1
Stefan B Edlund, Daniel Alexander Ford, Joann Ruvolo: Electronic calendaring system that automatically predicts calendar entries based upon previous activities. International Business Machines Corporation, Randy W Lacasse, Alison Mortinger Esq, Lacasse & Associates, August 5, 2003: US06603489 (104 worldwide citation)

An electronic calendaring system that automatically predicts calendar entries based upon previous activities. The system presents a user with an intelligent sequence of forms which query the user about events such as hotels for travel, attendees for meeting, etc. The initial information contained wi ...


2
Hiroyuki Akatsu: High density EEPROM for solid state file. International Business Machines Corporation, Alison Mortinger Esq, Whitham Curtis Whitham & McGinn, February 10, 1998: US05717635 (71 worldwide citation)

An EEPROM of NOR-type architecture is formed at high integration density and allows selective programming without selective production of hot electron currents in storage transistor channels. common transistor channel conductors are formed as n-wells running parallel to bit lines having a width of m ...


3
William J Cote, Michael F Lofaro: Method and apparatus for uniform polishing of a substrate. International Business Machines Corporation, Alison Mortinger Esq, Whitham Curtis Whitham & McGinn, September 24, 1996: US05558563 (38 worldwide citation)

A method and apparatus for improved control of polishing in chemical-mechanical polishing operations is provided. The polishing is controlled by applying different amounts of pressure to the surface of a substrate during polishing. A polishing pad which includes raised portions is used to apply the ...


4
Michael D Armacost, Tina J Wagner, Michael L Passow, Dominic J Schepis, Matthew J Sendelbach, William C Wille: Process of etching an oxide layer. International Business Machines Corporation, Alison Mortinger Esq, Whitham Curtis & Whitham, September 22, 1998: US05811357 (21 worldwide citation)

A dry etching process for etching an oxide layer on a substrate in which a plasma is created in a gaseous mixture containing C.sub.4 F.sub.8 and C.sub.2 F.sub.6. The dry etch process is useful for etching an oxide layer stopping on a silicon nitride layer on a semiconductor wafer of an integrated ci ...


5
Tanveer Fathima Syeda Mahmood: Method and apparatus for indexing of topics using foils. International Business Machines Corporation, Alison Mortinger Esq, McGinn & Gibb PLLC, June 10, 2003: US06578040 (20 worldwide citation)

A method and structure for indexing multi-media data comprising deriving keywords from a first media type (slides), matching the keywords to a second media type (video), identifying an appearance of the first media type in the second media type, and calculating a co-occurrence of the keywords and th ...


6
Steven George Barbee, Richard Anthony Conti, Alexander Kostenko, Narayana V Sarma, Donald Leslie Wilson, Justin Wai Chow Wong, Steven Paul Zuhoski: Apparatus for chemical vapor deposition of aluminum oxide. International Business Machines Corporation, Alison Mortinger Esq, Whitham Curtis Whitham & McGinn, March 17, 1998: US05728222 (13 worldwide citation)

An apparatus in a chemical vapor deposition (CVD) system monitors the actual wafer/substrate temperature during the deposition process. The apparatus makes possible the production of high quality aluminum oxide films with real-time wafer/substrate control. An infrared (IR) temperature monitoring dev ...


7
Michael F Lofaro: Apparatus and method for carrier backing film reconditioning. International Business Machines Corporation, Alison Mortinger Esq, Whitham Curtis Whitham & McGinn, April 8, 1997: US05618354 (5 worldwide citation)

An apparatus and method for cleaning and reconditioning a wafer carrier backing film. The apparatus comprises a flat perforated surface plate with a perforated film or perforated embossed glass plate on its surface; a backing plate connected to the surface plate which is fitted for connection to a c ...