1
Charles Szmanda
Charles R Szmanda, Richard J Carey: Modified anion exchange process. Shipley Company, Robert L Goldberg, December 5, 1995: US05472616 (15 worldwide citation)

The invention is for a process of removing anions from an organic solution, especially one having base labile components. The process comprises modifying an anion exchange resin by treatment with a solution of a source of anions less basic than the hydroxyl anion and contacting said modified ion exc ...


2
Charles Szmanda
Charles R Szmanda, Richard J Carey: Process for removing metal ions from organic photoresist solutions. Shipley Company L L C, Robert L Goldberg, October 7, 1997: US05674662 (12 worldwide citation)

The invention is a process of removing metal ion contaminants from an organic solution, especially one having acid labile components. The process comprises modifying a cationic exchange resin by treatment with ammonia or amine and contacting said modified ion exchange resin with an organic solution ...


3
Charles Szmanda
Charles R Szmanda, Gary N Taylor, Robert L Brainard, Manuel DoCanto: Photoresist compositions. Shipley Company L L C, Robert L Goldberg, Peter F Corless, Darryl P Frickey, March 2, 1999: US05876899 (10 worldwide citation)

A method for making an acrylic resin photoresist characterized by polymerization of an acrylic monomer in a solvent that dissolves all monomers and resultant polymers. The use of the solvent permits formation of acrylic resins suitable for use in the preparation of photoresists without recovery from ...


4
Charles Szmanda
Charles R Szmanda, Richard J Carey: Modified cation exhange process. Shipley Company, Robert L Goldberg, November 5, 1996: US05571657 (8 worldwide citation)

The invention is a process of removing metal ion contaminants from an organic solution, especially one having acid labile components. The process comprises modifying a cationic exchange resin by treatment with ammonia or amine and contacting said modified ion exchange resin with an organic solution ...


5
Charles Szmanda
Charles R Szmanda, Peter Trefonas III: Negative photoresist composition. Shipley Company L L C, Robert L Goldberg, Peter F Corless, Darryl P Frickey, February 2, 1999: US05866299 (6 worldwide citation)

A photoresist composition and process that minimizes the effect of photogenerated acid migration. The photoresist comprises an alkali soluble resin, a photoacid generating compound that undergoes photolysis within a wavelength of from 330 to 700 nm to yield a strong acid, a crosslinking agent capabl ...


6
Charles Szmanda
Charles R Szmanda, Richard J Carey: Purification process. Shipley Company, Robert L Goldberg, August 22, 1995: US05443736 (5 worldwide citation)

The invention is for a process of removing organic contaminants and multivalent metal ions from solution. The process comprises chelating multivalent metal ions in an organic solution to be purified and contacting the solution with activated carbon. The process is especially useful for removal of mu ...


7
Dana Gronbeck
Dana A Gronbeck, Kathleen M O Connell, William Andrew Burke, Michael N Gaudet, Stefan J Caporale: Process for removing heavy metal ions by ion exchange. Shipley Company L L C, Robert L Goldberg, December 30, 1997: US05702611 (7 worldwide citation)

The invention is for a process of removing dissolved heavy metal cation contaminants from an organic solution. The process of the invention involves providing a mixture of a chelating ion exchange resin modified by removal of sodium ions therefrom and an anion exchange resin and contacting said orga ...


8
Angelo Lamola
James W Thackeray, Angelo A Lamola: Radiation sensitive compositions comprising complexing polar compound and methods of use thereof. James W Thackeray, Robert L Goldberg, Dike Bronstein Roberts & Cushman, November 8, 2001: US20010038964-A1

The present invention provides radiation sensitive compositions and methods that comprise novel means for providing relief images of enhanced resolution. In one aspect the invention provides a method for controlling diffusion of photogenerated acid comprising adding a polar compound to a radiation s ...


9
Gary S Calabrese, Jeffrey M Calvert, Mu San Chen, Walter J Dressick, Charles S Dulcey, Jacque H Georger Jr, John F Bohland Jr: Selective metallization process. Shipley Company, Robert L Goldberg, April 23, 1996: US05510216 (150 worldwide citation)

The invention is directed to a process for patterning a substrate in a selective pattern. In one embodiment, the process comprises the steps of forming a patterned coating over a substrate surface whereby portions of the substrate are covered by the patterned coating and portions of the substrate re ...


10
Prasit Sricharoenchaikit, Gary S Calabrese, Michael Gulla: Controlled electroless plating. Shipley Company, Robert L Goldberg, April 20, 1993: US05203911 (141 worldwide citation)

A composition for electrolessly depositing thin metal coatings in selective patterns of fine dimension. The electroless plating solutions of the invention are characterized by a low metal content and preferably, freedom from alkali or alkaline earth metal ions.