1
Charles Szmanda
Charles R Szmanda, Anthony Zampini: Solvents and photoresists compositions for short wavelength imaging. Shipley Company, Peter F Corless, Edwards & Angell, October 21, 2004: US20040209188-A1

New photoresists are provides that are suitable for short wavelength imaging, particularly sub-170 nm such as 157 nm. Resists of the invention comprise a fluorine-containing polymer, a photoactive component, and a solvent component. Preferred solvents for use on the resists of the invention can main ...


2
David Sherrer
Dan A Steinberg, David W Sherrer, Mindaugas F Dautartas, Donald E Leber: Optical waveguide devices and methods of fabricating the same. Dann Dorfman Herrell & Skillman, Saet, October 21, 2004: US20040208469-A1

A first waveguide holding member has a first transverse surface region and a first optical waveguide having an end terminating at the first transverse surface region. A second waveguide holding member has a second transverse surface region which confronts the first transverse surface region of the f ...


3
Belgacem Haba Belgacem (Bel) Haba
Belgacem Haba: Method for forming a multi-layer circuit assembly. Tessera, Lerner David Litenberg Krumholz & Mentlik, October 21, 2004: US20040209439-A1

A method of making a multi-layer circuit assembly includes providing a core structure including an inner dielectric element having first and second metal layers on opposite surfaces thereof, forming one or more through vias extending through the metal layers and the inner dielectric element and coat ...


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Maricela Morales
Gerald B Wayton, Peter Trefonas, Suzanne Coley, Tomoki Kurihara: Coating compositions for use with an overcoated photoresist. Shipley Company, Edwards & Angell, October 21, 2004: US20040209200-A1

In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compou ...


6
Binnard Michael: Maintaining immersion fluid under a lithographic projection lens. Nikon Corporation, Binnard Michael, ROEDER Steven G, October 21, 2004: WO/2004/090577 (589 worldwide citation)

An apparatus and method for maintaining immersion fluid (212) in the gap adjacent the projection lens (16) during the exchange of a work piece (208) in a lithography machine (10) is disclosed. The apparatus and method includes an optical assembly (16) configured to project an image onto a work piece ...


7
Hazelton Andrew J, Sogard Michael: Environmental system including vaccum scavange for an immersion lithography apparatus. Nikon Corporation, Hazelton Andrew J, Sogard Michael, COSTANTINO Mario A, October 21, 2004: WO/2004/090634 (573 worldwide citation)

An environmental system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid barrier (254) and an immersion fluid system (252). The fluid barrier (254) is positioned near the device (30). The immersion fluid system (252) delivers an i ...


8
Eaton John K: An electro-osmotic element for an immersion lithography apparatus. Nikon Corporation, Eaton John K, ROEDER Steven G, October 21, 2004: WO/2004/090633 (530 worldwide citation)

An environmental system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid barrier (254), an immersion fluid system (252), an electro-osmotic element (256), and a control system (255). The fluid barrier (254) is positioned near the ...


9
Hara Hideaki: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Hara Hideaki, SHIGA Masatake, October 21, 2004: WO/2004/090956 (166 worldwide citation)

(EN) An exposure apparatus (EX) is disclosed wherein an image of a pattern is projected onto a substrate (P) via a projection optical system (PL) and the substrate (P) is exposed to light. The exposure apparatus (EX) comprises a movable substrate stage (PST) for holding the substrate (P) above the p ...


10
Realyvasquez Fidel, Schaller Laurent: Apparatus and methods for valve repair. Realyvasquez Fidel, Schaller Laurent, TUNG Hao Y, October 21, 2004: WO/2004/089250 (128 worldwide citation)

According to one aspect, heart valve leaflet removal apparatus (100) of the present invention comprises a pair of cooperating cutting elements (112), a holder and members for manipulating the cutting elements (112) . The cooperating cutting elements (112) are adapted for cutting and removing leaflet ...