1
Hiroshi Ito, Carlton G Willson, Jean M J Frechet: Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone. International Business Machines Corporation, Joseph G Walsh, January 1, 1985: US04491628 (561 worldwide citation)

Resists sensitive to UV, electron beam and X-ray radiation with positive or negative tone upon proper choice of a developer are formulated from a polymer having recurrent pendant groups such as tert-butyl ester or tert-butyl carbonates that undergo efficient acidolysis with concomitant changes in po ...


2
Hiroshi Ito, Scott A MacDonald, Robert D Miller, Carlton G Willson: Radiation sensitive and oxygen plasma developable resist. International Business Machines Corporation, Joseph G Walsh, November 12, 1985: US04552833 (92 worldwide citation)

A negative tone resist image is achieved by (1) coating a substrate with a film of a polymer containing a masked, reactive functionality; (2) imagewise exposing the film to radiation in a fashion such that the masked functionality is liberated; (3) contacting the film with an organometallic reagent; ...


3
Thomas H Baum, Frances A Houle, Carol R Jones, Caroline A Kovac: Selective deposition of copper. International Business Machines Corporation, Joseph G Walsh, March 4, 1986: US04574095 (88 worldwide citation)

A process for selectively depositing copper by first selectively depositing palladium seeds by irradiating a palladium compound with light. Following the deposition of the palladium seeds, copper is deposited by an electroless process.


4
Jean M J Frechet, Hiroshi Ito, Scott A MacDonald, Carlton G Willson: Positive tone oxygen plasma developable photoresist. International Business Machines Corporation, Joseph G Walsh, April 14, 1987: US04657845 (75 worldwide citation)

A positive tone photoresist is obtained without a solvent development step. The resist is a polymer containing masked reactive functionality which is imagewise exposed to unmask the functionality then treated with a non-organometallic reagent to remask that functionality. Following flood exposure, t ...


5
Nigel P Hacker, Carl E Larson: Sulfonium salt photoinitiators. International Business Machines Corporation, Joseph G Walsh, July 26, 1988: US04760013 (64 worldwide citation)

Alkyldiarylsulfonium salts of 9, 10,-dithiophenoxyanthracene are useful as photoinitiators in resist compositions, such as epoxy resin formulations, particularly using long wavelength light.


6
Hiroyuki Hiraoka: Dry process for forming positive tone micro patterns. International Business Machines Corporation, Joseph G Walsh, March 26, 1985: US04507331 (56 worldwide citation)

A dry process for forming a positive tone micro pattern by coating a substrate with an organic polymer film then with a film of an oxygen etch barrier, selected from the group consisting of films of organometallic, including organosilicon compounds and metals, exposing the etch barrier film to a low ...


7
Hiroyuki Hiraoka: Spray silylation of photoresist images. International Business Machines Corporation, Joseph G Walsh, Robert B Martin, March 12, 1991: US04999280 (51 worldwide citation)

Photoresist images are made resistant to reactive ion etching by treating them with a poly(dimethylsilazane).


8
Paul L Gendler, Barbara D Grant, Clinton D Snyder: Electrochromic recording paper. International Business Machines Corporation, Joseph G Walsh, January 5, 1982: US04309255 (49 worldwide citation)

A medium for electrochromic recording is provided by treating paper with a water soluble leuco methylene blue compound having the formula ##STR1## wherein R is a sulfonated aromatic or sulfonated aliphatic moiety.


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Robert L Jackson: Seeding process for electroless metal deposition. International Business Machines Corporation, Joseph G Walsh, October 20, 1987: US04701351 (40 worldwide citation)

A process for depositing and tightly binding noble metal seeds onto a substrate by coating the substrate with a very thin layer of a polymer which complexes with a noble metal compound and contacting the layer of polymer with a noble metal compound which forms a complex with the layer of polymer.