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James Reuss
James L Reuss: Pulse oximeter with calibration stabilization. OB Scientific, Reinhart Boerner Van Duren s c, March 23, 2004: US06711425 (195 worldwide citation)

An improved pulse oximeter (sensor and monitor) uses a plurality of wavelengths selected to provide sensitivity to both oxygen saturation and deviations in tissue site characteristic(s) from conditions at calibration. The monitor detects and/or removes the effects of deviations on SpO


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Katherina Babich
Marie Angelopoulos, Katherina E Babich, Cameron James Brooks, S Jay Chey, C Richard Guarnieri, Michael Straight Hibbs, Kenneth Christopher Racette: Attenuated embedded phase shift photomask blanks. Dr Daniel P Morris Esq, IBM Corporation, March 18, 2004: US20040053026-A1

An attenuating embedded phase shift photomask blank that produces a phase shift of the transmitted light is formed with an optically translucent film made of metal, silicon, nitrogen or metal, silicon, nitrogen and oxygen. A wide range of optical transmission (0.001% up to 20% at 193 nm) is obtained ...


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Brian Goodall
Larry Funderburk Rhodes, Andrew Bell, R Ravikiran, John C Fondran, Saikumar Jayaraman, Brian Leslie Goodall, Richard A Mimna, John Henry Lipian: Polymerized cycloolefins using transition metal catalyst and end products thereof. Promerus, Nestor W Shust, Hudak Shunk & Farine Co LPA, March 11, 2004: US20040048994-A1

Methods for the addition polymerization of cycloolefins using a cationic Group 10 metal complex and a weakly coordinating anion of the formula: [(R)zM(L)x(L)y]b [WCA]d wherein [(R)zM(L)x(L)y] is a cation complex where M represents a Group 10 transition metal; R represents an anionic hydrocarbyl cont ...


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Klaus Hafemann
Klaus Hafemann: Electric toothbrush with revolvable brush head. Wik Far East, John R Flanagan, Flanagan & Flanagan, March 9, 2004: US06701565 (12 worldwide citation)

An electric toothbrush includes a handle, a brush head defining a brushing plane, and a guide arrangement supported by the handle and, in turn, supporting the brush head to undergo movement along an endless path of revolution having an axis extending substantially parallel to the brushing plane such ...


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Dr. Jill S. Becker
Roy G Gordon, Jill Becker, Dennis Hausmann, Seigi Suh: Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide. Hale And Dorr, March 4, 2004: US20040043149-A1 (1 worldwide citation)

Metal silicates or phosphates are deposited on a heated substrate by the reaction of vapors of alkoxysilanols or alkylphosphates along with reactive metal amides, alkyls or alkoxides. For example, vapors of tris-(ter-butoxy)silanol react with vapors of tetrakis(ethylmethylamido)hafnium to deposit ha ...


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Sanjay Chaturvedi
Sanjay Chaturvedi, Anne Mae Gaffney, Scott Han, Dominique Hung Nhu Le: Zn and/or Ga promoted multi-metal oxide catalyst. Rohm and Haas Company, Alan Holler, Kenneth Crimaldi, March 2, 2004: US06700015 (6 worldwide citation)

A catalyst comprising a promoted mixed metal oxide is useful for the vapor phase oxidation of an alkane or a mixture of an alkane and an alkene to an unsaturated carboxylic acid and for the vapor phase ammoxidation of an alkane or a mixture of an alkane and an alkene to an unsaturated nitrile.


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Belgacem Haba Belgacem (Bel) Haba
Young Kim, Belgacem Haba, Vernon Solberg: Stacked microelectronic assembly and method therefor. Tessers, Lerner David Littenberg Krumholz & Mentlik, March 2, 2004: US06699730 (166 worldwide citation)

A method of making a stacked microelectronic assembly includes providing a flexible substrate having a plurality of attachment sites, test contacts and conductive terminals, and including a wiring layer with leads extending to the attachment sites. The method includes assembling a plurality of micro ...


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David Sherrer
David W Sherrer: Microstructures comprising silicon nitride layer and thin conductive polysilicon layer. Shipley Company L L C, Niels Haun, Jonathan D Baskin, March 2, 2004: US06698295 (96 worldwide citation)

Surface micromachined structures having a relatively thick silicon nitride layer and a relatively thin conductive polysilicon layer bonded together. Preferably, the silicon nitride layer and conductive polysilicon layer are made in the same low pressure chemical vapor deposition (LPCVD) step. The po ...


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