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Beder Susanne, Singer Wolfgang: Projection objective having a high aperture and a planar end surface. Carl Zeiss Smt, Beder Susanne, Singer Wolfgang, PATENTANWÄLTE RUFF WILHELM BEIER DAUSTER Kronenstrasse 30 70174 Stuttgart, June 30, 2005: WO/2005/059617 (422 worldwide citation)

A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of ...


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Shafer David, Beder Susanne, Schuster Karl Heinz, Singer Wolfgang Dr: Objective as a microlithography projection objective with at least one liquid lens. Carl Zeiss Smt, Shafer David, Beder Susanne, Schuster Karl Heinz, Singer Wolfgang Dr, MÜLLER RISSMANN Werner, June 30, 2005: WO/2005/059654 (377 worldwide citation)

The invention relates to an objective designed as a microlithography projection objective for an operating wavelength. The objective has a greatest adjustable image-side numerical aperture NA, at least one first lens made from a solid transparent body, in particular glass or crystal, with a refracti ...


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Kneer Bernhard, Wabra Norbert, Gruner Toralf, Epple Alexander, Beder Susanne, Singer Wolfgang: Projection objective for a microlithographic projection exposure apparatus. Carl Zeiss Smt, Kneer Bernhard, Wabra Norbert, Gruner Toralf, Epple Alexander, Beder Susanne, Singer Wolfgang, SCHWANHÄUSSER Gernot, September 1, 2005: WO/2005/081067 (359 worldwide citation)

A projection objective of a microlithographic projection exposure apparatus (110) is designed for immersion operation in which an immersion liquid (134) adjoins a photosensitive layer (126). The refractive index of the immersion liquid is greater than the refractive index of a medium (L5; 142; L205; ...


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Scheible Patrick, Pazidis Alexandra, Garreis Reiner, Totzeck Michael, Feldmann Heiko, Gräupner Paul, Rostalski Hans Jürgen, Singer Wolfgang: Projection system with compensation of intensity variatons and compensation element therefor. Carl Zeiss Smt, Scheible Patrick, Pazidis Alexandra, Garreis Reiner, Totzeck Michael, Feldmann Heiko, Gräupner Paul, Rostalski Hans Jürgen, Singer Wolfgang, PATENTANWÄLTE RUFF WILHELM BEIER DAUSTER UND PARTNER, December 15, 2005: WO/2005/119369 (200 worldwide citation)

In a projection objective for imaging a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, at least one optical component is provided which has a substrate in which at least one substrate surface is covered with an interference layer sy ...


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Köhler Jess, Wangler Johannes, Brotsack Markus, Singer Wolfgang, Fiolka Damian, Maul Manfred: Illumination system for a microlithography projection exposure installation. Carl Zeiss Smt, Köhler Jess, Wangler Johannes, Brotsack Markus, Singer Wolfgang, Fiolka Damian, Maul Manfred, RUFF WILHELM BEIER DAUSTER Kronenstrasse 30 70174 Stuttgart, March 24, 2005: WO/2005/026843 (161 worldwide citation)

An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this l ...


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Shafer David, Ulrich Wilhelm, Dodoc Aurelian, Von, Bünau Rudolf, Mann Hans Jürgen, Epple Alexander, Beder Susanne, Singer Wolfgang: Catadioptric projection objective. Carl Zeiss Smt, Shafer David, Ulrich Wilhelm, Dodoc Aurelian, Von, Bünau Rudolf, Mann Hans Jürgen, Epple Alexander, Beder Susanne, Singer Wolfgang, PATENTANWÄLTE RUFF WILHELM BEIER DAUSTER Kronenstrasse 30 70174 Stuttgart, January 19, 2006: WO/2006/005547 (41 worldwide citation)

A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second obje ...


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Singer Wolfgang, Mann Hans Jürgen, Wangler Johannes, Ulrich Wilhelm: Projection objective for a projection exposure apparatus. Carl Zeiss Smt, Singer Wolfgang, Mann Hans Jürgen, Wangler Johannes, Ulrich Wilhelm, WEITZEL Friedenstrasse 10 D 89522 Heidenheim, January 29, 2004: WO/2004/010224 (24 worldwide citation)

The invention concerns a projection objective for a projection exposure apparatus, said projection exposure apparatus having a primary light source for emitting electromagnetic radiation with a wavelength ≤193 nm. The projection objective comprises an object plane (2), a first mirror (51), a second ...


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Degünther Markus, Layh Michael, Gerhard Michael, Thome Bruno, Singer Wolfgang: (De) Beleuchtungssystem für die mikro-lithographie, projektionsbelichtungsanlage mit einem derartigen beleuchtungssystem, (En) Illumination system for microlithographic projection exposure apparatus comprising an illumination system of this type. Carl Zeiss Smt, Degünther Markus, Layh Michael, Gerhard Michael, Thome Bruno, Singer Wolfgang, HOFMANN Matthias, August 23, 2007: WO/2007/093433 (21 worldwide citation)

(EN) An illumination system (5) for microlithography serves for the illumination of an illumination field (3). A light distribution device (9, 10) that is preferably used generates a two-dimensional intensity distribution in a first illumination plane (11). A first raster arrangement (12) composed o ...


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Singer Wolfgang, Wietzorrek Joachim, Hainz Joachim, Weirauch Gabriele, Maul Manfred: An illumination system for microlithography. Carl Zeiss Smt, Singer Wolfgang, Wietzorrek Joachim, Hainz Joachim, Weirauch Gabriele, Maul Manfred, WEITZEL Friedenstr 10 89522 Heidenheim, February 17, 2005: WO/2005/015314 (15 worldwide citation)

The present invention relates to an illumination system for microlithography, especially for wavelengths ≤ 193 nm, especially preferably for EUV lithography for illuminating a field in a field plane (9) with at least one optical integrator (3) which splits up a light bundle emitted by a light source ...


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