1
Maricela Morales Charles Szmanda
Charles R Szmanda, George G Barclay, Peter Trefonas, Wang Yueh: Polymer and photoresist compositions. Shipley Company, S Matthew Cairns, c o EDWARDS & ANGELL, October 31, 2002: US20020160302-A1 (1 worldwide citation)

Disclosed are spirocyclic olefin polymers, methods of preparing spirocyclic olefin polymers, photoresist compositions including spirocyclic olefin resin binders and methods of forming relief images using such photoresist compositions.


2
Maricela Morales Charles Szmanda
Charles R Szmanda, George G Barclay, Peter Trefonas, Wang Yueh: Polymer and photoresist compositions. Shipley Company, Edwards & Angell, Dike Bronstein Roberts & Cushman IP Group, November 21, 2002: US20020173680-A1 (1 worldwide citation)

Disclosed are spirocyclic olefin polymers, methods of preparing spirocyclic olefin polymers, photoresist compositions including spirocyclic olefin resin binders and methods of forming relief images using such photoresist compositions.


3
Maricela Morales Charles Szmanda
Peter Trefonas, Gary N Taylor, Charles R Szmanda: Novel polymers and photoresist compositions for short wavelength imaging. Shipley Company, Peter F Corless, Edwards & Angell, May 2, 2002: US20020051938-A1

This invention relates to resins and photoresist compositions that comprise such resins. Preferred polymers of the invention comprise adjacent saturated carbon atoms, either integral or pendant to the polymer backbone, that have a substantially gauche conformation. Polymers of the invention are part ...


4
Maricela Morales Charles Szmanda
Charles R Szmanda, George G Barclay, Peter Trefonas, Wang Yueh: Polymer and photoresist compositions. Shipley Company, Dike Bronstein Roberts & Cushman IP Group, c o EDWARDS & ANGELL, October 24, 2002: US20020155380-A1

Disclosed are spirocyclic olefin ploymers, methods of preparing spirocyclic olefin polymers, photoresist compositions including spirocyclic olefin resin binders and methods of forming relief images using such photoresist compositions.


5
Nathaniel Brese Angelo Lamola
Angelo A Lamola, Nathaniel E Brese: Electronic device manufacture. Rohm and Haas Electronic Chemicals, Edwards & Angell, December 30, 2004: US20040262751-A1

Compositions suitable for use as underfill materials in an integrated circuit assembly are provided. Also provided are methods of preparing integrated circuit assemblies containing certain underfill materials as well as electronic devices containing such integrated circuit assemblies.


6
Charles Szmanda
James W Thackeray, Gerald B Wayton, Charles R Szmanda: Coating compositions for use with an overcoated photoresist. Rohm and Haas Electronic Materials, Peter F Corless, Darryl P Frickey, Edwards Angell Palmer & Dodge, September 8, 2009: US07585612 (25 worldwide citation)

Underlying coating compositions are provided for use with an overcoated photoresist composition. In one aspect, the coating composition can be crosslinked and comprise one or more components that contain one or more acid-labile groups and/or one or more base-reactive groups that are reactive followi ...


7
Charles Szmanda
Charles R Szmanda, Anthony Zampini: Solvents and photoresist compositions for short wavelength imaging. Shipley Company L L C, Peter F Corless, Darryl P Frickey, Edwards & Angell, September 7, 2004: US06787286 (16 worldwide citation)

New photoresists are provides that are suitable for short wavelength imaging, particularly sub-170 nm such as 157 nm. Resists of the invention comprise a fluorine-containing polymer, a photoactive component, and a solvent component. Preferred solvents for use on the resists of the invention can main ...


8
Charles Szmanda
Anthony Zampini, Charles R Szmanda, Gary N Taylor, James F Cameron, Gerhard Pohlers: Photoresist compositions for short wavelength imaging. Shipley Company L L C, Peter F Corless, Darryl P Prickey, Edwards & Angell, February 22, 2005: US06858379 (7 worldwide citation)

New photoresists are provided that are suitable for short wavelength imaging, including sub-200 nm such as 157 nm. In one aspect, resists of the invention comprise a fluorine-containing polymer, a photoactive component, and one or more additional components of an amine or other basic composition, a ...


9
Stéphane De Lombaert
Rajagopal Bakthavatchalam, Charles A Blum, Stéphane De Lombaert, Taeyoung Yoon, Xiaozhang Zheng: Biaryl piperazinyl-pyridine analogues. Neurogen Corporation, Edwards Angell Palmer & Dodge, Peter F Corless, Mark D Russett, July 28, 2009: US07566712 (6 worldwide citation)

Biaryl piperazinyl-pyridine analogues are provided, of the Formula: wherein variables are as described herein. Such compounds are ligands that may be used to modulate specific receptor activity in vivo or in vitro, and are particularly useful in the treatment of conditions associated with pathologic ...


10
Stéphane De Lombaert
Rajagopal Bakthavatchalam, Timothy M Caldwell, Bertrand L Chenard, Stéphane De Lombaert, Kevin J Hodgetts: Substituted quinolin-4-ylamine analogues. Neurogen Corporation, Edwards Angell Palmer & Dodge, Peter F Corless, Mark D Russett, February 10, 2009: US07488740 (6 worldwide citation)

Substituted quinolin-4-ylamine analogues are provided. Such compounds are ligands that may be used to modulate specific receptor activity in vivo or in vitro, and are particularly useful in the treatment of conditions associated with pathological receptor activation in humans, domesticated companion ...