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Cristiano Maria de Lurdes Dos, Davies John Kynaston, Dowd Sharon, Johnstone Robert Walter Walker, Pratt Michael John, Wade John Robert: Photoactive materials applicable to imaging systems.. Agfa Gevaert, June 30, 1999: EP0926555-A1 (3 worldwide citation)

Organic photoprecursors of amines are provided for use in photosensitive imaging systems, finding particular application in the preparation of lithographic printing plates. Said photoprecursors generate free amines on exposure to long wavelength UV or visible radiation, have high solubility in organ ...


2
Cristiano Maria de Lurdes Dos, Davies John Kynaston, Dowd Sharon, Johnstone Robert Alexander Wal, Pratt Michael John, Wade John Robert: Photoprecursors with photolabile 2-nitrobenzyl structure, which generate free amines on exposure to uv or visible radiation, & photosensitive imaging systems. Agfa Gevaert, June 30, 1999: GB2332672-A

Organic photoprecursors of amines are provided for use in photosensitive imaging systems, finding particular application in the preparation of lithographic printing plates. Said photoprecursors generate free amines on exposure to long wavelength UV or visible radiation, have high solubility in organ ...


3
Cristiano Maria de Lurdes Dos S, Davies John Kynaston, Dowd Sharon, Johnstone Robert A W, Pratt Michael John, Wade John R: Optically active material applicable to image-forming system. Agfa Gevaert, October 19, 1999: JP1999-286475

PROBLEM TO BE SOLVED: To obtain a highly photosensitive compound capable of carrying out an effective photoreaction and providing a basic material during the photoreaction. SOLUTION: An organic photoprecursor of an amine for use in a photosensitive image-forming system finding out a special use in p ...