1
Poon Alex Ka Tim, Kho Leonard Wai Fung: Apparatus and method for providing fluid for immersion lithography. Nikon Corporation, Poon Alex Ka Tim, Kho Leonard Wai Fung, COSTANTINO Mario A, March 17, 2005: WO/2005/024517 (577 worldwide citation)

Embodiments of the present invention are directed to a system and a method of controlling the fluid flow and pressure to provide stable conditions for immersion lithography. A fluid is provided in a space (34) between the lens (22) and the substrate (16) during the immersion lithography process. Flu ...


2
Hazelton Andrew J, Sogard Michael: Environmental system including vaccum scavange for an immersion lithography apparatus. Nikon Corporation, Hazelton Andrew J, Sogard Michael, COSTANTINO Mario A, October 21, 2004: WO/2004/090634 (573 worldwide citation)

An environmental system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid barrier (254) and an immersion fluid system (252). The fluid barrier (254) is positioned near the device (30). The immersion fluid system (252) delivers an i ...


3
Novak Thomas W, Hazelton Andrew J, Watson Douglas C: Environmental system including a transport region for an immersion lithography apparatus. Nikon Corporation, Novak Thomas W, Hazelton Andrew J, Watson Douglas C, COSTANTINO Mario A, October 28, 2004: WO/2004/092833 (572 worldwide citation)

An environmental system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid barrier (254), an immersion fluid system (252), and a transport region (256). The fluid barrier (254) is positioned near the device (30) and maintains the tr ...


4
Hazelton Andrew J, Kawai Hidemi, Watson Douglas C, Novak W Thomas: Cleanup method for optics in immersion lithography. Nikon Corporation, Hazelton Andrew J, Kawai Hidemi, Watson Douglas C, Novak W Thomas, COSTANTINO Mario A, October 28, 2004: WO/2004/093130 (561 worldwide citation)

An immersion lithography apparatus has a reticle stage (RST) arranged to retain a reticle (R), a working stage (9) arranged to retain a workpiece (W), and an optical system including an illumination source (1) and an optical element (PL) opposite the workpiece for having an image pattern of the reti ...


5
Novak Thomas W: Run-off path to collect liquid for an immersion lithography apparatus. Nikon Corporation, Novak Thomas W, COSTANTINO Mario A, October 28, 2004: WO/2004/093160 (552 worldwide citation)

An exposure apparatus (10) for transferring an image to a device (30) includes an optical assembly (16), an immersion fluid system (252), and a device stage assembly (20). The optical assembly (16) is positioned a gap (246) above the device (30). The immersion fluid system (252) fills the gap (246) ...


6
Coon Derek, Hazelton Andrew J: Immersion lithography fluid control system. Nikon Corporation, Coon Derek, Hazelton Andrew J, COSTANTINO Mario A, October 28, 2004: WO/2004/093159 (541 worldwide citation)

A fluid control system for immersion lithography is formed with an optical member (4) such as a lens, a workpiece (W) such as a semiconductor wafer with a surface disposed opposite to the optical member with a gap in between, a fluid-supplying device (21) for providing an immersion fluid (7) such as ...


7
Sogard Michael: Using isotopically specified fluids as optical elements. Nikon Corporation, Sogard Michael, COSTANTINO Mario A, January 20, 2005: WO/2005/006026 (389 worldwide citation)

Embodiments of the present invention are directed to fluidic optical elements (30) and lithographic systems using isotopically specified fluids (32) for processing light passing therethrough. The isotopic composition of the fluid may be adjusted to vary the optical properties. The properties of the ...


8
Hazelton Andrew J, Takaiwa Hiroaki: Wafer table for immersion lithography. Nikon Corporation, Hazelton Andrew J, Takaiwa Hiroaki, COSTANTINO Mario A, February 3, 2005: WO/2005/010611 (268 worldwide citation)

Methods and apparatus for allowing a liquid to be substantially contained between a lens (46) and a wafer table (51) assembly of an immersion lithography system are disclosed. According to one aspect of the present invention, an exposure apparatus includes a lens (46) and a wafer table (51) assembly ...


9
Poon Alex Ka Tim, Kho Leonard Wai Fung: Apparatus and method for providing fluid for immersion lithography. Nikon Corporation, Poon Alex Ka Tim, Kho Leonard Wai Fung, COSTANTINO Mario A, November 24, 2005: WO/2005/111722 (254 worldwide citation)

An apparatus and method are disclosed for providing fluid for immersion lithography. Immersion fluid is injected into an inner cavity (34) in a direction that is different than a direction in which the nozzle (20) moves. The immersion fluid can also be injected at different rates into the inner cavi ...


10
Ebihara Akimitsu, Lee Martin E, Yuan Bausan: Projection optical device and exposure apparatus. Nikon Corporation, Ebihara Akimitsu, Lee Martin E, Yuan Bausan, COSTANTINO Mario A, April 13, 2006: WO/2006/038952 (99 worldwide citation)

A projection optical device includes a projection optical system (PL) which projects an image of a pattern, a support device having a flexible structure (36A, 36B, and 36C) to support the projection optical system, and a positioning device having an actuator to position the projection optical system ...