1
Dr. Jill S. Becker
Roy G Gordon, Jill Becker, Dennis Hausmann, Seigi Suh: Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide. President and Fellows of Harvard College, Wilmer Cutler Pickering Hale and Dorr, November 29, 2005: US06969539 (49 worldwide citation)

Metal silicates or phosphates are deposited on a heated substrate by the reaction of vapors of alkoxysilanols or alkylphosphates along with reactive metal amides, alkyls or alkoxides. For example, vapors of tris-(ter-butoxy)silanol react with vapors of tetrakis(ethylmethylamido)hafnium to deposit ha ...


2
Dr. Jill S. Becker
Roy G Gordon, Jill S Becker, Dennis Hausmann, Seigi Suh: Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide. President and Fellows of Harvard College, Wilmer Cutler Pickering Hale & Dorr, March 24, 2009: US07507848 (9 worldwide citation)

Metal silicates or phosphates are deposited on a heated substrate by the reaction of vapors of alkoxysilanols or alkylphosphates along with reactive metal amides, alkyls or alkoxides. For example, vapors of tris(tert-butoxy)silanol react with vapors of tetrakis(ethylmethylamido)hafnium to deposit ha ...


3
Dr. Jill S. Becker
Roy G Gordon, Seigi Suh, Jill Becker: Vapor deposition of tungsten nitride. President and Fellows of Harvard College, Wilmer Cutler Pickering Hale & Dorr, July 14, 2009: US07560581 (4 worldwide citation)

Tungsten nitride films were deposited on heated substrates by the reaction of vapors of tungsten bis(alkylimide)bis(dialkylamide) and a Lewis base or a hydrogen plasma. For example, vapors of tungsten bis(tert-butylimide)bis(dimethylamide) and ammonia gas supplied in alternate doses to surfaces heat ...


4
Dr. Jill S. Becker
Roy G Gordon, Jill Becker, Dennis Hausmann: Vapor deposition of silicon dioxide nanolaminates. President And Fellows of Harvard College, Wilmer Cutler Pickering Hale and Dorr, August 30, 2011: US08008743 (2 worldwide citation)

This invention relates to materials and processes for thin film deposition on solid substrates. Silica/alumina nanolaminates were deposited on heated substrates by the reaction of an aluminum-containing compound with a silanol. The nanolaminates have very uniform thickness and excellent step coverag ...


5
Dr. Jill S. Becker
Roy G Gordon, Jill S Becker, Dennis Hausmann, Seigi Suh: Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide. President and Fellows of Harvard College, Wilmer Cutler Pickering Hale and Dorr, December 18, 2012: US08334016 (1 worldwide citation)

Metal silicates or phosphates are deposited on a heated substrate by the reaction of vapors of alkoxysilanols or alkylphosphates along with reactive metal amides, alkyls or alkoxides. For example, vapors of tris(tert-butoxy)silanol react with vapors of tetrakis(ethylmethylamido)hafnium to deposit ha ...


6
Dr. Jill S. Becker
Roy Gerald Gordon, Jill S Becker, Dennis Hausmann: Vapor deposition of silicon dioxide nanolaminates. President and Fellows of Harvard College, Wilmer Cutler Pickering Hale and Dorr, September 17, 2013: US08536070

This invention relates to materials and processes for thin film deposition on solid substrates. Silica/alumina nanolaminates were deposited on heated substrates by the reaction of an aluminum-containing compound with a silanol. The nanolaminates have very uniform thickness and excellent step coverag ...


7
Dr. Jill S. Becker
Roy G Gordon, Seigi Suh, Jill Becker: Vapor deposition of tungsten nitride. President and Fellows of Harvard College, Wilmer Cutler Pickering Hale And Dorr, June 15, 2006: US20060125099-A1

Tungsten nitride films were deposited on heated substrates by the reaction of vapors of tungsten bis(alkylimide)bis(dialkylamide) and a Lewis base or a hydrogen plasma. For example, vapors of tungsten bis(tert-butylimide)bis(dimethylamide) and ammonia gas supplied in alternate doses to surfaces heat ...


8
Dr. Jill S. Becker
Roy G Gordon, Jill Becker, Dennis Hausmann: Vapor deposition of silicon dioxide nanolaminates. President and fellows of Harvard College, Wilmer Cutler Pickering Hale And Dorr, May 26, 2005: US20050112282-A1

This invention relates to materials and processes for thin film deposition on solid substrates. Silica/alumina nanolaminates were deposited on heated substrates by the reaction of an aluminum-containing compound with a silanol. The nanolaminates have very uniform thickness and excellent step coverag ...


9
Dr. Jill S. Becker
Roy G Gordon, Jill Becker, Dennis Hausmann, Seigi Suh: Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide. President and Fellows of Harvard College, Wilmer Cutler Pickering Hale And Dorr, December 15, 2005: US20050277780-A1

Metal silicates or phosphates are deposited on a heated substrate by the reaction of vapors of alkoxysilanols or alkylphosphates along with reactive metal amides, alkyls or alkoxides. For example, vapors of tris(tert-butoxy)silanol react with vapors of tetrakis(ethylmethylamido)hafnium to deposit ha ...


10
Sung Kw n Jung, Richard H Sanger, Peter J S Smith, John R Pepperell: Self-referencing enzyme-based microsensor and method of use. Marine Biological Laboratory, Wilmer Cutler Pickering Hale and Dorr, October 12, 2004: US06802957 (376 worldwide citation)

A micron-scale self-referencing microsensor is disclosed which uses an enzyme-based electrode to measure the flux of an electrochemically inactive analyte such as glucose. The electrode oscillates between at least two positions. In the presence of the analyte, the enzyme generates a species detectab ...