1
Jennifer Petoff Brian Goodall
Brian Leslie Goodall, Jennifer Lynn Petoff, Han Shen: Catalytic composition and its preparation and use for preparing polymers from ethylenically unsaturated monomers. Rohm And Haas Company, February 24, 2005: US20050043494-A1

A catalytic composition, including a cationic metal-pair complex, is disclosed, along with a method for its preparation. A method for the polymerization of ethylenically unsaturated monomers using the catalytic composition, and the addition polymers produced thereby are also disclosed.


2
Xavier Baie
Dureseti Chidambarrao, Omer H Dokumaci, Bruce B Doris, Jack A Mandelman, Xavier Baie: Stress inducing spacers. International Business Machines Corporation, Dept 18g, February 24, 2005: US20050040460-A1

A substrate under tension and/or compression improves performance of devices fabricated therein. Tension and/or compression can be imposed on a substrate through selection of appropriate gate sidewall spacer material disposed above a device channel region wherein the spacers are formed adjacent both ...


3
Erwin Meinders
Meinders Erwin R, Mijiritskii Andrei: Recordable optical record carrier for multilevel and method for writing thereon. Koninklijke Philips Electronics, Meinders Erwin R, Mijiritskii Andrei, UITTENBOGAARD Frank, February 24, 2005: WO/2005/017886 (6 worldwide citation)

A recordable optical record carrier is provided comprising a recording dye layer, whereby said recording dye layer (111) comprises at least two organic dye materials being absorptive at different wavelengths. Further, a method for writing on such a recordable optical record carrier is proposed. Acco ...


4
Erwin Meinders
Meinders Erwin R: A visual content signal display apparatus and a method of displaying a visual content signal therefor. Koninklijke Philips Electronics, Meinders Erwin R, GROENENDAAL Antonius W M, February 24, 2005: WO/2005/017739

The invention relates to a visual content signal display apparatus (100) comprising a receiver (101) which receives a visual content signal. The receiver (101) is coupled to a primary display processor (103) which is coupled to a primary display (105) and presents the visual content signal thereon. ...


5
Belgacem Haba Belgacem (Bel) Haba
Belgacem Haba, Jae M Park, Teck Gyu Kang, Nicholas J Colella: Microelectronic assemblies with springs. Tessera, Lerner David Litenberg Krumholz & Mentlik, February 24, 2005: US20050040540-A1

A microelectronic element such as a semiconductor chip has springs such as coil springs bonded to contacts so that the springs serve as electrical connections to a circuit panel. The unit can be tested readily and can be surface-mounted to a circuit panel by bonding the distal ends of the springs, r ...


6
Ethan Simon
Francis Joseph Lipiecki, Stephen Gerard Maroldo, Barry Jack Pendell, Ethan Scott Simon: Process for preparing biocide formulations. Rohm And Haas Company, February 24, 2005: US20050042239-A1

The present invention relates to a process for producing emulsion of one or more water insoluble active ingredients directly before introducing them into aqueous systems. One or more water insoluble active ingredients including biocides are intimately mixed together by feeding an aqueous dispersion ...


7
Ethan Simon
Francis Joseph Lipiecki, Stephen Gerard Maroldo, Barry Jack Pendell, Ethan Scott Simon: Process for treating aqueous systems. Rohm And Haas Company, February 24, 2005: US20050042238-A1

The present invention relates to a process for producing emulsion of one or more water insoluble active ingredients directly before introducing them into aqueous systems. One or more water insoluble active ingredients including biocides are intimately mixed together by feeding an aqueous dispersion ...


8
Katherina Babich
Katherina Babich, Elbert Huang, Arpan P Mahorowala, David R Medeiros, Dirk Pfeiffer, Karen Temple: Antireflective hardmask and uses thereof. International Business Machines Corporation, Ryan Mason & Lewis, February 24, 2005: US20050042538-A1

Antireflective hardmask compositions and techniques for the use of antireflective hardmask compositions for processing of semiconductor devices are provided. In one aspect of the invention, an antireflective hardmask layer for lithography is provided. The antireflective hardmask layer comprises a ca ...


9
Deodatta Shenai-Khatkhate
Shenai Khatkhate Deodatta Vina, Power Michael Brendan: Organometallic compounds. Rohm And Haas Electronic Mater, cai shengwei, February 23, 2005: CN200410055267

Organometallic compounds suitable for use as vapor phase deposition precursors for Group IV metal-containing films are provided. Methods of depositing Group IV metal-containing films using certain organometallic precursors are also provided. Such Group IV metal-containing films are particularly usef ...


10
Katherina Babich
Marie Angelopoulos, Katherina E Babich, Cameron James Brooks, S Jay Chey, C Richard Guarnieri, Michael Straight Hibbs, Kenneth Christopher Racette: Attenuated embedded phase shift photomask blanks. International Business Machines Corporation, Daniel P Morris, February 22, 2005: US06858357 (2 worldwide citation)

An attenuating embedded phase shift photomask blank that produces a phase shift of the transmitted light is formed with an optically translucent film made of metal, silicon, nitrogen or metal, silicon, nitrogen and oxygen. A wide range of optical transmission (0.001% up to 20% at 193 nm) is obtained ...



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