1
Peter Engel, Andrew Engel: Electronic coupon distribution. Arthur T Fattibene, Paul A Fattibene, Fattibene & Fattibene, May 25, 1999: US05907830 (280 worldwide citation)

An electronic coupon distribution system providing on-line coupon information for a potential consumer using a personal computer connected to a host computer. A potential consumer using a personal computer and a modem connects to a host computer via the Internet or directly. The potential consumer m ...


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Thomas J Fenick: Device for locating the optimum position for a tooth implant. Arthur T Fattibene, Paul A Fattibene, July 28, 1992: US05133660 (148 worldwide citation)

A surgical stent for accurately positioning an implant in the most optimum bone structure of a patient that includes a negative impression of the area of the implant having a guide formed as an integral part of the negative impression that has either a top opening or a lateral side opening for recei ...


3
David M Williamson: High numerical aperture ring field optical reduction system. SVG Lithography Systems, Paul A Fattibene, Arthur T Fattibene & Fattibene Fattibene, September 29, 1998: US05815310 (126 worldwide citation)

An optical projection reduction system used in photolithography for the manufacture of semiconductor devices having a first mirror pair, a second field mirror pair, and a third mirror pair. Electromagnetic radiation from a reticle or mask is reflected by a first mirror pair to a second field mirror ...


4
Thomas J Fenick: Locating device and method of placing a tooth implant. Arthur T Fattibene, Paul A Fattibene, May 14, 1991: US05015183 (114 worldwide citation)

A method and device for placing an implant or artificial tooth in the most optimal bone structure by providing a radiology stent having a radial opaque grid disposed therein placed in the vicinity of the void where the implant is to be placed and taking a series of oblique X-rays at spaced intervals ...


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Stuart Stanton, Gregg Gallatin, Mark Oskotsky, Frits Zernike: Hybrid illumination system for use in photolithography. SVG Lithography Systems, Paul A Fattibene, Arthur T Fattibene, Fattibene and Fattibene, May 20, 1997: US05631721 (97 worldwide citation)

An illumination system for use in photolithography having an array optical element near the formation of a desired illumination field. Light or electromagnetic radiation from an illumination source is expanded and received by a multi-image optical element forming a plurality of secondary illuminatio ...


7
Christian Sauska, George Csoknyai, David Packlocok: Ultraviolet water purification system with variable intensity control. Christian Sauska, George Csokneyai, Paul A Fattibene, Arthur T Fattibene, July 27, 1993: US05230792 (79 worldwide citation)

An ultraviolet purification system in which ultraviolet radiation is generated by an ultraviolet lamp wherein the amount of ultraviolet radiation is varied in accordance with fluid flow. The intensity of the ultraviolet lamp is controlled by a circuit which is responsive to fluid flow for selectivit ...


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David M Williamson: Catadioptric optical reduction system with high numerical aperture. SVG Lithography Systems, Paul A Fattibene, Robert Moll, Fattibene and Fattibene, July 16, 1996: US05537260 (74 worldwide citation)

A catadioptric optical reduction system for use in the photolithographic manufacture of semiconductors having a concave mirror operating near unit magnification, or close to a concentric condition. A lens group before the mirror provides only enough power to image the entrance pupil at infinity to t ...


9
John J Discko Jr: Disposable barrel dental impression material syringe. Centrix, Paul A Fattibene, Arthur T Fattibene, June 28, 1994: US05324273 (70 worldwide citation)

A disposable barrel dental impression syringe having a rotatable malleable needle cannula. A disposable barrel is fitted with a malleable needle cannula that is seated to permit easy rotation thereof. A handle is threaded onto the open end of the barrel. A plunger is fitted through the handle and ba ...


10
David Angeley, Stan Drazkiewicz, Gregg Gallatin: Off axis alignment system for scanning photolithography. SVG Lithography Systems, Paul A Fattibene, Fattibene and Fattibene, December 19, 1995: US05477057 (69 worldwide citation)

The invention described herein is an alignment system used in semiconductor manufacturing. It is the core component used to align a mask containing a circuit pattern to a wafer during a scanning sequence. The alignment system images an alignment reticle pattern onto a wafer which contains alignment ...