1
Maricela Morales Charles Szmanda
Charles R Szmanda, George G Barclay, Peter Trefonas, Wang Yueh: Polymer and photoresist compositions. Shipley Company, S Matthew Cairns, c o EDWARDS & ANGELL, October 31, 2002: US20020160302-A1 (1 worldwide citation)

Disclosed are spirocyclic olefin polymers, methods of preparing spirocyclic olefin polymers, photoresist compositions including spirocyclic olefin resin binders and methods of forming relief images using such photoresist compositions.


2
Maricela Morales Charles Szmanda
Charles R Szmanda, George G Barclay, Peter Trefonas, Wang Yueh: Polymer and photoresist compositions. Shipley Company, Dike Bronstein Roberts & Cushman IP Group, c o EDWARDS & ANGELL, October 24, 2002: US20020155380-A1

Disclosed are spirocyclic olefin ploymers, methods of preparing spirocyclic olefin polymers, photoresist compositions including spirocyclic olefin resin binders and methods of forming relief images using such photoresist compositions.


3
Charles Szmanda
Gary N Taylor, Charles R Szmanda: Novel polymers and photoresist compositions for short wavelength imaging. Shipley Company, Peter F Corless, c o EDWARDS & ANGELL, May 9, 2002: US20020055060-A1 (1 worldwide citation)

The present invention includes new polymers and use of such polymers as a resin component for photoresist compositions, particularly chemically-amplified positive-acting photoresist compositions. Polymers and resists of the invention are particularly useful for imaging with short wavelength radiatio ...


4
Garo Khanarian
Garo Khanarian, Yujian You, Robert H Gore, Angelo A Lamola: Porous optical materials. Shipley Company, c o EDWARDS & ANGELL, Dike Bronstein Roberts & Cushman IP Group, January 9, 2003: US20030008244-A1

Methods of preparing porous optical materials are provided. These methods allow for the selection of the desired pore size and level of porosity in the porous optical material. Such methods utilize a preformed polymeric porogen.


5
Ed Rutter
Edward W Rutter: Stripper. Rohm and Haas Electronic Materials, S Matthew Cairns, c o EDWARDS & ANGELL, November 4, 2004: US20040220066-A1

Compositions suitable for removing polymeric material, particularly post-plasma etch polymeric material, from a substrate are provided. These compositions contain one or more quaternary ammonium silicates as the active component. Methods of removing polymeric material using these compositions are al ...


6
Ed Rutter
Edward W Rutter: Polymer remover. Rohm and Haas Electronic Materials, S Matthew Cairns, c o EDWARDS & ANGELL, November 18, 2004: US20040229762-A1

Compositions useful for the removal of polymeric material from substrates, such as magnetoresistive sensors, are provided. Methods of removing such polymeric material from magnetoresistive sensors and methods of manufacturing magnetoresistive sensors are also provided.


7
Deodatta Shenai-Khatkhate
Deodatta Vinayak Shenai Khatkhate, Michael Brendan Power, Ronald L Dicarlo: Trialkylindium preparation. Shipley Company, S Matthew Cairns, c o EDWARDS & ANGELL, October 9, 2003: US20030191333-A1

Trialkylindium compounds are prepared by reacting indium trihalide with a trialkylaluminum compound in the presence of a fluoride salt, wherein the molar ratio of the indium trihalide to the fluoride salt is at least 1:4.5. Such trialkylindium compounds are particularly suitable for use in metalorga ...


8
Deodatta Shenai-Khatkhate
Deodatta Vinayak Shenai Khatkhate, Michael Brendan Power, Artashes Amamchyan: Alkyl group VA metal compounds. Shipley Company, c o EDWARDS & ANGELL, Dike Bronstein Roberts & Cushman IP Group, October 23, 2003: US20030199704-A1

Disclosed are methods of preparing monoalkyl Group VA metal dihalide compounds in high yield and high purity by the reaction of a Group VA metal trihalide with an organo lithium reagent or a compound of the formula RnM1X3-n where R is an alkyl, M1 is a Group IIIA metal, X is a halogen and n is an in ...


9
Dana Gronbeck
Dana A Gronbeck, Michael K Gallagher, Jeffrey M Calvert, Christopher P Sullivan: Electronic device manufacture. Shipley Company, S Matthew Cairns, c o EDWARDS & ANGELL, March 18, 2004: US20040052948-A1

Treatment procedures for organic polysilica layers are provided that improve the adhesion of layers of material that are subsequently applied to the treated organic polysilica layers. In particular, layers of organic polymeric material have improved adhesion to such treated organic polysilica layers ...


10
Maricela Morales
Peter Trefonas: System and method for configuring equipment. Shipley Company, S Matthew Cairns, c o EDWARDS & ANGELL, May 16, 2002: US20020059513-A1

A system and method is provided for configuring equipment to achieve a desired result and includes a simulation engine for receiving the desired result and outputting at least one parameter setting for operating the equipment to achieve the desired result. Also included is a consumable knowledge bas ...