Douglas Bell, Michael Leabman: Off-premises alert system and method for wireless power receivers in a wireless power network. Energous Corporation, Eric L Sophir, Dentons US, June 14, 2016: US09368020 (118 worldwide citation)

Embodiments in the present disclosure may be directed to an off-premises alert system and method for one or more wireless power receivers in a wireless power network. The system and method may include automated software embedded on a wireless power receiver that may be triggered every time a wireles ...

Bruce W McBee, Gregg James Haensgen, John Fredrick Banting, William J Kostolni, Bryan C Cochran: Adjustable overhead conductor monitoring device. COOPER TECHNOLOGIES COMPANY, King & Spalding, June 14, 2016: US09368275 (113 worldwide citation)

An apparatus is provided for securing to and collecting power from an electrical conductor, including a current transformer comprising a core and an electrical winding that receives an induced current from magnetic flux generated according to alternating current present on the electrical conductor, ...

Jonathan W Hui, Jean Philippe Vasseur, Wei Hong: Path diversity with poly-phase links in a power line communication network. Cisco Technology, Parker Ibrahim & Berg, James M Behmke, Kenneth J Heywood, June 14, 2016: US09369177 (76 worldwide citation)

In one embodiment, a node in a network receives communication channel data regarding one or more communication channels available between a particular device in the network and a neighboring device. Each communication channel corresponds to one or more electrical phases over which the particular dev ...

Peter J Pupalaikis, Kaviyesh Doshi, Roger Delbue, Anirudh Sureka: Time domain network analyzer. Teledyne LeCroy, Andrew Dommer, June 14, 2016: US09366743 (69 worldwide citation)

An apparatus for measuring s-parameters using as few as one pulser and two samplers is described. The apparatus calibrates itself automatically using the internal calibration standards.

John N Border, Joseph Bietry, John D Haddick: Optical systems for see-through displays. Osterhout Group, GTC Law Group PC & Affiliates, June 14, 2016: US09366867 (64 worldwide citation)

Aspects of the present invention relate to methods and systems for providing a high quality display images in see-through head-worn optics.

John N Border, Joseph Bietry, Gregory Hires: See-through computer display systems. Osterhout Group, GTC Law Group PC & Affiliates, June 14, 2016: US09366868 (62 worldwide citation)

Aspects of the present invention relate to providing see-through computer display optics.

Qing Ma, Johanna M Swan, Min Tao, Charles A Gealer, Edward A Zarbock: Interposer for hermetic sealing of sensor chips and for their integration with integrated circuit chips. Intel Corporation, Blakely Sokoloff Taylor & Zafman, June 14, 2016: US09368429 (61 worldwide citation)

Integration of sensor chips with integrated circuit (IC) chips. At least a first sensor chip including a first sensor is affixed to a first side of an interposer to hermitically seal the first sensor within a first cavity. An IC chip is affixed to a second side of the interposer opposite the first s ...

Frederick E Shelton IV, Jeffrey S Swayze, Chester O Baxter III: Surgical stapling instruments with rotary joint assemblies. Ethicon Endo Surgery, June 14, 2016: US09364230 (58 worldwide citation)

A rotary support joint assembly for coupling a first portion of a surgical instrument to a second portion of a surgical instrument. In various forms the joint assembly includes a first annular race in the first portion and a second annular race in the second portion. The second race is configured fo ...

Johnny H Alexander III, Cortney E Henderson, Christopher C Miller, John P Measamer, Katherine J Schmid, Frederick E Shelton IV, Stephanie A Mutchler, Bret W Smith, Michael S Cropper: Tissue thickness compensators for circular surgical staplers. Ethicon Endo Surgery, June 14, 2016: US09364233 (51 worldwide citation)

Tissue thickness compensators for use with circular surgical staplers. Various tissue thickness compensators are disclosed for deployment between a stapler head of a surgical circular stapler and an anvil attached thereto to accommodate variances in tissue thickness during stapling. Some tissue thic ...

Seung Park, Anchuan Wang: and other materials, Silicon etch process with tunable selectivity to SiO. Applied Materials, Kilpatrick Townsend & Stockton, June 14, 2016: US09368364 (47 worldwide citation)

A tunable plasma etch process includes generating a plasma in a controlled flow of a source gas including NH3 and NF3 to form a stream of plasma products, controlling a flow of un-activated NH3 that is added to the stream of plasma products to form an etch gas stream; and controlling pressure of the ...