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Mita Takeshi, Maeda Kazushige, Komoda Mitsuaki: (Ja) 置換イソキサゾリン化合物及び有害生物防除剤, (En) Substituted isoxazoline compound and pest control agent. Nissan Chemical, Mita Takeshi, Maeda Kazushige, Komoda Mitsuaki, HANABUSA Tsuneo, September 20, 2007: WO/2007/105814 (51 worldwide citation)

(EN) Disclosed is a novel pest control agent, particularly an insecticide or an acaricide. Specifically disclosed is a substituted isoxazoline compound represented by the general formula (1) below or a salt thereof. Also disclosed is a pest control agent containing such a compound or a salt thereof. ...


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Mita Takeshi, Kikuchi Takamasa, Mizukoshi Takashi, Yaosaka Manabu, Komoda Mitsuaki: (Ja) イソキサゾリン置換ベンズアミド化合物及び有害生物防除剤, (En) Isoxazoline-substituted benzamide compound and noxious organism control agent. Nissan Chemical, Mita Takeshi, Kikuchi Takamasa, Mizukoshi Takashi, Yaosaka Manabu, Komoda Mitsuaki, HANABUSA Tsuneo, September 15, 2005: WO/2005/085216 (44 worldwide citation)

(EN) An isoxazoline-substituted benzamide compound of the general formula: (1) [wherein each of A1, A2 and A3 independently represents a carbon atom or nitrogen atom; G a benzene ring, etc.; W an oxygen atom or sulfur atom; X a halogen atom, C1-C6 haloalkyl, etc.; Y a halogen atom, C1-C6 alkyl, etc. ...


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Mita Takeshi, Furukawa Yuki, Iwasa Motoyoshi, Komoda Mitsuaki: (Ja) イソキサゾリン置換ベンズアミド化合物及び有害生物防除剤, (En) Isoxazoline-substituted benzamide compound and pest control agent. Nissan Chemical, Mita Takeshi, Furukawa Yuki, Iwasa Motoyoshi, Komoda Mitsuaki, HANABUSA Tsuneo, September 12, 2008: WO/2008/108448 (32 worldwide citation)

(EN) Disclosed is a novel pest control agent, particularly an insecticide or a miticide. Specifically disclosed is an isoxazoline-substituted benzamide compound represented by the general formula (1) (which is expressed as [chemical formula 1] in claim 1), or a salt thereof. Also disclosed is a pest ...


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Hatanaka Tadashi, Kimura Shigeo, Enomoto Tomoyuki: (Ja) ビニルエーテル化合物を含む反射防止膜形成組成物, (En) Antireflective film-forming composition containing vinyl ether compound. Nissan Chemical, Hatanaka Tadashi, Kimura Shigeo, Enomoto Tomoyuki, HANABUSA Tsuneo, November 24, 2005: WO/2005/111724 (17 worldwide citation)

(EN) Disclosed is an antireflective film-forming composition for forming an antireflective film which is used in the lithography process during semiconductor device production and can be developed with an alkaline developer for photoresists. Also disclosed is a method for forming a photoresist patte ...


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SAITO DAIGO: カルバゾールノボラック樹脂 (JA), Carbazole novolak resin (EN). NISSAN CHEMICAL, Hanabusa Tsuneo, December 23, 2010: WO/2010/147155 (16 worldwide citation)

Provided are a resist underlayer film having heat resistance for use in a lithographic process for semiconductor device production and a high-refractive-index film having transparency for use in electronic devices.Also provided is a polymer containing a unit structure represented by formula (1), whe ...


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Kishioka Takahiro, Sakamoto Rikimaru, Hiroi Yoshiomi, Maruyama Daisuke: (Ja) 縮合系ポリマーを有する半導体用反射防止膜, (En) Antireflection film for semiconductor containing condensation type polymer. Nissan Chemical, Kishioka Takahiro, Sakamoto Rikimaru, Hiroi Yoshiomi, Maruyama Daisuke, HANABUSA Tsuneo, October 20, 2005: WO/2005/098542 (16 worldwide citation)

(EN) [PROBLEMS] To provide an antireflection film that exhibits a high light reflection preventing effect, being free from intermixing with photoresists, and that can be employed in a lithography process using irradiation beam, such as those from ArF excimer laser and F2 excimer laser, and further t ...


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Mita Takeshi, Furukawa Yuki, Toyama Ken Ichi, Yaosaka Manabu, Ikeda Eitatsu, Masuzawa Yoshihide, Komoda Mitsuaki: (Ja) イソキサゾリン置換ベンズアミド化合物及び有害生物防除剤, (En) Isoxazoline-substituted benzamide compound and harmful organism-controlling agent. Nissan Chemical, Mita Takeshi, Furukawa Yuki, Toyama Ken Ichi, Yaosaka Manabu, Ikeda Eitatsu, Masuzawa Yoshihide, Komoda Mitsuaki, HANABUSA Tsuneo, March 8, 2007: WO/2007/026965 (15 worldwide citation)

(EN) Disclosed is a novel harmful organism-controlling agent, particularly an insecticide or acaricide. An isoxazoline-substituted benzamide compound represented by the general formula (1) or a salt thereof; and a harmful organisms-controlling agent comprising the compound or salt: (1) wherein A1, A ...


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Kawahara Kouji, Nakao Kenichi, Yamaki Haruna: (Ja) タムスロシン含有経皮吸収型製剤, (En) Tamsulosin-containing percutaneous absorption type preparation. Nichiban, Kawahara Kouji, Nakao Kenichi, Yamaki Haruna, HANABUSA Tsuneo, October 25, 2007: WO/2007/119656 (15 worldwide citation)

(EN) A tamsulosin-containing percutaneous absorption type preparation. A percutaneous absorption type preparation comprising a support and an adhesive layer on the support, characterized in that the adhesive layer contains an acrylic adhesive, further contains tamsulosin as an active ingredient in a ...


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Mita Takeshi, Maeda Kazushige, Yamada Youko, Ikeda Eitatsu, Toyama Ken Ichi, Komoda Mitsuaki: Substituted isoxazoline compound and pest control agent. Nissan Chemical, Mita Takeshi, Maeda Kazushige, Yamada Youko, Ikeda Eitatsu, Toyama Ken Ichi, Komoda Mitsuaki, HANABUSA Tsuneo, March 19, 2009: WO/2009/035004 (14 worldwide citation)

Disclosed is a novel pest control agent, especially an insecticide or a miticide. Specifically disclosed is a substituted isoxazoline compound represented by the general formula (1) of claim 1 (wherein A1, A2 and A3 independently represent CH, N or the like; X1, X2 and X3 independently represent a h ...


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Mizukoshi Takashi, Sakurai Yasuhiro, Matoba Kazutaka, Yaosaka Manabu: (Ja) 1,3-ビス(置換フェニル)-3-ヒドロキシプロパン-1-オンおよび2-プロペン-1-オン化合物およびその塩, (En) 1,3-bis(substituted phenyl)-3-hydroxypropan-1-one or 2-propen-1-one compound, and salt thereof. Nissan Chemical, Mizukoshi Takashi, Sakurai Yasuhiro, Matoba Kazutaka, Yaosaka Manabu, HANABUSA Tsuneo, July 5, 2007: WO/2007/074789 (13 worldwide citation)

(EN) Disclosed is a novel process intermediate represented by the general formula (1) or (2): wherein X represents a halogen atom, a cyano group or the like; Y represents a halogen atom, a cyano group or the like; R1 represents a C1-C6 haloalkyl group or a C3-C8 halocycloalkyl group; R2 represents a ...