1
Dr. Jill S. Becker
Roy G Gordon, Jill Becker, Dennis Hausmann, Seigi Suh: Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide. President and Fellows of Harvard College, Wilmer Cutler Pickering Hale and Dorr, November 29, 2005: US06969539 (46 worldwide citation)

Metal silicates or phosphates are deposited on a heated substrate by the reaction of vapors of alkoxysilanols or alkylphosphates along with reactive metal amides, alkyls or alkoxides. For example, vapors of tris-(ter-butoxy)silanol react with vapors of tetrakis(ethylmethylamido)hafnium to deposit ha ...


2
Dr. Jill S. Becker
Roy Gerald Gordon, Jill S Becker, Dennis Hausmann: Vapor deposition of silicon dioxide nanolaminates. President and Fellows of Harvard College, Wilmer Cutler Pickering Hale and Dorr, September 17, 2013: US08536070

This invention relates to materials and processes for thin film deposition on solid substrates. Silica/alumina nanolaminates were deposited on heated substrates by the reaction of an aluminum-containing compound with a silanol. The nanolaminates have very uniform thickness and excellent step coverag ...


3
Dr. Jill S. Becker
Roy G Gordon, Jill S Becker, Dennis Hausmann, Seigi Suh: Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide. President and Fellows of Harvard College, Wilmer Cutler Pickering Hale and Dorr, December 18, 2012: US08334016

Metal silicates or phosphates are deposited on a heated substrate by the reaction of vapors of alkoxysilanols or alkylphosphates along with reactive metal amides, alkyls or alkoxides. For example, vapors of tris(tert-butoxy)silanol react with vapors of tetrakis(ethylmethylamido)hafnium to deposit ha ...


4
Dr. Jill S. Becker
Roy G Gordon, Jill Becker, Dennis Hausmann: Vapor deposition of silicon dioxide nanolaminates. President And Fellows of Harvard College, Wilmer Cutler Pickering Hale and Dorr, August 30, 2011: US08008743

This invention relates to materials and processes for thin film deposition on solid substrates. Silica/alumina nanolaminates were deposited on heated substrates by the reaction of an aluminum-containing compound with a silanol. The nanolaminates have very uniform thickness and excellent step coverag ...


5
Dr. Jill S. Becker
Roy G Gordon, Seigi Suh, Jill Becker: Vapor deposition of tungsten nitride. President and Fellows of Harvard College, Wilmer Cutler Pickering Hale And Dorr, June 15, 2006: US20060125099-A1

Tungsten nitride films were deposited on heated substrates by the reaction of vapors of tungsten bis(alkylimide)bis(dialkylamide) and a Lewis base or a hydrogen plasma. For example, vapors of tungsten bis(tert-butylimide)bis(dimethylamide) and ammonia gas supplied in alternate doses to surfaces heat ...


6
Dr. Jill S. Becker
Roy G Gordon, Jill Becker, Dennis Hausmann: Vapor deposition of silicon dioxide nanolaminates. President and fellows of Harvard College, Wilmer Cutler Pickering Hale And Dorr, May 26, 2005: US20050112282-A1

This invention relates to materials and processes for thin film deposition on solid substrates. Silica/alumina nanolaminates were deposited on heated substrates by the reaction of an aluminum-containing compound with a silanol. The nanolaminates have very uniform thickness and excellent step coverag ...


7
Dr. Jill S. Becker
Roy G Gordon, Jill Becker, Dennis Hausmann, Seigi Suh: Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide. President and Fellows of Harvard College, Wilmer Cutler Pickering Hale And Dorr, December 15, 2005: US20050277780-A1

Metal silicates or phosphates are deposited on a heated substrate by the reaction of vapors of alkoxysilanols or alkylphosphates along with reactive metal amides, alkyls or alkoxides. For example, vapors of tris(tert-butoxy)silanol react with vapors of tetrakis(ethylmethylamido)hafnium to deposit ha ...


8
Sung Kw n Jung, Richard H Sanger, Peter J S Smith, John R Pepperell: Self-referencing enzyme-based microsensor and method of use. Marine Biological Laboratory, Wilmer Cutler Pickering Hale and Dorr, October 12, 2004: US06802957 (361 worldwide citation)

A micron-scale self-referencing microsensor is disclosed which uses an enzyme-based electrode to measure the flux of an electrochemically inactive analyte such as glucose. The electrode oscillates between at least two positions. In the presence of the analyte, the enzyme generates a species detectab ...


9
John G Brainard, Burton S Kaliski Jr, Magnus Nyström, Ronald L Rivest: System and method for authentication seed distribution. RSA Security, Wilmer Cutler Pickering Hale and Dorr, January 10, 2006: US06985583 (242 worldwide citation)

In one embodiment of a user authentication system and method according to the invention, a device shares a secret, referred to as a master seed, with a server. The device and the server both derive one or more secrets, referred to as verifier seeds, from the master seed, using a key derivation funct ...


10
Ari Juels, Niklas Frykholm: Robust visual passwords. RSA Security, Wilmer Cutler Pickering Hale and Dorr, May 15, 2007: US07219368 (206 worldwide citation)

Enrollment and authentication of a user based on a sequence of discrete graphical choices is described. A graphical interface presents various images and memory cues that a user may associate with their original graphical choices. Enrollment may require the input to have a security parameter value t ...



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