Ravi Laxman
Ravi K Laxman, Chongying Xu, Thomas H Baum: Low dielectric constant thin films and chemical vapor deposition method of making same. Oliver A Zitzmann, ATMI, November 21, 2002: US20020172766-A1 (1 worldwide citation)

A CVD process for producing low-dielectric constant, SiOC thin films using organosilicon precursor compositions having at least one alkyl group and at least one cleavable organic functional group that when activated rearranges and cleaves as a highly volatile liquid or gaseous by-product. In a first ...

George R Brandes, Xueping Xu: Microelectronic and microelectromechanical devices comprising carbon nanotube components, and methods of making same. Advanced Technology Materials, Oliver A Zitzmann, Steven J Hultquist, Margaret Chappuis, September 3, 2002: US06445006 (283 worldwide citation)

A microelectronic or microelectromechanical device, including a substrate and a carbon microfiber formed thereon, which may be employed as an electrical connector for the device or as a selectively translational component of a microelectromechanical (MEMS) device.

Philip C Barnett: Memory management method and apparatus for partitioning homogeneous memory and restricting access of installed applications to predetermined memory ranges. Advanced Technology Materials, Oliver A Zitzmann, Kevin M Mason, September 18, 2001: US06292874 (164 worldwide citation)

A memory management unit is disclosed for a single-chip data processing circuit, such as a smart card. The memory management unit (i) partitions a homogeneous memory device to achieve heterogeneous memory characteristics for various regions of the memory device, and (ii) restricts access of installe ...

Jeffrey S Flynn, George R Brandes, Robert P Vaudo, David M Keogh, Xueping Xu, Barbara E Landini: METHOD FOR ACHIEVING IMPROVED EPITAXY QUALITY (SURFACE TEXTURE AND DEFECT DENSITY) ON FREE-STANDING (ALUMINUM, INDIUM, GALLIUM) NITRIDE ((AL,IN,GA)N) SUBSTRATES FOR OPTO-ELECTRONIC AND ELECTRONIC DEVICES. Advanced Technology Materials, Oliver A Zitzmann, Steven J Hultquist, Margaret Chappuis, September 10, 2002: US06447604 (136 worldwide citation)

A III-V nitride homoepitaxial microelectronic device structure comprising a III-V nitride homoepitaxial epi layer on a III-V nitride material substrate, e.g., of freestanding character. Various processing techniques are described, including a method of forming a III-V nitride homoepitaxial layer on ...

Robert P Vaudo, Vivek M Phanse, Michael A Tischler: Low defect density (Ga, Al, In)N and HVPE process for making same. Advanced Technology Materials, Oliver A Zitzmann, Steven J Hultquist, Margaret Chappuis, August 27, 2002: US06440823 (118 worldwide citation)

A low defect density (Ga,Al,In)N material. The (Ga, Al, In)N material may be of large area, crack-free character, having a defect density as low as 3×10

Philip C Barnett: Field programmable gate array (FPGA) emulator for debugging software. Advanced Technology Materials, Oliver A Zitzmann, David G Rasmussen, January 9, 2001: US06173419 (109 worldwide citation)

An emulator is used to debug software operating on a target micro-controller in a target circuit environment. The emulator contains a field programmable gate array that is programmed to contain an emulated target micro-controller and an emulated monitoring circuit which monitors the operations of th ...


Xueping Xu, Charles P Beetz, George R Brandes, Robert W Boerstler, John W Steinbeck: Carbon fiber-based field emission devices. Advanced Technology Materials, Oliver A Zitzmann, February 16, 1999: US05872422 (94 worldwide citation)

Electron field emission devices (cold cathodes), vacuum microelectronic devices and field emission displays which incorporate cold cathodes and methods of making and using same. More specifically, cold cathode devices comprising electron emitting structures grown directly onto a substrate material. ...

Jose L Arno, Robert M Vermeulen: Fluorine abatement using steam injection in oxidation treatment of semiconductor manufacturing effluent gases. Advanced Technology Materials, Oliver A Zitzmann, Steven J Hultquist, Margaret Chappuis, July 23, 2002: US06423284 (88 worldwide citation)

An apparatus and process for abatement of halogen in a halogen-containing effluent gas, such as is produced by a semiconductor manufacturing plant utilizing perfluorocompounds in the operation of the plant. Halogen-containing effluent gas is contacted with water vapor in a thermal oxidation reactor ...

Philip Barnett, Andy Green: Method and apparatus for evaluating software programs for semiconductor circuits. Advanced Technology Materials, Oliver A Zitzmann, Ryan Mason & Lewis, April 24, 2001: US06223144 (76 worldwide citation)

A microcontroller software testing tool is disclosed for testing and debugging software for a semiconductor circuit. The microcontroller software testing tool includes a simulator for simulating the execution of the software program on the target semiconductor circuit and an emulator to permit emula ...

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