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Hara Hideaki: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Hara Hideaki, SHIGA Masatake, October 21, 2004: WO/2004/090956 (166 worldwide citation)

(EN) An exposure apparatus (EX) is disclosed wherein an image of a pattern is projected onto a substrate (P) via a projection optical system (PL) and the substrate (P) is exposed to light. The exposure apparatus (EX) comprises a movable substrate stage (PST) for holding the substrate (P) above the p ...


2
Nagasaka Hiroyuki, Yamamoto Taro, Hirakawa Osamu: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and device producing method. Nikon Corporation, Tokyo Electron, Nagasaka Hiroyuki, Yamamoto Taro, Hirakawa Osamu, SHIGA Masatake, March 31, 2005: WO/2005/029559 (148 worldwide citation)

(EN) An exposure apparatus for exposing a substrate by projecting an image of a pattern onto a substrate through a projection optical system and a liquid. The exposure apparatus has a liquid supply mechanism and a liquid recovery mechanism. The liquid supply mechanism supplies a liquid onto a substr ...


3
Kameyama Masaomi: (Ja) 露光装置及びデバイス製造方法, (En) Exposure system and device production method. Nikon Corporation, Kameyama Masaomi, SHIGA Masatake, October 7, 2004: WO/2004/086470 (133 worldwide citation)

(EN) This exposure system (EX) projects a pattern image onto a substrate (P) via a projection optical system (PL) and a liquid (30) to expose the substrate (P), with a space between the projection optical system (PL) and the substrate (P) filled with the liquid (30). The exposure system (EX) is prov ...


4
Takaiwa Hiroaki, Horiuchi Takashi: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method of producing device. Nikon Corporation, Takaiwa Hiroaki, Horiuchi Takashi, SHIGA Masatake, August 18, 2005: WO/2005/076321 (123 worldwide citation)

(EN) Provided is an exposure apparatus for exposing a substrate by irradiating exposure light on the substrate through a projection optical system and liquid, where the exposure apparatus has a detection device for detecting whether or not the liquid is present on an object placed below the forward ...


5
Arai Dai, Hara Hideaki, Takaiwa Hiroaki: (Ja) 液体回収装置、露光装置、露光方法及びデバイス製造方法, (En) Liquid recovery apparatus, exposure apparatus, exposure method, and device production method. Nikon Corporation, Arai Dai, Hara Hideaki, Takaiwa Hiroaki, SHIGA Masatake, March 10, 2005: WO/2005/022615 (104 worldwide citation)

(EN) An exposure apparatus exposes a substrate by projecting an image of a pattern on the substrate by using a projection optical system and a liquid that fills a gap between the projection optical system and the substrate. The exposure apparatus has a liquid recovery mechanism with a drive section ...


6
Tanno Nobuyoshi, Horiuchi Takashi: (Ja) 基板搬送装置及び基板搬送方法、露光装置及び露光方法、デバイス製造方法, (En) Substrate transporting apparatus and method, exposure apparatus and method, and device producing method. Zao Nikon, Nikon Corporation, Tanno Nobuyoshi, Horiuchi Takashi, SHIGA Masatake, April 21, 2005: WO/2005/036623 (95 worldwide citation)

(EN) A substrate transporting apparatus for transporting a substrate exposed with an image of a pattern through a projection optical system and a liquid has a substrate supporting member for supporting the substrate and a liquid removing mechanism for removing the liquid adhered to at least either t ...


7
Shiraishi Kenichi: (Ja) 露光装置及びデバイス製造方法、メンテナンス方法及び露光方法, (En) Aligner, device manufacturing method, maintenance method and aligning method. Nikon Corporation, Shiraishi Kenichi, SHIGA Masatake, August 18, 2005: WO/2005/076323 (90 worldwide citation)

(EN) An aligner which eliminates a problem of supplying a liquid having deteriorated cleanliness and a problem of forming a water mark. The aligner (EX) projects exposure light (EL) on a substrate (P) through a projection optical system (PL) and a liquid (LQ) and exposes the substrate (P). The align ...


8
Nagasaka Hiroyuki, Okuyama Takeshi: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Nikon Engineering, Nagasaka Hiroyuki, Okuyama Takeshi, SHIGA Masatake, January 20, 2005: WO/2005/006415 (89 worldwide citation)

(EN) An exposure apparatus is disclosed wherein an exposure of a substrate is carried out by forming an immersion region on a part of the substrate and projecting a pattern image onto the substrate through a liquid which forms the immersion region and a projection optical system. The exposure appara ...


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Nagasaka Hiroyuki, Yamamoto Taro, Hirakawa Osamu: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and device producing method. Nikon Corporation, Tokyo Electron, Nagasaka Hiroyuki, Yamamoto Taro, Hirakawa Osamu, SHIGA Masatake, August 4, 2005: WO/2005/071717 (83 worldwide citation)

(EN) An exposure apparatus for exposing a substrate by irradiating exposure light onto the substrate through a projection optical system and a liquid. The exposure apparatus has a supply tube for supplying the liquid, a recovery tube for recovering the liquid, a connection tube for connecting the su ...