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Frank DiMeo Jr, Steven M Bilodeau, Peter C Van Buskirk: Digital chemical vapor deposition (CVD) method for forming a multi-component oxide layer. Advanced Technology Materials, Steven J Hultquist, Oliver A M Zitzmann, October 26, 1999: US05972430 (235 worldwide citation)

A chemical vapor deposition (CVD) method for forming a multi-component oxide layer. There is first provided a chemical vapor deposition (CVD) reactor chamber. There is then positioned within the chemical vapor deposition (CVD) reactor chamber a substrate. There is then formed over the substrate a mu ...


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Joan Redwing, Michael A Tischler: High brightness electroluminescent device emitting in the green to ultraviolet spectrum and method of making the same. Advanced Technology Materials, Steven J Hultquist, Oliver A M Zitzmann, February 23, 1999: US05874747 (199 worldwide citation)

A green-blue to ultraviolet light emitting semiconductor laser having a top contact, a Bragg reflector, cladding layer, active layer, cladding layer, buffer, substrate, bottom contact and a passivation layer. The key aspect is a Ga*N material on a base structure comprising a SiC substrate selected f ...


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Robin A Gardiner, Peter S Kirlin, Thomas H Baum, Douglas Gordon, Timothy E Glassman, Sofia Pombrik, Brian A Vaartstra: Method of forming metal films on a substrate by chemical vapor deposition. Oliver A M Zitzmann, Steven J Hultquist, August 29, 2000: US06110529 (145 worldwide citation)

A method of forming on a substrate a metal film, comprising depositing said metal film on said substrate via chemical vapor deposition from a metalorganic complex of the formula:


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Gautam Bhandari, Thomas H Baum: Tantalum amide precursors for deposition of tantalum nitride on a substrate. Advanced Technology Materials, Steven J Hultquist, Oliver A M Zitzmann, January 18, 2000: US06015917 (140 worldwide citation)

Tantalum and titanium source reagents are described, including tantalum amide and tantalum silicon nitride precursors for the deposition of tantalum nitride material on a substrate by processes such as chemical vapor deposition, assisted chemical vapor deposition, ion implantation, molecular beam ep ...


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Robin A Gardiner, Peter S Kirlin, Thomas H Baum, Douglas Gordon, Timothy E Glassman, Sofia Pombrik, Brian A Vaartstra: Precursor compositions for chemical vapor deposition, and ligand exchange resistant metal-organic precursor solutions comprising same. Advanced Technology Materials, Steven J Hultquist, Oliver A M Zitzmann, October 13, 1998: US05820664 (119 worldwide citation)

A metal source reagent liquid solution, comprising: (i) at least one metal coordination complex including a metal to which is coordinatively bound at least one ligand in a stable complex, wherein the ligand is selected from the group consisting of: .beta.-diketonates, .beta.-ketoiminates, .beta.-dii ...


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Philip C Barnett: Microcontroller incorporating an enhanced peripheral controller for automatic updating the configuration date of multiple peripherals by using a ferroelectric memory array. Advanced Technology Materials, Oliver A M Zitzmann, Steven J Hultquist, November 7, 2000: US06145020 (95 worldwide citation)

The present invention is an enhanced peripheral controller communicating between a microcontroller and multiple peripherals that increases the speed with which configuration data sets are loaded. The enhanced peripheral controller includes a programmable logic array (PLA) and an FeRAM array. A recon ...


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Luping Wang, Glenn M Tom: Fluid storage and dispensing system. Advanced Technology Materials, Steven J Hultquist, Oliver A M Zitzmann, July 18, 2000: US06089027 (88 worldwide citation)

A fluid storage and dispensing system comprising a vessel for holding a fluid at a desired pressure. The vessel has a pressure regulator, e.g., a single-stage or multi-stage regulator, associated with a port of the vessel, and set at a predetermined pressure. A dispensing assembly, e.g., including a ...


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Peter S Kirlin, Peter C Van Buskirk: Chemical mechanical polishing of FeRAM capacitors. Advanced Technology Materials, Steven J Hultquist, Oliver A M Zitzmann, November 2, 1999: US05976928 (83 worldwide citation)

A method of fabricating a ferroelectric capacitor structure by sequentially depositing a bottom electrode layer, a ferroelectric layer and a top electrode layer on a base structure, optionally with deposition of a layer of a conductive barrier material beneath the bottom electrode layer, to form a c ...


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Glenn M Tom, James V McManus: Gas source and dispensing system. Advanced Technology Materials, Steven J Hultquist, Oliver A M Zitzmann, November 30, 1999: US05993766 (74 worldwide citation)

A system for the storage and delivery of a sorbable fluid, comprising a storage and dispensing vessel containing a sorbent material having sorptive affinity for the sorbable fluid, and from which the fluid is desorbable by pressure-mediated and/or thermally-mediated desorption, wherein the sorbent m ...