1
Ian Robert Govett: Client/server architecture supporting concurrent servers within a server with a transaction manager providing server/connection decoupling. International Business Machines Corporation, Alison Mortinger, Whitham Curtis Whitham & McGinn, June 2, 1998: US05761507 (292 worldwide citation)

A transaction manager intercepts all requests for service from any of a plurality of clients, establishes connections independently of task requests and assigns available servers to the requests in the order the requests are received in order to provide equitable distribution of service resources ov ...


2
Stefan B Edlund, Daniel Alexander Ford, Joann Ruvolo: Electronic calendaring system that automatically predicts calendar entries based upon previous activities. International Business Machines Corporation, Randy W Lacasse, Alison Mortinger Esq, Lacasse & Associates, August 5, 2003: US06603489 (104 worldwide citation)

An electronic calendaring system that automatically predicts calendar entries based upon previous activities. The system presents a user with an intelligent sequence of forms which query the user about events such as hotels for travel, attendees for meeting, etc. The initial information contained wi ...


3
Hiroyuki Akatsu: High density EEPROM for solid state file. International Business Machines Corporation, Alison Mortinger Esq, Whitham Curtis Whitham & McGinn, February 10, 1998: US05717635 (71 worldwide citation)

An EEPROM of NOR-type architecture is formed at high integration density and allows selective programming without selective production of hot electron currents in storage transistor channels. common transistor channel conductors are formed as n-wells running parallel to bit lines having a width of m ...


4
William J Cote, Michael F Lofaro: Method and apparatus for uniform polishing of a substrate. International Business Machines Corporation, Alison Mortinger Esq, Whitham Curtis Whitham & McGinn, September 24, 1996: US05558563 (38 worldwide citation)

A method and apparatus for improved control of polishing in chemical-mechanical polishing operations is provided. The polishing is controlled by applying different amounts of pressure to the surface of a substrate during polishing. A polishing pad which includes raised portions is used to apply the ...


5
Fernand Dorleans, Liang Choo Hsia, Louis L C Hsu, Gerald R Larsen, Geraldine C Schwartz: CMOS transistor with two-layer inverse-T tungsten gate. International Business Machines Corporation, Alison Mortinger, Whitham Curtis Whitham & McGinn, May 27, 1997: US05633522 (31 worldwide citation)

The present invention is directed to a unique silicon based MOS transistor having an inverse-T refractory metal gate structure. The gate fabricated according to this invention comprises a main CVD tungsten portion and a lower sputtered tungsten portion outwardly extending from the bottom of the CVD ...


6
Norman J Dauerer, Edward E Kelley: Automated generation on file access control system commands in a data processing system with front end processing of a master list. International Business Machines Corporation, Alison Mortinger, Whitham Curtis Whitham & McGinn, May 6, 1997: US05627967 (30 worldwide citation)

A front end is provided for an access controller for controlling access to a shared resource in a data processing system to contain a processed master list, in text form, of users to which access will be granted. The list of users may be edited by a simple editor or word processor. commands to the a ...


7
Michael F Lofaro: Apparatus and method for carrier backing film reconditioning. International Business Machines Corporation, Alison Mortinger, Whitham Curtis Whitham & McGinn, September 24, 1996: US05558111 (25 worldwide citation)

An apparatus and method for cleaning and reconditioning a wafer carrier backing film. The apparatus comprises a flat perforated surface plate with a perforated film or perforated embossed glass plate on its surface; a backing plate connected to the surface plate which is fitted for connection to a c ...


8
Michael D Armacost, Tina J Wagner, Michael L Passow, Dominic J Schepis, Matthew J Sendelbach, William C Wille: Process of etching an oxide layer. International Business Machines Corporation, Alison Mortinger Esq, Whitham Curtis & Whitham, September 22, 1998: US05811357 (21 worldwide citation)

A dry etching process for etching an oxide layer on a substrate in which a plasma is created in a gaseous mixture containing C.sub.4 F.sub.8 and C.sub.2 F.sub.6. The dry etch process is useful for etching an oxide layer stopping on a silicon nitride layer on a semiconductor wafer of an integrated ci ...


9
Tanveer Fathima Syeda Mahmood: Method and apparatus for indexing of topics using foils. International Business Machines Corporation, Alison Mortinger Esq, McGinn & Gibb PLLC, June 10, 2003: US06578040 (20 worldwide citation)

A method and structure for indexing multi-media data comprising deriving keywords from a first media type (slides), matching the keywords to a second media type (video), identifying an appearance of the first media type in the second media type, and calculating a co-occurrence of the keywords and th ...


10
John Howard Keller: Negative ion deductive source for etching high aspect ratio structures. International Business Machines Corporation, Alison Mortinger, Whitham Curtis & Whitham, July 21, 1998: US05783102 (19 worldwide citation)

A method of manufacturing semiconductor chips uses negative plasma etching. The plasma may be produced by an inductive plasma source. A magnetic field is used to reduce diffusion of hot electrons, producing a uniform negative plasma to etch a work piece.