1
Erwin Meinders
Martens Hubert C F, Meinders Erwin R: Apparatus and method for recording an information on a recordable optical record carrier using oval spot profile. Koninklijke Philips Electronics, Martens Hubert C F, Meinders Erwin R, DEGUELLE Wilhelmus H G, June 24, 2004: WO/2004/053852

To obtain a higher recording density, and thus higher data capacity, it is proposed according to the present invention to reduce the numerical aperture of the optical means (3, 4) in the direction orthogonal to the information recording direction, which is the radial direction for an optical disc, d ...


2
Isaiah Oladeji
Robert YS Huang, Scott Jessen, Subramanian Karthikeyan, Joshua Jia Li, Isaiah O Oladeji, Kurt Geroge Steiner, Joseph Ashley Taylor: Mask layer and dual damascene interconnect structure in a semiconductor device. Beusse Brownlee Wolter Mora & Maire P A, June 24, 2004: US20040121579-A1

A mask layer having four mask films used in the fabrication of an interconnect structure of a semiconductor device. The first mask film and the third mask film have substantially equal etch rates. The second mask film and the fourth have substantially equal etch rates film, and different from that o ...


3
Deodatta Shenai-Khatkhate
Deodatta Vinayak Shenai Khatkhate, Ronald L Dicarlo, Michael L Timmons: Preparation of organometal compounds. Shipley Company, Edwards & Angell, June 24, 2004: US20040122248-A1

A method of preparing organometal compounds that does not use oxygenated solvents is provided. The compounds produced by such method are particularly useful as precursor compounds for metalorganic chemical vapor deposition processes used in the manufacture of electronic devices. Methods of depositin ...


4
Benjamin Mattes
Benjamin R Mattes, Phillip N Adams, Dali Yang, Lori A Brown, Andrei G Fadeev, Ian D Norris: Spinning, doping, dedoping and redoping polyaniline fiber. Cochran Freund & Young, June 24, 2004: US20040119187-A1

A composition of matter suitable for spinning polyaniline fiber, a method for spinning electrically conductive polyaniline fiber, a method for exchanging dopants in polyaniline fibers, and methods for dedoping and redoping polyaniline fibers are described.


5
Hirukawa Shigeru, Magome Nobutaka, Tanaka Issey: (Ja) 露光装置及びデバイス製造方法, (En) Exposure system and device producing method. Nikon Corporation, Hirukawa Shigeru, Magome Nobutaka, Tanaka Issey, TATEISHI Atsuji, June 24, 2004: WO/2004/053955 (632 worldwide citation)

(EN) Liquid is supplied by a supply mechanism (72) to between a lens (42) and a wafer (W) on a stage via a supply port (36) on one side of the lens (42), and the liquid is recovered by the recovering mechanism (74) via a recovery tube (52) on the other side of the lens (42). When the supply and the ...


6
Nei Masahiro, Kobayashi Naoyuki, Arai Dai, Owa Soichi: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Nei Masahiro, Kobayashi Naoyuki, Arai Dai, Owa Soichi, KAWAKITA Kijuro, June 24, 2004: WO/2004/053953 (485 worldwide citation)

(EN) An exposure apparatus, wherein an exposure of a substrate (P) is carried out by locally filling the image plane side of a projection optical system (PL) with a liquid (50) and projecting an image of a pattern onto the substrate (P) through the projection optical system (PL) and the liquid (50), ...


7
Mizutani Hideo, Magome Nobutaka: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Mizutani Hideo, Magome Nobutaka, KAWAKITA Kijuro, June 24, 2004: WO/2004/053958 (468 worldwide citation)

(EN) An exposure apparatus, wherein an exposure of a substrate (P) is carried out by filling at least a portion of the space between a projection optical system and the substrate (P) with a liquid and projecting an image of a pattern onto the substrate (P) through the projection optical system and t ...


8
Magome Nobutaka, Takaiwa Hiroaki, Arai Dai: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Magome Nobutaka, Takaiwa Hiroaki, Arai Dai, KAWAKITA Kijuro, June 24, 2004: WO/2004/053952 (464 worldwide citation)

(EN) An exposure apparatus, wherein an exposure is carried out while filling a space between a projection optical system and a substrate with a liquid, enables to suppress deterioration of a device caused by adherent liquid on the substrate. A device manufacturing system (SYS) comprises an exposure ...


9
Nagasaka Hiroyuki, Magome Nobutaka: (Ja) 露光装置及び露光方法、デバイス製造方法, (En) Exposure apparatus, exposure method and method for manufacturing device. Nikon Corporation, Nagasaka Hiroyuki, Magome Nobutaka, KAWAKITA Kijuro, June 24, 2004: WO/2004/053956 (448 worldwide citation)

(EN) In an exposure apparatus, an exposure of a substrate (P) is carried out by filling at least a portion of the space between a projection optical system (PL) and the substrate (P) with a liquid (50) and projecting the image of a pattern onto the substrate (P) through the projection optical system ...


10
Nei Masahiro, Kobayashi Naoyuki, Chiba Hiroshi, Hirukawa Shigeru: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Nei Masahiro, Kobayashi Naoyuki, Chiba Hiroshi, Hirukawa Shigeru, KAWAKITA Kijuro, June 24, 2004: WO/2004/053954 (436 worldwide citation)

(EN) An exposure apparatus (EX) carries out an exposure of a substrate (P) by filling the space between a projection optical system (PL) and the substrate (P) with a liquid (50) and projecting an image of a pattern onto the substrate (P) through the liquid (50) using the projection optical system (P ...



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