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Magome Nobutaka, Takaiwa Hiroaki, Arai Dai: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Magome Nobutaka, Takaiwa Hiroaki, Arai Dai, KAWAKITA Kijuro, June 24, 2004: WO/2004/053952 (501 worldwide citation)

(EN) An exposure apparatus, wherein an exposure is carried out while filling a space between a projection optical system and a substrate with a liquid, enables to suppress deterioration of a device caused by adherent liquid on the substrate. A device manufacturing system (SYS) comprises an exposure ...


2
Hazelton Andrew J, Takaiwa Hiroaki: Wafer table for immersion lithography. Nikon Corporation, Hazelton Andrew J, Takaiwa Hiroaki, COSTANTINO Mario A, February 3, 2005: WO/2005/010611 (268 worldwide citation)

Methods and apparatus for allowing a liquid to be substantially contained between a lens (46) and a wafer table (51) assembly of an immersion lithography system are disclosed. According to one aspect of the present invention, an exposure apparatus includes a lens (46) and a wafer table (51) assembly ...


3
Takaiwa Hiroaki, Horiuchi Takashi: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method of producing device. Nikon Corporation, Takaiwa Hiroaki, Horiuchi Takashi, SHIGA Masatake, August 18, 2005: WO/2005/076321 (123 worldwide citation)

(EN) Provided is an exposure apparatus for exposing a substrate by irradiating exposure light on the substrate through a projection optical system and liquid, where the exposure apparatus has a detection device for detecting whether or not the liquid is present on an object placed below the forward ...


4
Arai Dai, Hara Hideaki, Takaiwa Hiroaki: (Ja) 液体回収装置、露光装置、露光方法及びデバイス製造方法, (En) Liquid recovery apparatus, exposure apparatus, exposure method, and device production method. Nikon Corporation, Arai Dai, Hara Hideaki, Takaiwa Hiroaki, SHIGA Masatake, March 10, 2005: WO/2005/022615 (104 worldwide citation)

(EN) An exposure apparatus exposes a substrate by projecting an image of a pattern on the substrate by using a projection optical system and a liquid that fills a gap between the projection optical system and the substrate. The exposure apparatus has a liquid recovery mechanism with a drive section ...


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Magome Nobutaka, Kobayashi Naoyuki, Sakakibara Yasuyuki, Takaiwa Hiroaki: (Ja) 露光装置及びデバイス製造方法、並びに露光装置の制御方法, (En) Exposure apparatus, device producing method, and exposure apparatus controlling method. Nikon Corporation, Magome Nobutaka, Kobayashi Naoyuki, Sakakibara Yasuyuki, Takaiwa Hiroaki, KAWAKITA Kijuro, February 3, 2005: WO/2005/010962 (63 worldwide citation)

(EN) An exposure apparatus (EX) exposes a substrate (P) by projecting a pattern image on the substrate (P) through a projection optical system (PL) and a liquid (1). The exposure device (EX) has a liquid feeding mechanism (10) for feeding the liquid (1) between the projection optical system (PL) and ...


7
Ono Kazuya, Tanimura Hisashi, Takaiwa Hiroaki: (Ja) 磁気案内装置、ステージ装置、露光装置、及びデバイスの製造方法, (En) Magnetic guiding apparatus, stage apparatus, exposure apparatus and device manufacturing method. Nikon Corporation, Ono Kazuya, Tanimura Hisashi, Takaiwa Hiroaki, SHIGA Masatake, June 29, 2006: WO/2006/068233 (62 worldwide citation)

(EN) A magnetic guiding apparatus (100) is provided with a guiding member (110) having a guiding plane (111) provided along a first direction, and a facing plane (121) which faces the guiding plane (111) at a distance from the guiding plane (111). Magnetic attraction is permitted to operate between ...


8
Takaiwa Hiroaki: (Ja) 露光装置及びデバイスの製造方法, (En) Exposure apparatus and method of producing device. Nikon Corporation, Takaiwa Hiroaki, SHIGA Masatake, September 1, 2005: WO/2005/081291 (62 worldwide citation)

(EN) An exposure apparatus (EX) has an exposure region (E) for irradiating exposure light (EL) to a substrate (W) through an optical system (30) and liquid (LQ) and has a measurement region (A) for acquiring information on the position of the substrate (W) prior to the exposure. The substrate (W) is ...


9
Hara Hideaki, Takaiwa Hiroaki: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and device producing method. Nikon Corporation, Hara Hideaki, Takaiwa Hiroaki, SHIGA Masatake, March 10, 2005: WO/2005/022616 (62 worldwide citation)

(EN) In an exposure apparatus (EX), a liquid (1) is placed between a projection optical system (PL) and a substrate (P), and the apparatus (EX) exposes the substrate (P) by projecting an image of a pattern on the substrate (P) through the optical projection system (PL) and the liquid (1). The appara ...


10
Nagasaka Hiroyuki, Takaiwa Hiroaki, Hirukawa Shigeru, Hoshika Ryuichi, Ishizawa Hitoshi: (Ja) 露光装置、露光方法及びデバイス製造方法、並びに光学部品, (En) Exposure apparatus, exposure method, device producing method, and optical component. Nikon Corporation, Nagasaka Hiroyuki, Takaiwa Hiroaki, Hirukawa Shigeru, Hoshika Ryuichi, Ishizawa Hitoshi, KAWAKITA Kijuro, June 16, 2005: WO/2005/055296 (10 worldwide citation)

(EN) An exposure apparatus (EX) is an apparatus for exposing a substrate (P) by irradiating exposure light (EL) onto the substrate (P) through a projection optical system (PL) and a liquid (1). The exposure apparatus (EX) has a substrate table (PT) for holding the substrate (P). A plate member (30) ...