1
Katherina Babich
Katherina Babich, Todd C Bailey, Richard A Conti, Ryan P Deschner: Mask forming and implanting methods using implant stopping layer and mask so formed. International Business Machines Corporation, Wenjie Li, Hoffman Warnick, January 26, 2010: US07651947 (2 worldwide citation)

Methods of forming a mask for implanting a substrate and implanting using an implant stopping layer with a photoresist provide lower aspect ratio masks that cause minimal damage to trench isolations in the substrate during removal of the mask. In one embodiment, a method of forming a mask includes: ...


2
Robert H Dennard, Brian J Greene, Zhibin Ren, Xinlin Wang: Self-aligned well implant for improving short channel effects control, parasitic capacitance, and junction leakage. International Business Machines Corporation, Cantor Colburn, Wenjie Li, August 7, 2012: US08236661 (112 worldwide citation)

A method of forming a self-aligned well implant for a transistor includes forming a patterned gate structure over a substrate, including a gate conductor, a gate dielectric layer and sidewall spacers, the substrate including an undoped semiconductor layer beneath the gate dielectric layer and a dope ...


3
Mukta G Farooq, Subramanian S Iyer, Steven J Koester, Huilong Zhu: Method of making 3D integrated circuits. International Business Machines Corporation, Wenjie Li, April 17, 2012: US08158515 (86 worldwide citation)

A method and structure of connecting at least two integrated circuits in a 3D arrangement by a through silicon via which simultaneously connects a connection pad in a first integrated circuit and a connection pad in a second integrated circuit.


4
Wai Kin Li, Haining S Yang: Sub-lithographic interconnect patterning using self-assembling polymers. International Business Machines Corporaiton, Wenjie Li, August 3, 2010: US07767099 (56 worldwide citation)

The present invention is directed to the formation of sublithographic features in a semiconductor structure using self-assembling polymers. The self-assembling polymers are formed in openings in a hard mask, annealed and then etched, followed by etching of the underlying dielectric material. At leas ...


5
Christopher Ausschnitt: Differential critical dimension and overlay metrology apparatus and measurement method. International Business Machines Corporation, Wenjie Li, April 20, 2010: US07700247 (19 worldwide citation)

A method is described for measuring a dimension on a substrate, wherein a target pattern is provided with a nominal characteristic dimension that repeats at a primary pitch of period P, and has a pre-determined variation orthogonal to the primary direction. The target pattern formed on the substrate ...


6
Chistopher P Ausschnitt, Lewis A Binns, Jennifer L Morningstar, Nigel Smith: Imaging tool calibration artifact and method. International Business Machines Corporation, Nanometrics Incorporated, DeLio & Peterson, Peter W Peterson, Wenjie Li, January 6, 2009: US07473502 (18 worldwide citation)

A method of determining and correcting for distortions introduced by an imaging tool. The method includes providing an imaging tool having a field of view (FOV), and creating a target pattern containing a regular array of symmetric sub-patterns having locations spanning the FOV. Using the imaging to ...


7
Frederic Beaulieu, Mukta G Farooq, Kevin S Petrarca: Wire bonding personalization and discrete component attachment on wirebond pads. International Business Machines Corporation, Scully Scott Murphy & Presser P C, Wenjie Li Esq, April 13, 2010: US07696631 (18 worldwide citation)

Inner wire bond pads are formed within a peripheral region of a semiconductor chip and at least one bonding wire is attached to the inner wire bond pads. The semiconductor chip may be customized for a specific configuration of choice by wiring inner wire bond pads. Alternately, the bonding wires may ...


8
Christopher P Ausschnitt, Lewis A Binns, Jaime D Morillo, Nigel P Smith: Multi-layer alignment and overlay target and measurement method. International Business Machines Corporation, Accent Optical Technologies, DeLio & Peterson, Peter W Peterson, Wenjie Li, January 6, 2009: US07474401 (16 worldwide citation)

A target system for determining positioning error between lithographically produced integrated circuit fields on at least one lithographic level. The target system includes a first target pattern on a lithographic field containing an integrated circuit pattern, with the first target pattern comprisi ...


9
David Clifford Long, Thomas J Fleischman: Method and apparatus for providing a video image having multiple focal lengths. International Business Machines Corporation, Catherine Ivers, Wenjie Li, Ira D Blecker, March 5, 2013: US08390729 (16 worldwide citation)

A method and apparatus for providing a video image having multiple focal lengths includes a multi-focal lens system and a drive mechanism capable of moving the multi-focal lens system through a cyclic path. A plurality of optical images are formed as the multi-focal lens system moves through the cyc ...


10
John C Arnold, Sean D Burns, Matthew E Colburn, Yunpeng Yin: Mask and etch process for pattern assembly. International Business Machines Corporation, Scully Scott Murphy & Presser P C, Wenjie Li Esq, February 21, 2012: US08119531 (14 worldwide citation)

A method of forming a trench is provided that includes providing a stack having a semiconductor layer or dielectric layer, a metal nitride layer, a leveling layer, and a first mask layer. First trenches are etched through the first mask layer and the leveling layer. The first mask layer is removed. ...