1
Kris V Srikrishnan: Smart-cut process for the production of thin semiconductor material films. International Business Machines Corporation, Tiffany L Townsend, Ratner & Prestia, March 16, 1999: US05882987 (333 worldwide citation)

A process applicable to the production of monocrystalline films improves on the Smart-Cut.RTM. process by using an etch stop layer in conjunction with the Smart-Cut.RTM. process. Because of the etch stop layer, no chemical-mechanical polishing (CMP) is required after fabrication. Thus, the thickness ...


2
Richard A Ferguson, Mark A Lavin, Lars W Liebmann, Alfred K Wong: Process window based optical proximity correction of lithographic images. International Business Machines Corporation, Peter W Peterson, Tiffany L Townsend, DeLio & Peterson, June 10, 2003: US06578190 (217 worldwide citation)

A method of creating a pattern for a mask adapted for use in lithographic production of features on a substrate. The method comprises initially providing a mask pattern of a feature to be created on the substrate using the mask. The method then includes establishing target dimensional bounds of the ...


3
Christopher P Ausschnitt, Timothy A Brunner: Optical metrology tool and method of using same. International Business Machines Corporation, Geza C Ziegler Jr, Tiffany L Townsend, DeLio & Peterson, October 10, 2000: US06130750 (134 worldwide citation)

A metrology apparatus for determining bias or overlay error in a substrate formed by a lithographic process includes an aperture between the objective lens and the image plane adapted to set the effective numerical aperture of the apparatus. The aperture is adjustable to vary the effective numerical ...


4
Christopher P Ausschnitt, Timothy J Wiltshire: Method for overlay control system. International Business Machines Corporation, Tiffany L Townsend, Ratner & Prestia, March 2, 1999: US05877861 (129 worldwide citation)

A method for overlay metrology and control. Simultaneous use of between-field overlay metrology to control field term alignment error at all levels and level-to-level metrology to control field term, grid term, and translation alignment errors at all levels is applied.


5
Cyprian E Uzoh: Continuous highly conductive metal wiring structures and method for fabricating the same. International Business Machines Corporation, Tiffany L Townsend, Scully Scott Murphy & Presser, July 27, 1999: US05930669 (127 worldwide citation)

The present relates to a method of fabricating wiring structures which contain a continuous, single crystalline conductive material extending through the structure. This is achieved in the present invention by utilizing an open-bottomed via liner structure.


6
Andrew H Simon, Cyprian E Uzoh: Open-bottomed via liner structure and method for fabricating same. International Business Machines Corporation, Tiffany L Townsend, August 3, 1999: US05933753 (108 worldwide citation)

This invention relates to a method of forming a bottomless liner structure. The method involves the steps of first obtaining a material having a via. Next, a first layer is deposited on the material, the first layer covering the sidewalls and bottom of the via. Finally, a second layer is sputter dep ...


7
Rupert Ho: Programmable LED driver. International Business Machines Corporation, Tiffany L Townsend, November 7, 2000: US06144222 (98 worldwide citation)

The present invention discloses a high speed programmable electronic current driver circuit for supplying a controlled modulated current to an LED comprising: a current driver operable over a selectable range of current levels for connection to an LED for supplying operating current to an LED; contr ...


8
Christopher P Ausschnitt, Diana Nyyssonen deceased, by Jeffrey Swing executor: Combined segmented and nonsegmented bar-in-bar targets. International Business Machines Corporation, Peter W Peterson, Tiffany L Townsend, DeLio & Peterson, October 3, 2000: US06128089 (94 worldwide citation)

A target for measurement of critical dimension bias on a substrate formed by a lithographic process comprises six contrasting arrays of elements on first and second layers of the substrate. Each of the arrays has a plurality of spaced parallel elements contrasting with the substrate. Ends of the con ...


9
R Michael P West, Edward K Evans, Stephen J Stratz: Graphics system and process for blending graphics display layers. International Business Machines Corporation, Peter W Peterson, Tiffany L Townsend, DeLio & Peterson, February 23, 1999: US05874967 (87 worldwide citation)

A graphics system comprising a format processor for receiving display data including pixel data and color-blending information for at least two (2) separate display layers, a color blender and color processors. The pixel data includes color information for the display layers. The color-blending info ...


10
David R Hanson, Hance H Huston III, Kris V Srikrishnan: Process for restoring rejected wafers in line for reuse as new. International Business Machines Corporation, Tiffany L Townsend, Ratner & Prestia, July 6, 1999: US05920764 (85 worldwide citation)

A process applicable to the restoration of defective or rejected semiconductor wafers to a defect-free form uses etchants and a variation of the Smart-Cut.RTM. process. Because of the use of the variation on the Smart-Cut.RTM. process, diffusion regions are removed without significantly affecting th ...



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