1
Charles Szmanda
Gary N Taylor, Charles R Szmanda: Polymers and photoresist compositions. Shipley Company L L C, Darryl P Frickey, Peter F Corless, May 2, 2000: US06057083 (41 worldwide citation)

The present invention provides novel polymers and chemically-amplified positive-acting photoresist compositions that contain such polymers as a resin binder component. Preferred polymers of the invention include one or more structural groups that are capable of reducing the temperature required for ...


2
Garo Khanarian
Jeffrey Lawrence Daecher, Steven David Fields, Garo Khanarian, Alan Daniel Stein: Process and apparatus for forming plastic sheet. Rohm and Haas Company, S Matthew Cairns, Darryl P Frickey, John L Lemanowicz, February 6, 2001: US06183829 (40 worldwide citation)

Disclosed is an apparatus for formation of high quality plastic sheet in a continuous fashion. Also disclosed are a variety of optical and electronic display applications for high quality plastic sheet produced in a continuous fashion.


3
Charles Szmanda
James W Thackeray, Gerald B Wayton, Charles R Szmanda: Coating compositions for use with an overcoated photoresist. Rohm and Haas Electronic Materials, Peter F Corless, Darryl P Frickey, Edwards Angell Palmer & Dodge, September 8, 2009: US07585612 (21 worldwide citation)

Underlying coating compositions are provided for use with an overcoated photoresist composition. In one aspect, the coating composition can be crosslinked and comprise one or more components that contain one or more acid-labile groups and/or one or more base-reactive groups that are reactive followi ...


4
Charles Szmanda
Charles R Szmanda, Anthony Zampini: Solvents and photoresist compositions for short wavelength imaging. Shipley Company L L C, Peter F Corless, Darryl P Frickey, Edwards & Angell, September 7, 2004: US06787286 (16 worldwide citation)

New photoresists are provides that are suitable for short wavelength imaging, particularly sub-170 nm such as 157 nm. Resists of the invention comprise a fluorine-containing polymer, a photoactive component, and a solvent component. Preferred solvents for use on the resists of the invention can main ...


5
Charles Szmanda
Charles R Szmanda, Gary N Taylor, Robert L Brainard, Manuel DoCanto: Photoresist compositions. Shipley Company L L C, Robert L Goldberg, Peter F Corless, Darryl P Frickey, March 2, 1999: US05876899 (10 worldwide citation)

A method for making an acrylic resin photoresist characterized by polymerization of an acrylic monomer in a solvent that dissolves all monomers and resultant polymers. The use of the solvent permits formation of acrylic resins suitable for use in the preparation of photoresists without recovery from ...


6
Charles Szmanda
Uday Kumar, Charles R Szmanda, Roger F Sinta, Leonard E Bogan Jr: Polymers and photoresist compositions. Shipley Company L L C, Peter F Corless, Darryl P Frickey, S Matthew Cairns, June 20, 2000: US06077643 (8 worldwide citation)

The present invention provides novel polymers and chemically-amplified positive-acting photoresist compositions that contain such polymers as a resin binder component. The polymers of the invention include acid labile groups that contain isobornyl moieties and groups that contribute to aqueous devel ...


7
Charles Szmanda
Peter Trefonas III, Charles R Szmanda, Gerald C Vizvary: Radiation sensitive composition containing novel dye. Shipley Company L L C, Darryl P Frickey, S Matthew Cairns, Peter F Corless, August 29, 2000: US06110641 (8 worldwide citation)

A photoresist composition comprising an alkali soluble resin, a photoacid generating compound that undergoes photolysis when exposed to a pattern of activating irradiation within a wavelength of from 330 to 700 .mu.m, a crosslinking agent capable of crosslinking the composition when activated by pho ...


8
Charles Szmanda
Charles R Szmanda, Peter Trefonas III: Negative photoresist composition. Shipley Company L L C, Robert L Goldberg, Peter F Corless, Darryl P Frickey, February 2, 1999: US05866299 (6 worldwide citation)

A photoresist composition and process that minimizes the effect of photogenerated acid migration. The photoresist comprises an alkali soluble resin, a photoacid generating compound that undergoes photolysis within a wavelength of from 330 to 700 nm to yield a strong acid, a crosslinking agent capabl ...


9
Charles Szmanda
Gary N Taylor, George G Barclay, Charles R Szmanda: Polymers and photoresist compositions for short wavelength imaging. Shipley Company L L C, S Matthew Cairns, Peter F Corless, Darryl P Frickey, December 26, 2000: US06165674 (4 worldwide citation)

The present invention provides novel polymers and photoresist compositions that comprise the polymers as a resin binder component. The photoresist compositions of the invention can provide highly resolved relief images upon exposure to extremely short wavelengths, including well-resolved 0.25 micron ...


10
Charles Szmanda
Charles R Szmanda: Photoresist composition. Shipley Company L L C, Peter F Corless, Darryl P Frickey, Edwards & Angell, February 15, 2005: US06855475 (3 worldwide citation)

Disclosed are photoresist compositions suitable for imaging with sub 200 nm wavelength radiation including as polymerized units one or more monomers having an electronegative substituent and an ester group containing certain leaving groups. Also disclosed are methods of providing photoresist relief ...



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