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Fiolka Damian, Deguenther Markus: Polarization-modulating optical element. Carl Zeiss Smt, Fiolka Damian, Deguenther Markus, MÜLLER RISSMANN Werner, July 28, 2005: WO/2005/069081 (419 worldwide citation)

A polarization-modulating optical element (1) consisting of an optically active crystal material has a thickness profile where the thickness, as measured in th e direction of the optical axis, varies over the area of the optical element. The polarization-modulating optical element (1) has the effect ...


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Schuster Karl Heinz, Clauss Wilfried: Microlithography projection objective with crystal lens. Carl Zeiss Smt, Schuster Karl Heinz, Clauss Wilfried, MÜLLER RISSMANN Werner, June 30, 2005: WO/2005/059618 (409 worldwide citation)

Very high aperture microlithography projection objectives operating at the wavelengths of 248 nm, 193 nm and also 157 nm, suitable for optical immersion or near-field operation with aperture values that can exceed 1.4 are made feasible with crystalline lenses and crystalline end plates P of NaCl, KC ...


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Shafer David, Beder Susanne, Schuster Karl Heinz, Singer Wolfgang Dr: Objective as a microlithography projection objective with at least one liquid lens. Carl Zeiss Smt, Shafer David, Beder Susanne, Schuster Karl Heinz, Singer Wolfgang Dr, MÜLLER RISSMANN Werner, June 30, 2005: WO/2005/059654 (377 worldwide citation)

The invention relates to an objective designed as a microlithography projection objective for an operating wavelength. The objective has a greatest adjustable image-side numerical aperture NA, at least one first lens made from a solid transparent body, in particular glass or crystal, with a refracti ...


4
Schuster Karl Heinz: Microlithography projection objective with crystal elements. Carl Zeiss Smt, Schuster Karl Heinz, MÜLLER RISSMANN Werner, June 30, 2005: WO/2005/059645 (364 worldwide citation)

A microlithography projection objective is proposed with optical elements, i.e. lenses or planar-parallel plates (used as end-closure plates) of crystalline magnesium fluoride, quartz, lanthanum fluoride, sapphire and Alpha-aluminium oxide. Suitable crystallographic orientations, crystal 10 combinat ...


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Hudyma Russell, Ulrich Wilhelm, Rostalski Hans Jürgen: Compact projection objective for arf lithography. Carl Zeiss Smt, Hudyma Russell, Ulrich Wilhelm, Rostalski Hans Jürgen, MÜLLER RISSMANN Werner, May 6, 2005: WO/2005/040928 (10 worldwide citation)

According to one exemplary embodiment, a projection lens having an object plane and an image plane is provided and includes the following lens groups listed objectwise to imagewise: (1) a first lens group having negative refractive power; and (2) at least three other lens groups having a positive re ...


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Gruner Toralf, Epple Alexander, Kneer Bernhard, Wabra Norbert, Beder Susanne, Dorsel Andreas: (De) Abbildungssystem für eine mikrolithographische projektionsbelichtungsanlage, (En) Imaging system for a microlithographical projection light system. Carl Zeiss Smt, Gruner Toralf, Epple Alexander, Kneer Bernhard, Wabra Norbert, Beder Susanne, Dorsel Andreas, MÜLLER RISSMANN Werner, September 1, 2005: WO/2005/081068 (2 worldwide citation)

(EN) The invention relates to an imaging system of a microlithographical projection light system, comprising a projection lens (200, 300, 500, 600) which is used to reproduce a mask which can be positioned on a lens plane on a light-sensitive layer which can be positioned on an image plane; and a fl ...


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Hudyma Russell: Catadioptric projection system for 157 nm lithography. Carl Zeiss Smt, Hudyma Russell, MÜLLER RISSMANN Werner, June 6, 2002: WO/2002/044786 (1 worldwide citation)

A photolithographic reduction projection catadioptric objective includes a first optical group G1 including an even number of at least four mirrors M1-M6; and a second at least substantially dioptric optical group G2 imageward than the first optical group G1 including a number of lenses E4-E13. The ...


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Knupfer Klaus, Stacklies Horst: (De) Verfahren und anordnung zum erfassen von bewegungen eines teiles, (En) Process and device for sensing movements of a part. Carl Zeiss, Carl Zeiss Stiftung Handelnd Als, Carl Zeiss, Knupfer Klaus, Stacklies Horst, MÜLLER RISSMANN Werner, November 30, 1995: WO/1995/032579

(EN) A process and device are disclosed for sensing movements (oscillations) of a part (2). A mirror (21) with a self-collimator (1) or the like and an image sensor array (14) (CCD) of the frame transfer type with an adjustable transfer clock generator (2) for the line transfer and adjustable playba ...


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Schuster Karl Heinz: (De) Projektionsobjektiv, (En) Projection lens. Carl Zeiss Smt, Schuster Karl Heinz, MÜLLER RISSMANN Werner, July 4, 2002: WO/2002/052303

(EN) The invention relates to a projection illumination system and a projection lens comprising a lens arrangement consisting of at least one group of negative refractive lenses (LG2). Said lens group is comprised of at least 4 negative refractive lenses. A positive refractive lens (L9) is arranged ...