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Belgacem Haba Belgacem (Bel) Haba
Belgacem Haba, Konstantine Karavakis: Method of making components with releasable leads. Tessera, Lerner David Litenberg Krumholz & Mentlik, November 4, 2004: US20040217003-A1

A connection component for making connections to a microelectronic element is made by providing leads on a surface of a polymeric layer and etching the polymeric layer to partially detach the leads from the polymeric layer, leaving a portion of each lead releasably connected to the polymeric layer b ...


2
Belgacem Haba Belgacem (Bel) Haba
Belgacem Haba, Irina Poukhova, Masud Beroz: Selective removal of dielectric materials and plating process using same. Tessera, Lerner David Litenberg Krumholz & Mentlik, November 4, 2004: US20040217088-A1

A metal is provided on a polymeric component and the component is subjected to a removal process such as plasma or liquid etching in the presence of an electric field. The etchant selectively attacks the polymer at the boundary between the metal and the polymer, thereby forming gaps alongside the me ...


3
Ed Rutter
Edward W Rutter: Stripper. Rohm and Haas Electronic Materials, S Matthew Cairns, c o EDWARDS & ANGELL, November 4, 2004: US20040220066-A1

Compositions suitable for removing polymeric material, particularly post-plasma etch polymeric material, from a substrate are provided. These compositions contain one or more quaternary ammonium silicates as the active component. Methods of removing polymeric material using these compositions are al ...


4
Belgacem Haba Belgacem (Bel) Haba
Belgacem Haba: Component and assemblies with ends offset downwardly. Tessera, Lerner David Litenberg Krumholz & Mentlik, November 4, 2004: US20040217471-A1

A semiconductor chip package includes a dielectric layer having an attachment portion and an offset portion, off-set downwardly from the attachment portion. A semiconductor chip is mounted to the attachment portion, typically on a bottom or downwardly-facing surface thereof. Terminal structures carr ...


5
Brian Goodall
Larry F Rhodes, Lawrence Seger, Brian L Goodall, Lester H McIntosh, Robert J Duff: Dissolution rate modifiers for photoresist compositions. Promerus, Webb Ziesenheim Logsdon, Orkin & Hanson PC, November 4, 2004: US20040219452-A1

Oligomers of polycyclic olefin monomers, and optionally allylic or olefinic monomers, and a method of making such oligomers that includes reacting polycyclic olefin monomers in the presence of a Ni or Pd containing catalyst, or in the case of allylic monomers in the presence of a free radical initia ...


6
Maricela Morales
Edward K Pavelchek, Peter Trefonas: Antireflective coating compositions. Shipley Company, Edwards & Angell, November 4, 2004: US20040219453-A1

Antireflective compositions are provided that contain an ionic thermal acid generator material. Use of such a thermal acid generator material can significantly increase the shelf life of solutions of antireflective compositions in protic media. Antireflective compositions of the invention can be eff ...


7
Eugene Fitzgerald
Eugene A Fitzgerald: Methods of fabricating contact regions for FET incorporating SiGe. AmberWave Systems Corporation, Testa Hurwitz & Thibeault, November 4, 2004: US20040219726-A1

Structures and methods for fabricating high speed digital, analog, and combined digital/analog systems using planarized relaxed SiGe as the materials platform. The relaxed SiGe allows for a plethora of strained Si layers that possess enhanced electronic properties. By allowing the MOSFET channel to ...


8
Matthias Bauer
Paul D Brabant, Joseph P Italiano, Chantal J Arena, Pierre Tomasini, Ivo Raaijmakers, Matthias Bauer: Epitaxial semiconductor deposition methods and structures. Knobbe Martens Olson & Bear, November 4, 2004: US20040219735-A1

Methods for depositing epitaxial films such as epitaxial Ge and SiGe films. During cooling from high temperature processing to lower deposition temperatures for Ge-containing layers, Si or Ge compounds are provided to the substrate. Smooth, thin, relatively defect-free Ge or SiGe layers result. Retr ...


9
Novak W Thomas: Optical arrangement of autofocus elements for use with immersion lithography. Nikon Corporation, Novak W Thomas, COSTANTINO Mario, November 4, 2004: WO/2004/095135 (532 worldwide citation)

An autofocus unit is provided to an immersion lithography apparatus for having a fluid over a target surface of a workpiece and an image pattern projected on this target surface through the fluid. The autofocus unit has an optical element such as a projection lens disposed opposite and above the tar ...


10
Mcphee Fiona, Campbell Jeffrey Allen, Li Wenying, D Andrea Stanley, Zheng Zhizhen Barbara, Good Andrew Charles, Carini David J, Johnson Barry L, Scola Paul Michael: Macrocyclic isoquinoline peptide inhibitors of hepatitis c virus. Bristol Myers Squibb Company, Mcphee Fiona, Campbell Jeffrey Allen, Li Wenying, D Andrea Stanley, Zheng Zhizhen Barbara, Good Andrew Charles, Carini David J, Johnson Barry L, Scola Paul Michael, VOLLES Warren K, November 4, 2004: WO/2004/094452 (132 worldwide citation)

Macrocyclic isoquinoline are disclosed having the general formula: A compound of formula 1: wherein R1 to R9, Q and W are described in the description. Compositions comprising the compounds and methods for using the compounds to inhibit HCV are also disclosed.