1
Naftali E Lustig, Katherine L Saenger, Ho Ming Tong: In-situ endpoint detection and process monitoring method and apparatus for chemical-mechanical polishing. International Business Machines Corporation, Michael J Balconi Lamica, Alison D Mortinger, July 18, 1995: US05433651 (343 worldwide citation)

An in-situ chemical-mechanical polishing process monitor apparatus for monitoring a polishing process during polishing of a workpiece in a polishing machine, the polishing machine having a rotatable polishing table provided with a polishing slurry, is disclosed. The apparatus comprises a window embe ...


2
Dennis K Coultas, John H Keller: Radio frequency induction/multipole plasma processing tool. International Business Machines Corporation, Michael J Balconi Lamica, Graham S Jones II, April 19, 1994: US05304279 (140 worldwide citation)

A dry processing apparatus for plasma etching or deposition includes a chamber for plasma processing having an external wall for housing a work piece with a surface to be plasma processed. A source of an induction field is located outside the chamber on its opposite side from the work piece. A radio ...


3
Jesus M Duque Anton, Dietmar W Kunz, Bernhard J Ruber: Cellular radio system having channel evaluation and optimal channel selection via trial use of non-assigned channels. U S Philips Corporation, Michael J Balconi Lamica, December 12, 1995: US05475868 (131 worldwide citation)

A mobile radio system includes fixed stations and mobile stations, a free channel for establishing connection to a mobile station being selected from a predetermined channel list for each fixed station. The individual station lists are initially assigned in a radio network planning phase. To adjust ...


4
Klaus D Beyer, Louis L Hsu, Victor J Silvestri, Andrie S Yapsir: Method of producing a thin silicon-on-insulator layer. International Business Machines Corporation, Michael J Balconi Lamica, August 10, 1993: US05234535 (129 worldwide citation)

A method of forming a thin silicon SOI layer by wafer bonding, the thin silicon SOI layer being substantially free of defects upon which semiconductor structures can be subsequently formed, is disclosed. The method comprises the steps of:


5
Dirk J Broer, Johan Lub: Cholesteric polarizer and the manufacture thereof. U S Philips Corporation, Michael J Balconi Lamica, April 9, 1996: US05506704 (121 worldwide citation)

A broadband cholesteric polarizer is described, as well as a method of manufacturing such a polarizer. Said polarizer comprises an optically active layer of a polymer material having a cholesteric order, said material being oriented so that the axis of the molecular helix extends transversely to the ...


6
Peter J Janssen, Jeffrey A Shimizu: High contrast illumination system for video projector. U S Philips Corporation, Michael J Balconi Lamica, August 15, 1995: US05442414 (120 worldwide citation)

A high contrast illumination system particularly suitable for use with light valves that have an array of reflective pivotable pixels. The light valve is arranged in light path which extends from a projection lamp to a projection lens. By the action of the pivotable pixels the light is directed eith ...


7
William A Goldman, Lee Morgan Smith, Oliver Mathews III, Kambiz Arab, William W King, Kelley M Murrell, Gary E Weaver: Method and system for predicting performance of a drilling system for a given formation. Dresser, Michael J Balconi Lamica, Haynes and Boone, August 29, 2000: US06109368 (96 worldwide citation)

A method and apparatus for predicting the performance of a drilling system for the drilling of a well bore in a given formation includes generating a geology characteristic of the formation per unit depth according to a prescribed geology model, obtaining specifications of proposed drilling equipmen ...


8
Naftali E Lustig, Randall M Feenstra, William L Guthrie: In-situ endpoint detection method and apparatus for chemical-mechanical polishing using low amplitude input voltage. International Business Machines Corporation, Michael J Balconi Lamica, August 9, 1994: US05337015 (95 worldwide citation)

An in-situ thickness monitoring/endpoint detection method and apparatus for chemical-mechanical polishing (CMP) of a dielectric layer on a top surface of a semiconductor wafer is disclosed. The apparatus comprises center and guard electrodes and associated electronic circuitry, including a high freq ...


9
John A Fitzsimmons, Janos Havas, Margaret J Lawson, Edward J Leonard, Bryan N Rhoads: Method for forming patterned films on a substrate. International Business Machines Corporation, Richard A Romanchik, Michael J Balconi Lamica, August 31, 1993: US05240878 (94 worldwide citation)

A method of forming patterned films on a semiconductor substrate 10 includes the steps of depositing a hardened photo resist underlay 30 onto the substrate, then depositing a polyether sulfone release layer 32, then depositing a photo sensitive resist layer 34 and exposing an etching a metallization ...


10
Thomas Vrhel Jr, Gaston M Barajas, Paul J Maia, W D Todd Nix: Method and apparatus for testing custom-configured software/hardware integration in a computer build-to-order manufacturing process. Dell USA, Michael J Balconi Lamica, Haynes and Boone, April 1, 2003: US06543047 (94 worldwide citation)

A build-to-order manufacturing method for producing a custom configured computer system includes obtaining a customer order. Hardware for the custom configured computer system is assembled in accordance with the customer order. The assembled hardware is then tested using software tools and utilities ...