1
Charles Neer, Frank M Fago, Paul E Dieterlen, James H Goethel: Apparatus for injecting fluid into animals and disposable front loadable syringe therefor. Liebel Flarsheim Company, Donald F Frei, Joseph R Jordan, April 5, 1994: US05300031 (149 worldwide citation)

An animal fluid injector, replaceable syringe and method of replacement of the syringe in the injector are provided in which the syringe is loadable and unloadable into and from the injector through the open front end of a pressure jacket of the injector, thereby permitting replacement without retra ...


2
Robert F Foster, Helen E Rebenne, Rene E LeBlanc, Carl L White, Rikhit Arora: Semiconductor wafer processing CVD reactor apparatus comprising contoured electrode gas directing means. Materials Research Corporation, Donald F Frei, Joseph R Jordan, December 28, 1993: US05273588 (103 worldwide citation)

A semiconductor wafer processing apparatus, particularly a CVD reactor, is provided with plasma cleaning electrodes integrated into process gas flow shaping structure that smoothly directs the gas past the wafer on a susceptor. The processing apparatus preferably has a showerhead or other inlet to d ...


3
Charles Neer, Frank M Fago, Paul E Dieterlen, James H Goethel: Front loading apparatus for insecting fluid into animals. Liebel Flarsheim Company, Joseph R Jordan, January 18, 1994: US05279569 (96 worldwide citation)

An animal fluid injector, replaceable syringe and method of replacement of the syringe in the injector are provided in which the syringe is loadable and unloadable into and from the injector through the open front end of a pressure jacket of the injector, thereby permitting replacement without retra ...


4
Roberta A Hair: Interlocking paving stone for closed and open drainage patterns. Donald F Frei, Joseph R Jordan, February 15, 1994: US05286139 (66 worldwide citation)

A paving stone is provided that can be laid in a plurality of open patterns, each presenting a different amount of drainage area, while retaining an interlocking relationship between adjacent stones of the pattern. In the preferred embodiment, the stone can also be laid in a closed pattern, with no ...


5
Eric C Eichman, Bruce A Sommer, Michael J Churley, W Chuck Ramsey: Elimination of low temperature ammonia salt in TiCl.sub.4 NH.sub.3 CVD reaction. Materials Research Corporation, Donald F Frei, Joseph R Jordan, December 21, 1993: US05271963 (36 worldwide citation)

A cold wall CVD reactor, particularly one for use in depositing TiN in a TiCl.sub.4 +NH.sub.3 reaction, is provided with a metallic liner insert in partially thermally insulated from the reactor wall which serves as one plasma electrode to form a weak secondary plasma when energized along with a sec ...


6
Ebrahim Ghanbari: Cluster tool soft etch module and ECR plasma generator therefor. Materials Research Corporation, Donald F Frei, Joseph R Jordan, January 18, 1994: US05280219 (31 worldwide citation)

An electron cyclotron resonance plasma generator is provided in a semiconductor wafer plasma processing apparatus and cluster tool module, particularly for use in soft etching. The generator generates a uniform plasma by rotating a plasma producing resonance supporting magnetic field about the axis ...


7
Gary M Fishback: Nail and dimpler driving apparatus for nailing gun. The Dimpling Nailing Gun Company, Joseph R Jordan, October 18, 1988: US04778094 (18 worldwide citation)

A nail and dimpler driving apparatus for a nailing gun is provided having a barrel with a short hardened metal dimpler which slides longitudinally in the end of the barrel and comprises a hardened metal piston having a broadened face at its end extending symmetrically on opposite sides of a metal pl ...


8
Frank M Shinneman, Steven Hurwitt: Method and apparatus for sputter coating employing machine readable indicia carried by target assembly. Materials Research Corporation, Donald F Frei, Joseph R Jordan, February 8, 1994: US05284561 (6 worldwide citation)

An expendable target of sputter coating material is provided having secured thereto a storage medium having recorded thereon, in machine readable indicia, information relating to a characteristic of the target. The information preferably includes target identifying information and may also include i ...


9
Jozef Brcka: Protection of dielectric window in inductively coupled plasma generation. Tokyo Electron of TBS Broadcast Center, Joseph R Jordan, Wood Herron & Evans, May 1, 2003: US20030079838-A1 (1 worldwide citation)

To protect a dielectric window in an inductively coupled plasma reactor from depositions of coating or etched material from the plasma, a dielectric insert is placed inside of the chamber closely adjacent the window. Where a slotted shield inside of the window protects the window from deposition, bu ...


10
Richard R Turner, Robert Kircher, Dennis R Moran: Apparatus and method for collecting floating debris. Fresh Creek Technologies, Joseph R Jordan, Wood Herron & Evans, December 12, 2002: US20020185449-A1 (1 worldwide citation)

A floating system for collecting floatable debris is provided with curtains that direct the flow of water that contains floatables into the traps of the system while functioning as a pressure relief mechanism for the system which avoids placing excessive hydraulic forces on the system under extreme ...