1
Naftali E Lustig, Katherine L Saenger, Ho Ming Tong: In-situ endpoint detection and process monitoring method and apparatus for chemical-mechanical polishing. International Business Machines Corporation, Michael J Balconi Lamica, Alison D Mortinger, July 18, 1995: US05433651 (343 worldwide citation)

An in-situ chemical-mechanical polishing process monitor apparatus for monitoring a polishing process during polishing of a workpiece in a polishing machine, the polishing machine having a rotatable polishing table provided with a polishing slurry, is disclosed. The apparatus comprises a window embe ...


2
Leping Li, Steven G Barbee, Arnold Halperin, Tony F Heinz: In-situ monitoring of the change in thickness of films. International Business Machines Corporation, Alison D Mortinger, September 24, 1996: US05559428 (118 worldwide citation)

The change in thickness of a film on an underlying body such as a semiconductor substrate is monitored in situ by inducing a current in the film, and as the thickness of the film changes (either increase or decrease), the changes in the current are detected. With a conductive film, eddy currents are ...


3
Christopher P Ausschnitt, William A Muth: Edge overlay measurement target for sub-0.5 micron ground rules. International Business Machines Corporation, Peter W Peterson, Alison D Mortinger, DeLio & Peterson, January 27, 1998: US05712707 (105 worldwide citation)

A target for determining bias or overlay error in a substrate formed by a lithographic process uses a pair of straight vernier arrays of parallel elements, a staggered vernier array of parallel elements, and optionally at least one image shortening array on the substrate. The ends of the elements fo ...


4
Leping Li, Steven George Barbee, Arnold Halperin, Tony Frederick Heinz: In-situ monitoring and control of conductive films by detecting changes in induced eddy currents. International Business Machines Corporation, Alison D Mortinger, Jay H Anderson, June 6, 2000: US06072313 (75 worldwide citation)

The change in thickness of a film on an underlying body such as a semiconductor substrate is monitored in situ by inducing a current in the film, and as the thickness of the film changes (either increase or decrease), the changes in the current are detected. With a conductive film, eddy currents are ...


5
Leping Li, Steven George Barbee, Arnold Halperin, Tony Frederick Heinz: In-situ monitoring of conductive films on semiconductor wafers. International Business Machines Corporation, Alison D Mortinger, August 26, 1997: US05660672 (66 worldwide citation)

The change in thickness of a film on an underlying body such as a semiconductor substrate is monitored in situ by inducing a current in the film, and as the thickness of the film changes (either increase or decrease), the changes in the current are detected. With a conductive film, eddy currents are ...


6
Leping Li, Steven George Barbee, Arnold Halperin: Endpoint detection for chemical mechanical polishing using frequency or amplitude mode. International Business Machines Corporation, Alison D Mortinger, July 1, 1997: US05644221 (59 worldwide citation)

A method and apparatus for endpoint detection in removal of a film from a semiconductor wafer is provided, with a sensor for creating a signal responsive to the film removal process, a positive feedback amplifier coupled to the sensor, the positive feedback amplifier having a mode selector, and an a ...


7
Michael F Lofaro: Composite polishing pad. International Business Machines Corporation, Alison D Mortinger, March 11, 1997: US05609517 (56 worldwide citation)

A composite polishing pad is provided, with a supporting layer, nodes attached to the supporting layer, and an upper layer attached to the supporting layer which surrounds but does not cover the nodes. The support layer, nodes, and upper layer may all be of different hardnesses.


8
Norman J Dauerer, Edward E Kelley: Database system for facilitating comparison of related information stored in a distributed resource. International Business Machines Corporation, Alison D Mortinger, Whitham Curtis Whitham & McGinn, December 12, 1995: US05475833 (53 worldwide citation)

A database system and application for facilitating comparison of data between manufacturing lines or other business processes which are geographically separated or distributed includes a storage arrangement in which data from remote locations is shadowed and can be updated as necessary only from rem ...


9
Jitendra Apte, Rajesh Gupta: Method of target generation for multilevel hierarchical circuit designs. International Business Machines Corporation, Richard Lau, Alison D Mortinger, December 12, 1995: US05475607 (53 worldwide citation)

Generating delay targets for creating a multilevel hierarchical circuit design by providing a hierarchical design description and delay constraints of the circuit design; generating a net measure for each net and macro cell of the circuit design, and generating an abstract delay model for each macro ...


10
Joann Ruvolo, Stefan B Edlund, Daniel Alexander Ford: System and method for feeding e-mail with calendar data. International Business Machines Corporation, Randy W Lacasse, Alison D Mortinger Esq, Lacasse & Associates, August 5, 2003: US06604079 (53 worldwide citation)

Calendar entries provide for a wealth of information. For example, for a meeting, information such as the start date, subject, attendees, and location are provided. Yet, when writing a follow up e-mail, that's exactly the information a user has to copy/or cut and paste from the calendar entries ...