1
Jon C Goldman, Robert E Rappaport: Gas control system for chemical vapor deposition system. Thermco Products Corporation, George R Clark, Neil M Rose, Clifford A Dean, January 18, 1983: US04369031 (99 worldwide citation)

A gas flow control system in which several constituent gases are mixed and the mixture delivered through controlled injectors to a processing zone. Mass flow controllers control the injector flows with one of the controllers being a master and the other being slaved to provide a selected percentage ...


2
Robert D Arrasmith, Thomas R Barnhart, Jon C Goldman: Processing silicon wafers employing processing gas atmospheres of similar molecular weight. Thermco Products Corporation, George R Clark, Neil M Rose, Robert J Fox, March 15, 1983: US04376796 (18 worldwide citation)

At atmosphere X and an atmosphere Y, which may be an oxidizing atmosphere, are used in a process wherein silicon wafers are processed in a processing chamber, which is pressurized sequentially with a purging atmosphere, with the atmosphere X, and with the atmosphere Y displacing the atmosphere X exc ...


3
Johan A Valentijn: Closure for thermal reactor. Thermco Products Corporation, George R Clark, Neil M Rose, Allen J Hoover, March 3, 1981: US04253417 (11 worldwide citation)

Apparatus for thermal oxidation of silicon wafers at high pressures of a type wherein a reactor of a refractory material is disposed within a pressure vessel, and wherein a margin of a wafer portal of the reactor and a closure of the refractory material have congruent surfaces enabling a hermetic se ...


4
Ernest James West, Gary M Brandenburg: Adjustable gas flow control valve. Thermco Products Corporation, George R Clark, Neil M Rose, Clifford A Dean, August 22, 1978: US04108420 (8 worldwide citation)

A gas flow control valve having the means of adjusting the tension of the spring to the plunger through which the electromagnetic actuating coil moves the plunger from the valve seat in proportion to the required flow by an externally accessible adjustment means.


5
Robert B Foster: Method and apparatus for removal of by-products of chemical vapor deposition from oil for vacuum pump. Thermco Products Corporation, George R Clark, Neil M Rose, Allen J Hoover, October 14, 1980: US04228004 (6 worldwide citation)

For a vacuum pump, as used to maintain a partial vacuum in a diffusion furnace for chemical vapor deposition in intermittent runs wherein oil for the vacuum pump becomes contaminated by particulates, an apparatus for removal of particulates from oil for the vacuum pump comprises a settling tank, whi ...