1
Belgacem Haba Belgacem (Bel) Haba
Belgacem Haba, Irina Poukhova, Masud Beroz: Selective removal of dielectric materials and plating process using same. Lerner David Littenberg Krumholz & Mentlik, January 31, 2002: US20020011421-A1

A metal is provided on a polymeric component and the component is subjected to a removal process such as plasma or liquid etching in the presence of an electric field. The etchant selectively attacks the polymer at the boundary between the metal and the polymer, thereby forming gaps alongside the me ...


2
Katherina Babich
Marie Angelopoulos, Katherina Babich, Alfred Grill, Scott David Halle, Arpan Pravin Mahorowala, Vishnubhai Vitthalbhai Patel: Tunable vapor deposited materials as antireflective coatings, hardmasks and as combined antireflective coating/hardmasks and methods of fabrication thereof and applications thereof. Dr Daniel P Morris Esq, IBM Corporation, January 31, 2002: US20020012876-A1

A lithographic structure and method of fabrication and use thereof having a plurality of layers at least one of which is a an RCHX layer which comprises a material having structural formula R:C:H:X, wherein R is selected from the group consisting of Si, Ge, B, Sn, Fe, Ti and combinations thereof and ...


3
David Sherrer
Dan A Steinberg, Mindaugas F Dautartas, David W Sherrer: Method of fabricating optical filters. Jones Volentine, January 31, 2002: US20020012172-A1

A method of fabricating optical filter is disclosed. The method includes providing the substrate and selectively etching the substrate to form a plurality of freestanding layers. A plurality of dielectric layers is disposed over an outer surface of each of the freestanding layers. The resultant opti ...


4
David Sherrer
Dan A Steinberg, David W Sherrer: Multi-level optical structure and method of manufacture. Jones Volentine, January 31, 2002: US20020012885-A1

A multi-level optical device includes a substrate having a baseline level. At least one feature is disposed at a level above the baseline level. At least one feature is disposed at a level below the baseline level, or in the feature above the baseline level is located at a distance apart from the fe ...


5
Craig Allen
Desaraju V Varaprasad, Mingtang Zhao, Craig Allen Dornan, Anoop Agrawal, Pierre Marc Allemand, Niall R Lynam: Electrochromic polymeric solid films, manufacturing electrochromic devices using such solid films, and processes for making such solid films and devices. Fitzpatrick Cella Harper & Scinto, January 31, 2002: US20020012156-A1

The present invention relates to electrochromic polymeric solid films, manufacturing electrochromic devices using such solid films and processes for making such solid films and devices. The electrochromic polymeric solid films of the present invention exhibit beneficial properties and characteristic ...


6
Belgacem Haba Belgacem (Bel) Haba
Masud Beroz, Joseph Fjelstad, Belgacem Haba, Christopher M Pickett, John Smith: Microelectronic unit forming methods and materials. Lerner David Littenberg Krumholz & Mentlik, January 24, 2002: US20020009827-A1

Electrically conductive elements such as terminals and leads are held on a support structure by a degradable connecting layer such as a adhesive degradable by heat or radiant energy. After connecting these elements to a microelectronic element such as a chip or wafer, the conductive elements are rel ...


7
Guoxiao Guo
Kodikkunnathukulangara Sivadasan, Guoxiao Guo: Head suspension assembly with piezoelectric beam micro actuator. Data Storage Institute, Don W Bulson Esq, Renner Otto Boisselle & Sklar, January 24, 2002: US20020008436-A1

A micro actuator driven load beam mechanism for use in a head suspension assembly is disclosed. The mechanism includes a load beam including a proximal end portion and a distal end portion, a hinge portion connecting the proximal and distal end portions of the load beam for permitting relative movem ...


8
Craig Allen
John Charles Smith, Mark Alan Etter, Brent Edward Stafford, James Timothy Stolzer, Craig Allen Carroll, Thomas O aposNeal Walls: Hand-held oscillating spindle sander. Christopher C Campbell, Hunton & Williams, January 24, 2002: US20020009951-A1

A hand-held oscillating spindle sander is disclosed. The sander includes a pair of toothed pulleys associated with the output shaft. The first pulley is attached to the output shaft for rotation with the output shaft. The second pulley is rotatably disposed on the output shaft for relative rotation ...


9
Ravi Laxman
Patrick A Van Cleemput, Ravi Kumar Laxman, Jen Shu, Michelle T Schulberg, Bunsen Nie: Method to deposit SiOCH films with dielectric constant below 3.0. Novellus Systems, Tom Chen, Skjerven Morrill MacPherson, January 22, 2002: US06340628 (87 worldwide citation)

A chemical vapor deposition (CVD) process uses a precursor gas, such as with a siloxane or alkylsilane, and a carbon-dioxide-containing gas, such as CO


10
Erwin Meinders
Meinders Erwin R, Borg Hermanus J: Optical information medium having separate recording layers. Koninklijke Philips Electronics, DEGUELLE Wilhelmus H G, January 17, 2002: WO/2002/005274

The optical information medium for rewritable recording by means of a laser-light beam (14, 15) has a first recording stack (8) having a phase change type recording layer (10), sandwiched between two dielectric layers (9, 11), and has a second recording stack having a phase change type recording lay ...



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