1
Maricela Morales Charles Szmanda
Peter Trefonas, Gary N Taylor, Charles R Szmanda: Novel polymers and photoresist compositions for short wavelength imaging. Shipley Company, Peter F Corless, Edwards & Angell, May 2, 2002: US20020051938-A1

This invention relates to resins and photoresist compositions that comprise such resins. Preferred polymers of the invention comprise adjacent saturated carbon atoms, either integral or pendant to the polymer backbone, that have a substantially gauche conformation. Polymers of the invention are part ...


2
Charles Szmanda
Gary N Taylor, Charles R Szmanda: Polymers and photoresist compositions. Shipley Company L L C, Darryl P Frickey, Peter F Corless, May 2, 2000: US06057083 (41 worldwide citation)

The present invention provides novel polymers and chemically-amplified positive-acting photoresist compositions that contain such polymers as a resin binder component. Preferred polymers of the invention include one or more structural groups that are capable of reducing the temperature required for ...


3
Charles Szmanda
James W Thackeray, Gerald B Wayton, Charles R Szmanda: Coating compositions for use with an overcoated photoresist. Rohm and Haas Electronic Materials, Peter F Corless, Darryl P Frickey, Edwards Angell Palmer & Dodge, September 8, 2009: US07585612 (25 worldwide citation)

Underlying coating compositions are provided for use with an overcoated photoresist composition. In one aspect, the coating composition can be crosslinked and comprise one or more components that contain one or more acid-labile groups and/or one or more base-reactive groups that are reactive followi ...


4
Charles Szmanda
Charles R Szmanda, Anthony Zampini: Solvents and photoresist compositions for short wavelength imaging. Shipley Company L L C, Peter F Corless, Darryl P Frickey, Edwards & Angell, September 7, 2004: US06787286 (16 worldwide citation)

New photoresists are provides that are suitable for short wavelength imaging, particularly sub-170 nm such as 157 nm. Resists of the invention comprise a fluorine-containing polymer, a photoactive component, and a solvent component. Preferred solvents for use on the resists of the invention can main ...


5
Charles Szmanda
Uday Kumar, Charles R Szmanda, Roger F Sinta, Leonard E Bogan Jr: Polymers and photoresist compositions. Shipley Company L L C, Peter F Corless, Darryl P Frickey, S Matthew Cairns, June 20, 2000: US06077643 (10 worldwide citation)

The present invention provides novel polymers and chemically-amplified positive-acting photoresist compositions that contain such polymers as a resin binder component. The polymers of the invention include acid labile groups that contain isobornyl moieties and groups that contribute to aqueous devel ...


6
Charles Szmanda
Charles R Szmanda, Gary N Taylor, Robert L Brainard, Manuel DoCanto: Photoresist compositions. Shipley Company L L C, Robert L Goldberg, Peter F Corless, Darryl P Frickey, March 2, 1999: US05876899 (10 worldwide citation)

A method for making an acrylic resin photoresist characterized by polymerization of an acrylic monomer in a solvent that dissolves all monomers and resultant polymers. The use of the solvent permits formation of acrylic resins suitable for use in the preparation of photoresists without recovery from ...


7
Charles Szmanda
Peter Trefonas III, Charles R Szmanda, Gerald C Vizvary: Radiation sensitive composition containing novel dye. Shipley Company L L C, Darryl P Frickey, S Matthew Cairns, Peter F Corless, August 29, 2000: US06110641 (8 worldwide citation)

A photoresist composition comprising an alkali soluble resin, a photoacid generating compound that undergoes photolysis when exposed to a pattern of activating irradiation within a wavelength of from 330 to 700 .mu.m, a crosslinking agent capable of crosslinking the composition when activated by pho ...


8
Charles Szmanda
Anthony Zampini, Charles R Szmanda, Gary N Taylor, James F Cameron, Gerhard Pohlers: Photoresist compositions for short wavelength imaging. Shipley Company L L C, Peter F Corless, Darryl P Prickey, Edwards & Angell, February 22, 2005: US06858379 (7 worldwide citation)

New photoresists are provided that are suitable for short wavelength imaging, including sub-200 nm such as 157 nm. In one aspect, resists of the invention comprise a fluorine-containing polymer, a photoactive component, and one or more additional components of an amine or other basic composition, a ...


9
Stéphane De Lombaert
Rajagopal Bakthavatchalam, Charles A Blum, Stéphane De Lombaert, Taeyoung Yoon, Xiaozhang Zheng: Biaryl piperazinyl-pyridine analogues. Neurogen Corporation, Edwards Angell Palmer & Dodge, Peter F Corless, Mark D Russett, July 28, 2009: US07566712 (6 worldwide citation)

Biaryl piperazinyl-pyridine analogues are provided, of the Formula: wherein variables are as described herein. Such compounds are ligands that may be used to modulate specific receptor activity in vivo or in vitro, and are particularly useful in the treatment of conditions associated with pathologic ...


10
Stéphane De Lombaert
Rajagopal Bakthavatchalam, Timothy M Caldwell, Bertrand L Chenard, Stéphane De Lombaert, Kevin J Hodgetts: Substituted quinolin-4-ylamine analogues. Neurogen Corporation, Edwards Angell Palmer & Dodge, Peter F Corless, Mark D Russett, February 10, 2009: US07488740 (6 worldwide citation)

Substituted quinolin-4-ylamine analogues are provided. Such compounds are ligands that may be used to modulate specific receptor activity in vivo or in vitro, and are particularly useful in the treatment of conditions associated with pathological receptor activation in humans, domesticated companion ...