1
David P Jackson, Orval F Buck: Cleaning process using phase shifting of dense phase gases. Hughes Aircraft Company, Mary E Lachman, W K Denson Low, May 7, 1991: US05013366 (167 worldwide citation)

A process for removing two or more contaminants from a substrate in a single process. The substrate to be cleaned is contacted with a dense phase gas at or above the critical pressure thereof. The phase of the dense phase gas is then shifted between the liquid state and the supercritical state by va ...


2
Thomas B Stanford Jr, Sidney C Chao: Method using megasonic energy in liquefied gases. Hughes Aircraft Company, Mary E Lachman, Michael W Sales, Wanda K Denson Low, October 10, 1995: US05456759 (97 worldwide citation)

A process for removing undesired sub-micrometer particulates from a chosen substrate (16) comprising the steps of: (a) placing the substrate containing the undesired particulates in a cleaning chamber (12) provided with megasonic energy-producing means (20); (b) introducing a liquefied gas (22), suc ...


3
David P Jackson: Dense phase gas photochemical process for substrate treatment. Hughes Aircraft Company, Mary E Lachman, W J Streeter, W K Denson Low, November 26, 1991: US05068040 (80 worldwide citation)

A process for removing undesired material from a chosen substrate by exposing the substrate simultaneously to ultraviolet radiation and a selected dense fluid, wherein the radiation produces a photochemical reaction that removes the undesired material from the substrate and the dense fluid enhances ...


4
John W Peters: Low temperature process for depositing oxide layers by photochemical vapor deposition. Hughes Aircraft Company, Mary E Lachman, William J Bethurum, A W Karambelas, February 1, 1983: US04371587 (67 worldwide citation)

The specification discloses a low temperature process for depositing oxide layers on a substrate by photochemical vapor deposition, by exposing the substrate to a selected vapor phase reactant in the presence of photochemically generated neutral (un-ionized) oxygen atoms. The oxygen atoms react with ...


5
Mao Jin Chern, Ronald T Smith, John W Peters: Process for forming a graded index optical material and structures formed thereby. Hughes Aircraft Company, Mary E Lachman, A W Karambelas, October 8, 1985: US04545646 (61 worldwide citation)

A process for depositing on the surface of a substrate a layer of a chosen material having continuous gradations in refractive index in a predetermined periodic pattern. The substrate is exposed to two vapor phase reactants which react upon radiation-inducement to produce the chosen material, and th ...


6
Gregory L Tangonan: Graded index waveguide structure and process for forming same. Hughes Aircraft Company, Mary E Lachman, William H MacAllister, Anthony W Karambelas, March 1, 1983: US04375312 (61 worldwide citation)

The specification discloses a process for forming a graded index waveguide structure by first providing a substrate of a first selected optical material having a chosen index of refraction. Next, a patterned layer of a second optical material is formed on one surface of the substrate or, optionally, ...


7
John W Peters: Process for depositing a conductive oxide layer. Hughes Aircraft, Mary E Lachman, A W Karambelas, March 24, 1987: US04652463 (51 worldwide citation)

The specification discloses a low-temperature process for depositing a layer of a conductive oxide of a chosen metal, such as tin oxide, on the surface of a substrate while simultaneously avoiding damage to the substrate. The process comprises exposing the substrate to a selected vapor phase reactan ...


8
John W Peters: Process for forming sulfide layers by photochemical vapor deposition. Hughes Aircraft Company, Mary E Lachman, A W Karambelas, May 8, 1984: US04447469 (48 worldwide citation)

The specification discloses a low-temperature process for depositing a layer of a sulfide of a chosen element, such as zinc sulfide, on the surface of a substrate while simultaneously avoiding damage to the substrate. The process comprises exposing the substrate to a selected vapor phase reactant co ...


9
Shi Yin Wong, Gregory L Tangonan: Organic optical waveguide device and method of making. Hughes Aircraft Company, Mary E Lachman, A W Karambelas, September 2, 1986: US04609252 (46 worldwide citation)

The specification describes a process for forming an organic optical waveguide device of predetermined planar geometry. First a layer of an organic photoactive composition (for example, phenylglyoxylic acid or a derivative thereof) is deposited to a predetermined thickness on a given substrate. The ...


10
Frank A Ludwig, Carl W Townsend: Gas permeable electrode for electrochemical system. Hughes Aircraft Company, Mary E Lachman, W J Streeter, September 12, 1989: US04865925 (42 worldwide citation)

An electrode apparatus adapted for use in electrochemical systems having an anode compartment and a cathode compartment in which gas and ions are produced and consumed in the compartments during generation of electrical current. The electrode apparatus includes a membrane for separating the anode co ...