1
Dr. Jill S. Becker
Roy G Gordon, Jill Becker, Dennis Hausmann, Seigi Suh: Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide. President and Fellows of Harvard College, Wilmer Cutler Pickering Hale and Dorr, November 29, 2005: US06969539 (45 worldwide citation)

Metal silicates or phosphates are deposited on a heated substrate by the reaction of vapors of alkoxysilanols or alkylphosphates along with reactive metal amides, alkyls or alkoxides. For example, vapors of tris-(ter-butoxy)silanol react with vapors of tetrakis(ethylmethylamido)hafnium to deposit ha ...


2
Dr. Jill S. Becker
Roy G Gordon, Jill Becker, Dennis Hausmann, Seigi Suh: Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide. Hale And Dorr, March 4, 2004: US20040043149-A1 (1 worldwide citation)

Metal silicates or phosphates are deposited on a heated substrate by the reaction of vapors of alkoxysilanols or alkylphosphates along with reactive metal amides, alkyls or alkoxides. For example, vapors of tris-(ter-butoxy)silanol react with vapors of tetrakis(ethylmethylamido)hafnium to deposit ha ...


3
Dr. Jill S. Becker
Roy Gerald Gordon, Jill S Becker, Dennis Hausmann: Vapor deposition of silicon dioxide nanolaminates. President and Fellows of Harvard College, Wilmer Cutler Pickering Hale and Dorr, September 17, 2013: US08536070

This invention relates to materials and processes for thin film deposition on solid substrates. Silica/alumina nanolaminates were deposited on heated substrates by the reaction of an aluminum-containing compound with a silanol. The nanolaminates have very uniform thickness and excellent step coverag ...


4
Dr. Jill S. Becker
Roy G Gordon, Jill S Becker, Dennis Hausmann, Seigi Suh: Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide. President and Fellows of Harvard College, Wilmer Cutler Pickering Hale and Dorr, December 18, 2012: US08334016

Metal silicates or phosphates are deposited on a heated substrate by the reaction of vapors of alkoxysilanols or alkylphosphates along with reactive metal amides, alkyls or alkoxides. For example, vapors of tris(tert-butoxy)silanol react with vapors of tetrakis(ethylmethylamido)hafnium to deposit ha ...


5
Dr. Jill S. Becker
Roy G Gordon, Jill Becker, Dennis Hausmann: Vapor deposition of silicon dioxide nanolaminates. President And Fellows of Harvard College, Wilmer Cutler Pickering Hale and Dorr, August 30, 2011: US08008743

This invention relates to materials and processes for thin film deposition on solid substrates. Silica/alumina nanolaminates were deposited on heated substrates by the reaction of an aluminum-containing compound with a silanol. The nanolaminates have very uniform thickness and excellent step coverag ...


6
Dr. Jill S. Becker
Roy G Gordon, Seigi Suh, Jill Becker: Vapor deposition of tungsten nitride. President and Fellows of Harvard College, Wilmer Cutler Pickering Hale And Dorr, June 15, 2006: US20060125099-A1

Tungsten nitride films were deposited on heated substrates by the reaction of vapors of tungsten bis(alkylimide)bis(dialkylamide) and a Lewis base or a hydrogen plasma. For example, vapors of tungsten bis(tert-butylimide)bis(dimethylamide) and ammonia gas supplied in alternate doses to surfaces heat ...


7
Dr. Jill S. Becker
Roy G Gordon, Jill Becker, Dennis Hausmann: Vapor deposition of silicon dioxide nanolaminates. President and fellows of Harvard College, Wilmer Cutler Pickering Hale And Dorr, May 26, 2005: US20050112282-A1

This invention relates to materials and processes for thin film deposition on solid substrates. Silica/alumina nanolaminates were deposited on heated substrates by the reaction of an aluminum-containing compound with a silanol. The nanolaminates have very uniform thickness and excellent step coverag ...


8
Dr. Jill S. Becker
Roy G Gordon, Jill Becker, Dennis Hausmann, Seigi Suh: Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide. President and Fellows of Harvard College, Wilmer Cutler Pickering Hale And Dorr, December 15, 2005: US20050277780-A1

Metal silicates or phosphates are deposited on a heated substrate by the reaction of vapors of alkoxysilanols or alkylphosphates along with reactive metal amides, alkyls or alkoxides. For example, vapors of tris(tert-butoxy)silanol react with vapors of tetrakis(ethylmethylamido)hafnium to deposit ha ...


9
Ariel Ferdman, Jing wen Kuo, David Miller, Vladimir Pinsky, William D Richards, David Swann: Method and device for wound closure. Ariel Ferdman, Hale and Dorr, September 22, 1992: US05149331 (521 worldwide citation)

A method of treating a wound site wherein a porous, adhesive backed dressing is utilized. A vacuum and/or heat is applied to the wound site through the dressing so as to draw the tissue adjacent the wound site to the dressing so as to minimize trauma to the wound and increase the adherence of the ad ...


10
Raymond S Kasevich, James F McQueeney, Ronald H Crooker: Microwave balloon angioplasty. Kasevich Associates, Hale and Dorr, October 15, 1991: US05057106 (468 worldwide citation)

A microwave catheter system used for heating arterial plaque and including a catheter member adapted for positioning in the artery and an inflatable balloon supported at the distal end of the catheter member. Microwave energy is coupled by means of a transmission line to an antenna means. An optic f ...



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