1
Jean-luc Dubois
Jean Luc Dubois, Stephanie Serreau, Julien Jacquel: Method for producing acrylic acid from propane in the absence of molecular oxygen. Millen White Zelano & Branigan PC, March 10, 2005: US20050054880-A1

The invention concerns a method for producing acrylic acid from propane in the absence of molecular oxygen. Said method is characterized in that it consists in passing a gas mixture free of molecular oxygen and comprising propane, water vapour, as well as, optionally, an inert gas, over a catalyst i ...


2
Eugene Fitzgerald
Matthew Currie, Anthony Lochtefeld, Richard Hammond, Eugene Fitzgerald: Semiconductor structures employing strained material layers with defined impurity gradients and methods for fabricating same. AmberWave Systems Corporation, Testa Hurwitz & Thibeault, March 10, 2005: US20050054168-A1

Semiconductor structures and devices including strained material layers having impurity-free zones, and methods for fabricating same. Certain regions of the strained material layers are kept free of impurities that can interdiffuse from adjacent portions of the semiconductor. When impurities are pre ...


3
Matthias Bauer
Matthias Bauer: Deposition of silicon germanium on silicon-on-insulator structures and bulk substrates. Knobbe Martens Olson & Bear, March 10, 2005: US20050054175-A1

Methods are provided for producing SiGe-on-insulator structures and for forming strain-relaxed SiGe layers on silicon while minimizing defects. Amorphous SiGe layers are deposited by CVD from trisilane and GeH4. The amorphous SiGe layers are recrystallized over silicon by melt or solid phase epitaxy ...


4
Pawloski Adam R, Ado Amr Y, Amblard Gilles R, Lafontaine Bruno M, Lalovic Ivan, Levinson Harry J, Schefske Jeffrey A, Tabery Cyrus E, Tsai Frank: Immersion medium bubble elimination in immersion lithography. Advanced Micro Devices, Pawloski Adam R, Ado Amr Y, Amblard Gilles R, Lafontaine Bruno M, Lalovic Ivan, Levinson Harry J, Schefske Jeffrey A, Tabery Cyrus E, Tsai Frank, sCOLLOPY Daniel R, March 10, 2005: WO/2005/022266 (372 worldwide citation)

A method of operating an immersion lithography system (26), including steps of immersing at least a portion of a wafer (12) to be exposed in an immersion medium (24), wherein the immersion medium comprises at least one bubble (28); directing an ultrasonic wave (36) through at least a portion of the ...


5
Fish David A, Hector Jason R: Active matrix display devices. Koninklijke Philips Electronics, Fish David A, Hector Jason R, WILLIAMSON Paul L, March 10, 2005: WO/2005/022498 (129 worldwide citation)

An active matrix LED display has a light-dependent device for detecting the brightness of the display element and threshold voltage measurement circuitry for measuring a threshold voltage of a pixel the drive transistor. Compensation for ageing of the display element is thus provided by an optical f ...


6
Numamoto Michael J, Quijano Rodolfo C, Tu Hosheng: Medical device for reduction of pressure effects of cardiac tricuspid valve regurgitation. 3f Therapeutics, Kim Michelle C, March 10, 2005: WO/2005/021063 (126 worldwide citation)

An elongate valve stent and methods for protecting an upper or a lower body of a patient from high venous pressures comprising a stent member, the stent member comprising a support structure and a tissue valve, wherein the tissue valve is configured to permit fluid flow in one direction and prevent ...


7
Iyengar Sridhar G, Harding Ian: Method and apparatus for assay of electrochemical properties. Agamatrix, Iyengar Sridhar G, Harding Ian, LARSON Marina T, March 10, 2005: WO/2005/022143 (125 worldwide citation)

The presence of a select analyte in the sample is evaluated in an electrochemical system using a conduction cell-type apparatus. A potential or current is generated between the two electrodes of the cell sufficient to bring about oxidation or reduction of the analyte or of a mediator in an analyte-d ...


8
Arai Dai, Hara Hideaki, Takaiwa Hiroaki: (Ja) 液体回収装置、露光装置、露光方法及びデバイス製造方法, (En) Liquid recovery apparatus, exposure apparatus, exposure method, and device production method. Nikon Corporation, Arai Dai, Hara Hideaki, Takaiwa Hiroaki, SHIGA Masatake, March 10, 2005: WO/2005/022615 (100 worldwide citation)

(EN) An exposure apparatus exposes a substrate by projecting an image of a pattern on the substrate by using a projection optical system and a liquid that fills a gap between the projection optical system and the substrate. The exposure apparatus has a liquid recovery mechanism with a drive section ...


9
Link Darren R, Weitz David A, Cristobal Azkarte Glader, Cheng Zhengdong, Ahn Keunho: Electronic control of fluidic species. President And Fellows Of Harvard College, Link Darren R, Weitz David A, Cristobal Azkarte Glader, Cheng Zhengdong, Ahn Keunho, OYER Timothy J, March 10, 2005: WO/2005/021151 (85 worldwide citation)

Various aspects of the present invention relate to the control and manipulation of fluidic species, for example, in microfluidic systems. In one aspect, the invention relates to systems and methods for making droplets of fluid surrounded by a liquid, using, for example, electric fields, mechanical a ...


10
Renaud Christian, Castera Gérard: Osseous anchoring implant with a polyaxial head and method for installing the implant. Ldr Medical, Renaud Christian, Castera Gérard, DEBAY Yves, March 10, 2005: WO/2005/020829 (82 worldwide citation)

The present invention relates to an osseous anchoring implant comprising osseous anchoring means (11) and a head (2) bearing fixation means capable of receiving and fixing at least one bar, the head (2) of the implant being traversed by at least one duct (20), which receives the bar through a latera ...



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