo Tokuda, Muneyuki Fukuda, Yasuhiro Mitsui, Hidemi Koike, Satoshi Tomimatsu, Hiroyasu Shichi, Hideo Kashima, Kaoru Umemura: Method and apparatus for processing a micro sample. Hitachi April 17, 2007: US07205560 (14 worldwide citation)

An object of the invention is to realize a method and an apparatus for processing and observing a minute sample which can observe a section of a wafer in horizontal to vertical directions with high resolution, high accuracy and high throughput without splitting any wafer which is a sample. In an app ...



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