1
Hiroshi Kawazoe, Hideo Hosono, Atsushi Kudo, Hiroshi Yanagi: Oxide thin film. TDK Corporation, Hiroshi Kawazoe, Oblon Spivak McClelland Maier & Neustadt P C, September 25, 2001: US06294274 (2314 worldwide citation)

An object of the invention is to provide an oxide thin film which exhibits a widegap or transparency and p-type conductivity although it has heretofore been very difficult to form. The oxide thin film formed on a substrate contains copper oxide and strontium oxide as a main component and exhibits p- ...


2
Takashi Urano: Noncontact power transmitting apparatus. TDK Corporation, Oblon Spivak McClelland Maier & Neustadt P C, July 13, 1999: US05923544 (145 worldwide citation)

A noncontact power transmitting apparatus which makes it possible to rapidly charge a secondary cell of a part to be charged with large electric power and realize a lightweight and compact part to be charged. A power-transmitting coil of a charging part is divided into two sets, and the power-transm ...


3
Yukio Yamauchi, Michio Arai: Thin film transistor, organic electroluminescence display device and manufacturing method of the same. TDK Corporation, Semiconductor Energy Laboratory, June 17, 1997: US05640067 (145 worldwide citation)

An organic EL display device has a substrate, a plurality of organic EL elements formed on the substrate and a plurality of thin film transistors formed on the substrate. The transistors are connected to the respective EL elements for controlling current applied to the respective elements. Each of t ...


4
Osamu Onitsuka, Akira Ebisawa, Mitsunari Suzuki, Hiroshi Yamamoto, Michio Arai: Organic electroluminescent display device, and method and system for making the same. TDK Corporation, Oblon Spivak McClelland Maier & Neustadt P C, April 11, 2000: US06049167 (139 worldwide citation)

In an organic EL display device, an organic EL multilayer structure is disposed in a gastight space defined between a substrate and a shield member and filled with an inert gas. The organic EL multilayer structure includes organic materials having a Tg of at most 140.degree. C. The shield member is ...


5
Yoshihiko Yano, Takao Noguchi: Substrate structures for electronic devices. TDK Corporation, Oblon Spivak McClelland Maier & Neustadt P C, April 4, 2000: US06045626 (137 worldwide citation)

A substrate structure includes a single crystal Si substrate and a surface layer, with a buffer layer interleaved therebetween. The buffer layer includes at least one of an R--Zr family oxide thin film composed mainly of a rare earth oxide and/or zirconium oxide, an AMnO.sub.3 thin film composed mai ...


6
Susumu Takata, Shoichi Wakabayashi, Hiroyasu Noma, Tatsuya Wakatsuki: Porous hydroxyapatite material for artificial bone substitute. TDK Corporation, Wyatt Gerber Shoup Scobey and Badie, December 16, 1986: US04629464 (133 worldwide citation)

The sintered microporous hydroxyapatite material of the invention is useful as an artificial bone substitute material either in a granular and slurried from in a physiological saline solution used as a filling material for lost portions or cavities of bones or in a form of a shaped prosthetic bone s ...


7
Mitsufumi Codama, Masaru Tanaka: Organic electroluminescence display device and producing method thereof. TDK Corporation, Armstrong Westerman Hattori McLeland and Naughton, March 14, 2000: US06037712 (132 worldwide citation)

In manufacturing of an organic electroluminescence (EL) display device, after first electrodes are formed on a substrate, insulating films are formed on the first electrodes except regions corresponding to light emitting portions. Spacers are formed on the insulating films, and overhanging portions ...


8
Yoshihiko Yano, Takao Noguchi: Multilayer thin film, substrate for electronic device, electronic device, and preparation of multilayer oxide thin film. TDK Corporation, Oblon Spivak McClelland Maier & Neustadt P C, September 1, 1998: US05801105 (131 worldwide citation)

A multilayer thin film of the invention has an oxide thin film formed on a semiconductor single crystal substrate, and the oxide thin film includes at least one epitaxial thin film composed mainly of zirconium oxide or zirconium oxide stabilized with a rare earth metal element (inclusive of scandium ...


9
Yoshihiko Yano, Takao Noguchi, Katsuto Nagano: Method for forming oxide thin film and the treatment of silicon substrate. TDK Corporation, Oblon Spivak McClelland Maier & Neustadt P C, September 22, 1998: US05810923 (129 worldwide citation)

The invention provides an oxide thin film in the form of an epitaxial film of the composition: Zr.sub.1-x R.sub.x O.sub.2-.delta. wherein R is a rare earth metal inclusive of Y, x=0 to 0.75, preferably x=0.20 to 0.50, formed on a surface of a single crystal silicon substrate. A rocking curve of the ...


10
Yoshihiko Yano, Takao Noguchi: Oxide thin film, electronic device substrate and electronic device. TDK Corporation, Oblon Spivak McClelland Maier & Neustadt P C, October 27, 1998: US05828080 (128 worldwide citation)

The invention provides an oxide thin film in the form of an epitaxial film of the composition: Zr.sub.1-x R.sub.x O.sub.2-.delta. wherein R is a rare earth metal inclusive of Y, x=0 to 0.75, preferably x=0.20 to 0.50, formed on a surface of a single crystal silicon substrate. A rocking curve of the ...



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