David Sherrer
Dan A Steinberg, David W Sherrer, Mindaugas F Dautargas: Optical device package. Shipley Company, Jonathan D Baskin, Edwards & Angell, August 18, 2005: US20050180701-A1

An optical device package includes a substrate having a top portion with an a recess for receiving an optical semiconductor component and an elongated linear groove for receiving an optical fiber. The optical fiber is positioned within the groove in said substrate such that the top surface of the op ...

Belgacem Haba Belgacem (Bel) Haba
Belgacem Haba, Masud Beroz, Ronald Green, Ilyas Mohammed, Stuart E Wilson, Wael Zohni, Yoichi Kubota, Jesse Burl Thompson: Microelectronic packages and methods therefor. Tessera, Lerner David Litenberg Krumholz & Mentlik, August 18, 2005: US20050181544-A1

A microelectronic package includes a microelectronic element having faces and contacts and a flexible substrate spaced from and overlying a first face of the microelectronic element. The package also includes a plurality of conductive posts extending from the flexible substrate and projecting away f ...

Belgacem Haba Belgacem (Bel) Haba
Belgacem Haba, Masud Beroz, Giles Humpston, Jae M Park: Micro pin grid array with wiping action. Tessera, Lerner David Litenberg Krumholz & Mentlik, August 18, 2005: US20050181655-A1

A microelectronic package includes a mounting structure, a microelectronic element associated with the mounting structure, and a plurality of conductive posts physically connected to the mounting structure and electrically connected to the microelectronic element. The conductive posts project from t ...

Maricela Morales
Peter Trefonas, Sungseo Cho, David L Goff, J Ioan Matthews, Hao Yun: Coating compositions. Rohm and Haas Electronic Materials, Peter F Corless, Edwards & Angell, August 18, 2005: US20050181299-A1

Coating compositions are provided that include a component that is a product of materials comprising an amine and an anhydride and/or an anhydride derivative. Compositions of the invention are particularly useful as an underlying antireflective coating composition (“ARC”) employed with an overcoated ...

Smith Bruce W: Method of photolithography using a fluid and a system thereof. Rochester Institute Of Technology, LEINBERG Gunnar G, August 18, 2005: WO/2005/074606 (351 worldwide citation)

A photolithographic exposure system for use on a photoresis on a substrate includes an illumination system, a photomask with one or more object patterns, a projection optical exposure system, and a fluid dispensing system. The projection optical exposure system is positioned to project an image of t ...

Rostalski Hans Jürgen, Dodoc Aurelian: Projection objective for a microlithographic projection exposure apparatus. Carl Zeiss Smt, Rostalski Hans Jürgen, Dodoc Aurelian, SCHWANHÄUSSER Gernot, August 18, 2005: WO/2005/076084 (342 worldwide citation)

A projection objective of a microlithographic projection exposure apparatus (10) has a last optical element (23; 123; 223; 323; 423) on the image side which is plane on the image side and which, together with an image plane (28) of the projection objective (20; 120; 220, 320; 420), delimits an immer ...

Takaiwa Hiroaki, Horiuchi Takashi: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method of producing device. Nikon Corporation, Takaiwa Hiroaki, Horiuchi Takashi, SHIGA Masatake, August 18, 2005: WO/2005/076321 (123 worldwide citation)

(EN) Provided is an exposure apparatus for exposing a substrate by irradiating exposure light on the substrate through a projection optical system and liquid, where the exposure apparatus has a detection device for detecting whether or not the liquid is present on an object placed below the forward ...


Jones William J: Document processing system using captured primary and secondary pictorial images which are compared to respective master images. Cummins Allison, Jones William J, KITCH Paul R, August 18, 2005: WO/2005/076229 (94 worldwide citation)

A document identification system having an input and output receptacle, a transport path, and an image scanner. Primary visible pictorial images and secondary invisible pictorial images are captured by the image scanner. A processor compares the primary and secondary captured pictorial images with m ...

Shiraishi Kenichi: (Ja) 露光装置及びデバイス製造方法、メンテナンス方法及び露光方法, (En) Aligner, device manufacturing method, maintenance method and aligning method. Nikon Corporation, Shiraishi Kenichi, SHIGA Masatake, August 18, 2005: WO/2005/076323 (90 worldwide citation)

(EN) An aligner which eliminates a problem of supplying a liquid having deteriorated cleanliness and a problem of forming a water mark. The aligner (EX) projects exposure light (EL) on a substrate (P) through a projection optical system (PL) and a liquid (LQ) and exposes the substrate (P). The align ...