1
Nei Masahiro, Kobayashi Naoyuki, Arai Dai, Owa Soichi: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Nei Masahiro, Kobayashi Naoyuki, Arai Dai, Owa Soichi, KAWAKITA Kijuro, June 24, 2004: WO/2004/053953 (526 worldwide citation)

(EN) An exposure apparatus, wherein an exposure of a substrate (P) is carried out by locally filling the image plane side of a projection optical system (PL) with a liquid (50) and projecting an image of a pattern onto the substrate (P) through the projection optical system (PL) and the liquid (50), ...


2
Mizutani Hideo, Magome Nobutaka: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Mizutani Hideo, Magome Nobutaka, KAWAKITA Kijuro, June 24, 2004: WO/2004/053958 (504 worldwide citation)

(EN) An exposure apparatus, wherein an exposure of a substrate (P) is carried out by filling at least a portion of the space between a projection optical system and the substrate (P) with a liquid and projecting an image of a pattern onto the substrate (P) through the projection optical system and t ...


3
Magome Nobutaka, Takaiwa Hiroaki, Arai Dai: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Magome Nobutaka, Takaiwa Hiroaki, Arai Dai, KAWAKITA Kijuro, June 24, 2004: WO/2004/053952 (501 worldwide citation)

(EN) An exposure apparatus, wherein an exposure is carried out while filling a space between a projection optical system and a substrate with a liquid, enables to suppress deterioration of a device caused by adherent liquid on the substrate. A device manufacturing system (SYS) comprises an exposure ...


4
Nagasaka Hiroyuki, Magome Nobutaka: (Ja) 露光装置及び露光方法、デバイス製造方法, (En) Exposure apparatus, exposure method and method for manufacturing device. Nikon Corporation, Nagasaka Hiroyuki, Magome Nobutaka, KAWAKITA Kijuro, June 24, 2004: WO/2004/053956 (485 worldwide citation)

(EN) In an exposure apparatus, an exposure of a substrate (P) is carried out by filling at least a portion of the space between a projection optical system (PL) and the substrate (P) with a liquid (50) and projecting the image of a pattern onto the substrate (P) through the projection optical system ...


5
Nei Masahiro, Kobayashi Naoyuki, Chiba Hiroshi, Hirukawa Shigeru: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Nei Masahiro, Kobayashi Naoyuki, Chiba Hiroshi, Hirukawa Shigeru, KAWAKITA Kijuro, June 24, 2004: WO/2004/053954 (469 worldwide citation)

(EN) An exposure apparatus (EX) carries out an exposure of a substrate (P) by filling the space between a projection optical system (PL) and the substrate (P) with a liquid (50) and projecting an image of a pattern onto the substrate (P) through the liquid (50) using the projection optical system (P ...


6
Shirai Takeshi: (Ja) 光学素子及びその光学素子を用いた投影露光装置, (En) Optical device and projection exposure apparatus using such optical device. Nikon Corporation, Shirai Takeshi, KAWAKITA Kijuro, June 24, 2004: WO/2004/053959 (464 worldwide citation)

(EN) An immersion exposure apparatus comprises a projection optical system (PL) for projecting an image of a pattern onto a substrate (W) and a unit (5) for supplying a liquid (7) between an optical device (4) at the end of the projection optical system (PL) and the substrate (W). An erosion-resista ...


7
Owa Soichi: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Owa Soichi, KAWAKITA Kijuro, June 24, 2004: WO/2004/053950 (462 worldwide citation)

(EN) An exposure apparatus, wherein exposure is carried out while filling a space between a projection optical system and a substrate with a liquid, enables to suppress deterioration of a pattern image caused by air bubbles in the liquid. The exposure apparatus comprises a liquid supply unite (1) fo ...


8
Magome Nobutaka, Nei Masahiro, Hirukawa Shigeru, Kobayashi Naoyuki, Owa Soichi: (Ja) 露光方法及び露光装置並びにデバイス製造方法, (En) Exposure method, exposure apparatus and method for manufacturing device. Nikon Corporation, Magome Nobutaka, Nei Masahiro, Hirukawa Shigeru, Kobayashi Naoyuki, Owa Soichi, KAWAKITA Kijuro, June 24, 2004: WO/2004/053951 (457 worldwide citation)

(EN) When a substrate (P) is exposed to light through a projection optical system, a liquid (50) is supplied between the projection optical system and the substrate (P). Accordingly, a pattern forming area (AR1) of the substrate (P) is exposed to light through a projection optical system (PL) and th ...


9
Hidaka Yasuhiro, Mizutani Hideo, Magome Nobutaka, Owa Soichi: (Ja) 面位置検出装置、露光方法、及びデバイス製造方法, (En) Surface position detection apparatus, exposure method, and device porducing method. Nikon Corporation, Hidaka Yasuhiro, Mizutani Hideo, Magome Nobutaka, Owa Soichi, KAWAKITA Kijuro, June 24, 2004: WO/2004/053957 (452 worldwide citation)

(EN) A surface position detection apparatus (100) comprising a light transmitting system (8) for projecting a detection light onto a surface (S) to be detected, and a light receiving system (9) for receiving a reflection light from the surface (S)to be detected, the surface position information of t ...


10
Kobayashi Naoyuki, Tanimoto Akikazu, Mizuno Yasushi, Shiraishi Kenichi, Nakano Katsushi, Owa Soichi: (Ja) 露光装置及びデバイス製造方法, (En) Exposure device and device manufacturing method. Nikon Corporation, Kobayashi Naoyuki, Tanimoto Akikazu, Mizuno Yasushi, Shiraishi Kenichi, Nakano Katsushi, Owa Soichi, KAWAKITA Kijuro, December 2, 2004: WO/2004/105107 (257 worldwide citation)

(EN) There is provided an exposure device capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and liquid. The exposure device projects a pattern image onto the substrate (P) v ...