1
Maricela Morales Charles Szmanda
Charles R Szmanda, George G Barclay, Peter Trefonas, Wang Yueh: Polymer and photoresist compositions. Shipley Company, Edwards & Angell, Dike Bronstein Roberts & Cushman IP Group, November 21, 2002: US20020173680-A1 (1 worldwide citation)

Disclosed are spirocyclic olefin polymers, methods of preparing spirocyclic olefin polymers, photoresist compositions including spirocyclic olefin resin binders and methods of forming relief images using such photoresist compositions.


2
Maricela Morales Charles Szmanda
Charles R Szmanda, George G Barclay, Peter Trefonas, Wang Yueh: Polymer and photoresist compositions. Shipley Company, Dike Bronstein Roberts & Cushman IP Group, c o EDWARDS & ANGELL, October 24, 2002: US20020155380-A1

Disclosed are spirocyclic olefin ploymers, methods of preparing spirocyclic olefin polymers, photoresist compositions including spirocyclic olefin resin binders and methods of forming relief images using such photoresist compositions.


3
Charles Szmanda
Anthony Zampini, Charles R Szmanda, Gary N Taylor, James F Cameron, Gerhard Pohlers: Photoresist compositions for short wavelength imaging. Shipley Company, Edwards & Angell, Dike Bronstein Roberts & Cushman IP Group, February 6, 2003: US20030027077-A1

New photoresists are provided that are suitable for short wavelength imaging, including sub-200 nm such as 157 nm. In one aspect, resists of the invention comprise a fluorine-containing polymer, a photoactive component, and one or more additional components of an amine or other basic composition, a ...


4
Garo Khanarian
Garo Khanarian, Yujian You, Robert H Gore, Angelo A Lamola: Porous optical materials. Shipley Company, c o EDWARDS & ANGELL, Dike Bronstein Roberts & Cushman IP Group, January 9, 2003: US20030008244-A1

Methods of preparing porous optical materials are provided. These methods allow for the selection of the desired pore size and level of porosity in the porous optical material. Such methods utilize a preformed polymeric porogen.


5
Charles Szmanda
Charles R Szmanda: Photoresist composition. Shipley Company, Edwards & Angell, Dike Bronstein Roberts & Cushman IP Group, February 6, 2003: US20030027076-A1

Disclosed are photoresist compositions suitable for imaging with sub 200 nm wavelength radiation including as polymerized units one or more monomers having an electronegative substituent and an ester group containing certain leaving groups. Also disclosed are methods of providing photoresist relief ...


6
Charles Szmanda
Robert L Brainard, Charles R Szmanda: Photoresists for imaging with high energy radiation. Shipley Company, Edwards & Angell, Dike Bronstein Roberts & Cushman IP Group, May 2, 2002: US20020051932-A1

Photoresists are provided that are useful for imaging with high energy radiation sources, such as EUV, electron beam, ion beam and x-ray radiation. Resists of the invention can exhibit enhanced sensitivity and resolution upon such high energy imaging. In a first aspect, preferred resists of the inve ...


7
Deodatta Shenai-Khatkhate
Deodatta Vinayak Shenai Khatkhate, Michael Brendan Power, Artashes Amamchyan, Ronald L DiCarlo: Alkyl Group VA metal compounds. Shipley Company, Edwards & Angell, Dike Bronstein Roberts & Cushman IP Group, September 25, 2003: US20030181746-A1

Disclosed are methods of preparing monoalkyl Group VA metal dihalide compounds in high yield and high purity by the reaction of a Group VA metal trihalide with an organo lithium reagent or a compound of the formula RnM1X3n , where R is an alkyl, M1 is a Group IIIA metal, X is a halogen and n is an i ...


8
Deodatta Shenai-Khatkhate
Deodatta Vinayak Shenai Khatkhate, Ronald L DiCarlo: Organoindium compounds. Shipley Company, Edwards & Angell, Dike Bronstein Roberts & Cushman IP Group, September 25, 2003: US20030181745-A1

Disclosed are trialkylindium compounds containing two bulky alkyl groups that are liquids or easily liquefiable solids and have sufficient vapor pressure for use in vapor deposition processes, as well as methods of depositing indium containing films using such compounds.


9
Deodatta Shenai-Khatkhate
Deodatta Vinayak Shenai Khatkhate, Michael Brendan Power, Artashes Amamchyan: Alkyl group VA metal compounds. Shipley Company, c o EDWARDS & ANGELL, Dike Bronstein Roberts & Cushman IP Group, October 23, 2003: US20030199704-A1

Disclosed are methods of preparing monoalkyl Group VA metal dihalide compounds in high yield and high purity by the reaction of a Group VA metal trihalide with an organo lithium reagent or a compound of the formula RnM1X3-n where R is an alkyl, M1 is a Group IIIA metal, X is a halogen and n is an in ...


10
Deodatta Shenai-Khatkhate
Deodatta V Shenai Khatkhate, Michael B Power, Artashes Amamchyan: Trialkyl Group VA metal compounds. Shipley Company, Edwards & Angell, Dike Bronstein Roberts & Cushman IP Group, December 12, 2002: US20020188145-A1

Disclosed are methods of preparing trialkyl Group VA metal compounds in high yield and high purity. Such trialkyl Group VA metal compounds are substantially free of oxygenated impurities, ethereal solvents and metallic impurities.