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Belgacem Haba Belgacem (Bel) Haba
Joseph C Fjelstad, Para K Segaram, Belgacem Haba: Direct-connect signaling system. Samsung Electronics, Myers Bigel Sibley & Sajovec P A, August 2, 2011: US07989929 (1 worldwide citation)

A direct-connect signaling system including a printed circuit board and first and second integrated circuit packages disposed on the printed circuit board. A plurality of electric signal conductors extend between the first and second integrated circuit packages suspended above the printed circuit bo ...


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EUNKEE HONG
Yong Won Cha, Kyu Tae Na, Yong Soon Choi, Eunkee Hong, Ju Seon Goo: Methods of forming trench isolation layers using high density plasma chemical vapor deposition. Samsung Electronics, Myers Bigel Sibley & Sajovec P A, February 19, 2008: US07332409 (5 worldwide citation)

A method of forming a trench isolation layer can include forming an isolation layer in a trench using High Density Plasma Chemical Vapor Deposition (HDPCVD) with a carrier gas comprising hydrogen. Other methods are disclosed.


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EUNKEE HONG
Jong Wan Choi, Hong Gun Kim, Kyu Tae Na, Eunkee Hong: Method of forming a trench isolation layer and method of manufacturing a non-volatile memory device using the same. Samsung Electronics, Myers Bigel Sibley & Sajovec P A, October 13, 2009: US07601588 (4 worldwide citation)

In a method of forming a device isolation layer for minimizing a parasitic capacitor and a non-volatile memory device using the same, a trench is formed on a substrate. A first insulation layer is formed on a top surface of the substrate and on inner surfaces of the trench, so that the trench is par ...


4
EUNKEE HONG
Yongsoon Choi, Kyung moon Byun, Eunkee Hong, Eun kyung Baek: Method of fabricating a semiconductor microstructure. Samsung Electronics, Myers Bigel Sibley & Sajovec P A, September 27, 2011: US08026147 (1 worldwide citation)

Provided is a method of fabricating a semiconductor microstructure, the method including forming a lower material layer on a semiconductor substrate, the lower material layer including a nitride of a Group III-element; forming a mold material layer on the lower material layer; forming an etching mas ...


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EUNKEE HONG
Sang Don Nam, Sang Hoon Ahn, Eunkee Hong: Method of fabricating semiconductor device. Samsung Electronics, Myers Bigel Sibley & Sajovec P A, October 30, 2012: US08298910 (1 worldwide citation)

Provided is a method for fabricating a semiconductor device, including forming an interconnect structure including first and second interconnects and an insulating material between the first and second interconnects, forming a first mask layer and a second mask layer having a plurality of micropores ...


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EUNKEE HONG
Kyu hee Han, Sang hoon Ahn, Eunkee Hong: Integrated circuit devices having selectively strengthened composite interlayer insulation layers and methods of fabricating the same. Samsung Electronics, Myers Bigel Sibley & Sajovec P A, June 4, 2013: US08455985

An integrated circuit device includes a plurality of stacked circuit layers, at least one of the plurality of circuit layers including a composite interlayer insulation layer including laterally adjacent first and second insulating material regions having different mechanical strengths and dielectri ...


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EUNKEE HONG
Kyung seok Oh, Kyung mun Byun, Shin hye Kim, Deok young Jung, Gil heyun Choi, Eunkee Hong: Oxidation-promoting compositions, methods of forming oxide layers, and methods of fabricating semiconductor devices. Samsung Electronics, Myers Bigel Sibley & Sajovec P A, April 15, 2014: US08697583

Provided according to embodiments of the present invention are an oxidation-promoting compositions, methods of forming oxide layers, and methods of fabricating semiconductor devices. In some embodiments of the invention, the oxidation-promoting composition includes an oxidation-promoting agent havin ...


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Richard S Surwit, Lyle M Allen III, Sandra E Cummings: Systems, methods and computer program products for monitoring, diagnosing and treating medical conditions of remotely located patients. Healthware Corporation, Myers Bigel Sibley & Sajovec P A, February 15, 2000: US06024699 (701 worldwide citation)

Medical conditions of a plurality of remotely located patients are monitored, diagnosed, prioritized and treated using a central data processing system configured to communicate with and receive data from a plurality of respective patient monitoring systems. Patient monitoring systems are capable of ...


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Sang bom Kang, Hyun seok Lim, Yung sook Chae, In sang Jeon, Gil heyun Choi: Method of forming metal layer using atomic layer deposition and semiconductor device having the metal layer as barrier metal layer or upper or lower electrode of capacitor. Samsung Electronics, Myers Bigel Sibley & Sajovec P A, September 11, 2001: US06287965 (403 worldwide citation)

A method of forming a metal layer having excellent thermal and oxidation resistant characteristics using atomic layer deposition is provided. The metal layer includes a reactive metal (A), an element (B) for the amorphous combination between the reactive metal (A) and nitrogen (N), and nitrogen (N). ...


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